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Structural and Mechanical Properties of CNx and CPx Thin Solid Films
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.ORCID iD: 0000-0003-3277-1945
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.
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2012 (English)In: Key Engineering Materials, ISSN 1013-9826, E-ISSN 1662-9795, Vol. 488-489, 581-584 p.Article in journal (Refereed) Published
Abstract [en]

The inherent resiliency, hardness and relatively low friction coefficient of the fullerene-like (FL) allotrope of carbon nitride (CNx) thin solid films give them potential in numerous tribological applications. In this work, we study the substitution of N with P to grow FL-CPx to achieve better cross- and inter-linking of the graphene planes, improving thus the materials mechanical and tribological properties. The CNx and CPx films have been synthesized by DC magnetron sputtering. HRTEM have shown the CPx films exhibit a short range ordered structure with FL characteristics for substrate temperature of 300 degrees C and for a phosphorus content of 10-15 at.%. These films show better mechanical properties in terms of hardness and resiliency compared to those of the FL-CNx films. The low water adsorption of the films is correlated to the theoretical prediction for low density of dangling bonds in both, CNx and CPx. First-principles calculations based on Density Functional Theory (DFT) were performed to provide additional insight on the structure and bonding in CNx, CPx and a-C compounds.

Place, publisher, year, edition, pages
Trans Tech Publications , 2012. Vol. 488-489, 581-584 p.
Keyword [en]
carbon nitride; phosphorous-carbide; fullerene-like coatings; thin films; magnetron sputtering
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-87972DOI: 10.4028/www.scientific.net/KEM.488-489.581ISI: 000306531200142OAI: oai:DiVA.org:liu-87972DiVA: diva2:601017
Available from: 2013-01-28 Created: 2013-01-28 Last updated: 2017-12-06

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Broitman, EstebanFurlan, AndrejCzigany, ZsoltHögberg, HansHultman, Lars

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