Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures
2012 (English)In: Optics Letters, ISSN 0146-9592, E-ISSN 1539-4794, Vol. 37, no 18, 3816-3818 p.Article in journal (Refereed) Published
In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390–785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern.
Place, publisher, year, edition, pages
2012. Vol. 37, no 18, 3816-3818 p.
IdentifiersURN: urn:nbn:se:liu:diva-81144DOI: 10.1364/OL.37.003816ISI: 000309046300026OAI: oai:DiVA.org:liu-81144DiVA: diva2:550843
funding agencies|Danish councils for strategic research|09-072118|Swedish Energy Agency||Nordic Energy Research||Swedish Research Council|2009-5307|2012-09-082012-09-082012-10-26