Improvement of Crystalline and Photoluminescence of Atomic Layer Deposited m-Plane ZnO Epitaxial Films by Annealing Treatment
2012 (English)In: Crystal Growth & Design, ISSN 1528-7483, E-ISSN 1528-7505, Vol. 12, no 10, 4745-4751 p.Article in journal (Refereed) Published
Monocrystalline m-plane ZnO epitaxial films with flat surface morphology were grown on m-plane sapphire by using atomic layer deposition. X-ray diffraction and transmission electron microscopy measurements verify not only the in-plane epitaxial relationship of the as-grown films as (10 (1) over bar0)andlt; 0001 andgt;(ZnO)parallel to(10 (1) over bar0)andlt;(1) over bar2 (1) over bar0 andgt; Al2O3 but also the absence of domains with undesirable orientations, which are generally obtained in the m-plane ZnO films grown by other methods. Experimental results indicate that the basal plane stacking fault (BSF) is the dominant structural defects that contribute to the emission at 3.31 eV in m-plane ZnO films. Exactly how thermal annealing affects the structural and optical properties of ZnO epi-films was also investigated. Additionally, based on time-resolved photoluminescence at 5 K, the decay time of BSF related emission and near-band-edge (NBE) emission were determined. Results of this work further demonstrated that the decay time of NBE emission increases with a higher annealing temperature, accompanied by an improvement in crystal structure.
Place, publisher, year, edition, pages
American Chemical Society , 2012. Vol. 12, no 10, 4745-4751 p.
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-85200DOI: 10.1021/cg300376rISI: 000309493300013OAI: oai:DiVA.org:liu-85200DiVA: diva2:566643
Funding Agencies|National Science Council of Taiwan|NSC-99-2221-E-009-095-MY3NSC-99-2112-M-006-017-MY3NSC-100-2112-M-213-002-MY3|2012-11-092012-11-092014-01-28