Ag2Cu2O3 thin films deposited by reactive high power impulse magnetron sputtering
2013 (English)Manuscript (preprint) (Other academic)
Ag2Cu2O3 thin films were prepared by reactive high power impulse magnetron sputtering (HiPIMS) from an alloy silver-copper (Ag0.5Cu0.5) target on silicon and glass substrates. The effects of the oxygen gas flow and the peak power on the structural properties of the films were investigated. Structural characterization by grazing incidence X-ray diffraction measurements show that the structure of Ag2Cu2O3 is related to the oxygen flow and the peak power. Films grown with high peak power required higher oxygen flow rate in order to get stoichiometric Ag2Cu2O3 thin films. It was further found that using HiPIMS, polycrystalline Ag2Cu2O3 films can be grown at room temperature without substrate heating or post-deposition annealing, while films deposited by DCMS exhibit poor crystallinity under the same process conditions.
Place, publisher, year, edition, pages
Silver-copper oxide, HiPIMS, Reactive sputtering, film structure
IdentifiersURN: urn:nbn:se:liu:diva-91258OAI: oai:DiVA.org:liu-91258DiVA: diva2:616681