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Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures
Department of Photonics Engineering, Technical University of Denmark, Lyngby.
Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, The Institute of Technology.
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2012 (English)In: Optics Letters, ISSN 0146-9592, E-ISSN 1539-4794, Vol. 37, no 18, 3816-3818 p.Article in journal (Refereed) Published
Abstract [en]

In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390–785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern.

Place, publisher, year, edition, pages
2012. Vol. 37, no 18, 3816-3818 p.
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:liu:diva-81144DOI: 10.1364/OL.37.003816ISI: 000309046300026OAI: oai:DiVA.org:liu-81144DiVA: diva2:550843
Note

funding agencies|Danish councils for strategic research|09-072118|Swedish Energy Agency||Nordic Energy Research||Swedish Research Council|2009-5307|

Available from: 2012-09-08 Created: 2012-09-08 Last updated: 2017-12-07

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Jokubavicius, ValdasYakimova, RositzaSyväjärvi, Mikael

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