The effect of plasma-surface interactions on the structure formation of vapour deposited TiC/a-C:H nanocomposite films
(English)Manuscript (preprint) (Other academic)
Fundamental mechanisms determining the structure formation of nanocomposite TiC-/a-C:H thin films synthesised by reactive magnetron sputtering techniques have been studied. The investigation entailed varying the plasma density, composition, and substrate bias, thus altering ion-film interaction conditions. Moreover, by changing the vacuum pumping speed the influence of process stability was studied. The results show that the structure formation is predominantly controlled by energetic ion irradiation of the films, which, depending on the ion energies, provide increased adatom surface mobility and/or causes physical sputtering. No influence on the film structure formation due to process stability was seen, while influence of chemical sputtering could not be inferred. The present study explains previous results (Samuelsson et al., Surf. Coat. Technol. 206, 2396 (2012)), where the use of a high plasma density reactive sputtering technique resulted in film growth conditions favouring low presence of a-C:H and high stoichiometry of the TiC phase.
IdentifiersURN: urn:nbn:se:liu:diva-79304OAI: oai:DiVA.org:liu-79304DiVA: diva2:540325