Oxygen incorporation in Ti2AlC thin films studied by electron energy loss spectroscopy and ab initio calculations
2013 (English)In: Journal of Materials Science, ISSN 0022-2461, E-ISSN 1573-4803, Vol. 48, no 10, 3686-3691 p.Article in journal (Refereed) Published
Substitution of C with O in hexagonal inherently nanolaminated Ti2AlC has been studied experimentally and theoretically. Ti2Al(C1−x O x ) thin films with x ≤ 0.52 are synthesized by both cathodic arc deposition with the uptake of residual gas O, and solid-state reaction between understoichiometric TiC y and Al2O3(0001) substrates. The compositional analysis is made by analytical transmission electron microscopy, including electron energy loss spectroscopy. Furthermore, predictive ab initio calculations are performed to evaluate the influence of substitutional O on the shear stress at different strains for slip on the (0001) basal plane in the [−1010] and [1−210] directions.
Place, publisher, year, edition, pages
Springer Verlag (Germany) , 2013. Vol. 48, no 10, 3686-3691 p.
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-90742DOI: 10.1007/s10853-013-7165-4ISI: 000315518400009OAI: oai:DiVA.org:liu-90742DiVA: diva2:614712
Funding Agencies|European Research Council under the European Community|258509227754|Swedish Research Council (VR)||
On the day of the defence date of the Licentiate Thesis, the status of this article was Manuscript.2013-04-192013-04-052016-08-31Bibliographically approved