Reactive magnetron sputtering of uniform yttria-stabilized zirconia coatings in an industrial setup
2012 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 206, no 19-20, 4126-4131 p.Article in journal (Refereed) Published
Yttria-stabilized zirconia (YSZ) thin films were deposited by reactive magnetron sputtering in an industrial scale setup on silicon wafers as well as commercial NiO-YSZ fuel cell anodes. The texture, morphology, and composition of the deposited films were investigated as a function of deposition parameters. Homogeneous coatings could be deposited over large areas within the coating zone, which is important for industrial applications. The use of substrate bias during film growth was identified as a key parameter to promote less columnar coatings and made it possible to tailor the texture of films deposited on Si. Bias voltages less than= - 40V resulted in highly less than 200 greater than textured YSZ films, intermediate bias voltages of - 50 V to - 70 V in less than 220 greater than textured films and high bias voltages (greater than= - 90 V) in a mixed orientation. In contrast, films grown on NiO-YSZ were seen to be randomly orientated when deposited at substrate bias voltages less than= - 30 V. When bias was further increased the film took over the orientation of underlying substrate due to substrate template effects.
Place, publisher, year, edition, pages
Elsevier , 2012. Vol. 206, no 19-20, 4126-4131 p.
Physical vapor deposition (PVD); Solid oxide fuel cell (SOFC); X-ray diffraction (XRD); Electron microscopy; Elastic recoil detection analysis (ERDA)
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-79708DOI: 10.1016/j.surfcoat.2012.04.007ISI: 000305662400043OAI: oai:DiVA.org:liu-79708DiVA: diva2:544087