Band alignment studies in Si/Ge quantum dots based on optical and structural investigations
(English)Manuscript (preprint) (Other academic)
The present work is a photoluminescence study of Si-embedded Stranski-Krastanov Ge quantum dots. The value of the conduction band offset is a result of the magnitude of the tensile strain in the Si surrounding the compressive strained Ge dot. Due to the increased Si/Ge intermixing and reduced strain in the Si barrier, a reduction of the conduction band offset is observed at increased growth temperatures. The optical properties as derived from photoluminescence spectroscopy are correlated with structural properties obtained as a function of the growth temperature. High growth temperatures result in large Ge dots with low density due to the pronounced surface diffusion and Si/Ge intermixing. As confirmed by photoluminescence, the band gap of the Ge dots increases with increased growth temperature due to the higher degree of Si/Ge intermixing. The band alignment is of type-II in these structures, but the occurrence of both spatially indirect and spatially direct transitions are confirmed in temperature dependent photoluminescence measurements with varied excitation power conditions. An increasing temperature results in a gradual transition from the spatially indirect to the spatially direct recombination in the type-II band lineup, due to higher oscillator strength for the spatially direct transition combined with a higher population factor at higher temperatures.
IdentifiersURN: urn:nbn:se:liu:diva-86206OAI: oai:DiVA.org:liu-86206DiVA: diva2:575706