Growth of Hard Amorphous Ti-Al-Si-N Thin Films by Cathodic Arc Evaporation
2013 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 235, no 25, 376-385 p.Article in journal (Refereed) Published
Ti(1−x−y)AlxSiyNz (0.02≤x≤0.46, 0.02≤y≤0.28, and 1.08≤z≤1.29) thin films were grown on cemented carbide substrates in an industrial scale cathodic arc evaporation system using Ti-Al-Si compound cathodes in a N2 atmosphere. The microstructure of the as-deposited films changes from nanocrystalline to amorphous by addition of Al and Si to TiN. Upon incorporation of 12 at% Si and 18 at% Al, the films assume an x-ray amorphous state. Post-deposition anneals show that the films are thermally stable up to 900 ◦C. The films exhibit age hardening up to 1000 ◦C with an increase in hardness from 21.9 GPa for as-deposited films to 31.6 GPa at 1000 ◦C. At 1100 ◦C severe out-diffusion of Co and W from the substrate occur, and the films recrystallize into c-TiN and w-AlN.
Place, publisher, year, edition, pages
2013. Vol. 235, no 25, 376-385 p.
IdentifiersURN: urn:nbn:se:liu:diva-80199DOI: 10.1016/j.surfcoat.2013.07.014ISI: 000329596100048OAI: oai:DiVA.org:liu-80199DiVA: diva2:546132