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Atomic layer deposition of high-k dielectrics on carbon nanoparticles
University of Tartu, Estonia .
University of Tartu, Estonia .
University of Tartu, Estonia .
University of Tartu, Estonia .
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2013 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 538, 16-20 p.Article in journal (Refereed) Published
Abstract [en]

Carbon nanoparticles were synthesized from 5-methylresorcinol and formaldehyde via base catalysed polycondensation reaction and distributed over silicon oxide wafers and aluminium oxide thin films. These particles essentially possessed monocrystalline graphite structure. The particles were covered by hafnium oxide thin films in metal chloride based atomic layer deposition process carried out at 300 degrees C. Upon deposition of HfO2, thin crystalline metal oxide layer containing mostly cubic phase was formed. At the same time, deposition of the metal oxide caused reduction of the sizes of graphite particles and essential increase in the disorder in carbon.

Place, publisher, year, edition, pages
Elsevier , 2013. Vol. 538, 16-20 p.
Keyword [en]
Carbon nanoparticles, Atomic layer deposition, Laminated nanostructure
National Category
Engineering and Technology
URN: urn:nbn:se:liu:diva-95821DOI: 10.1016/j.tsf.2012.09.071ISI: 000320584800004OAI: diva2:638124

Funding Agencies|Estonian Ministry of Education and Research|SF0180042s07SF0180046s07|Estonian Centre of Excellence in Research Project|TK117T|European Science Foundation under the EUROCORES Programme EuroGRAPHENE||Estonian Science Foundation|09-Eurographene-FP-0217603|European Research Council||Swedish Research Council Linnaeus Environment||

Available from: 2013-07-26 Created: 2013-07-26 Last updated: 2016-08-31

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