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Modeling the extraction of sputtered metal from high power impulse hollow cathode discharges
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, The Institute of Technology. Östergötlands Läns Landsting, Center for Diagnostics, Department of Clinical Pharmacology.
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, The Institute of Technology. Östergötlands Läns Landsting, Center for Diagnostics, Department of Clinical Pharmacology.ORCID iD: 0000-0003-3767-225X
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, The Institute of Technology. Östergötlands Läns Landsting, Center for Diagnostics, Department of Clinical Pharmacology.ORCID iD: 0000-0002-2326-643X
Royal Institute Technology KTH, Sweden.
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2013 (English)In: Plasma sources science & technology (Print), ISSN 0963-0252, E-ISSN 1361-6595, Vol. 22, no 3, 035006- p.Article in journal (Refereed) Published
Abstract [en]

High power impulse hollow cathode sputtering is studied as a means to produce high fluxes of neutral and ionized sputtered metal species. A model is constructed for the understanding and optimization of such discharges. It relates input parameters such as the geometry of the cathode, the electric pulse form and frequency, and the feed gas flow rate and pressure, to the production, ionization, temperature and extraction of the sputtered species. Examples of processes that can be quantified by the use of the model are the internal production of sputtered metal and the degree of its ionization, the speed and efficiency of out-puffing from the hollow cathode associated with the pulses, and the gas back-flow into the hollow cathode between pulses. The use of the model is exemplified with a special case where the aim is the synthesis of nanoparticles in an expansion volume that lies outside the hollow cathode itself. The goals are here a maximum extraction efficiency, and a high degree of ionization of the sputtered metal. It is demonstrated that it is possible to reach a degree of ionization above 85%, and extraction efficiencies of 3% and 17% for the neutral and ionized sputtered components, respectively.

Place, publisher, year, edition, pages
Institute of Physics: Hybrid Open Access , 2013. Vol. 22, no 3, 035006- p.
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Engineering and Technology
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URN: urn:nbn:se:liu:diva-96128DOI: 10.1088/0963-0252/22/3/035006ISI: 000319820100010OAI: oai:DiVA.org:liu-96128DiVA: diva2:640758
Available from: 2013-08-14 Created: 2013-08-14 Last updated: 2017-12-06

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Hasan, MohammadPilch, IrisSöderström, DanielHelmersson, Ulf

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Plasma and Coating PhysicsThe Institute of TechnologyDepartment of Clinical Pharmacology
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