liu.seSearch for publications in DiVA
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Standardization of surface potential measurements of graphene domains
National Phys Lab, England.
National Phys Lab, England.
Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, The Institute of Technology.
National Phys Lab, England.
Show others and affiliations
2013 (English)In: Scientific Reports, ISSN 2045-2322, E-ISSN 2045-2322, Vol. 3Article in journal (Refereed) Published
Abstract [en]

We compare the three most commonly used scanning probe techniques to obtain a reliable value of the work function in graphene domains of different thickness. The surface potential (SP) of graphene is directly measured in Hall bar geometry via a combination of electrical functional microscopy and spectroscopy techniques, which enables calibrated work function measurements of graphene domains in ambient conditions with values Φ1LG ~4.55 ± 0.02 eV and Φ2LG ~ 4.44 ± 0.02 eV for single- and bi-layer, respectively. We demonstrate that frequency-modulated Kelvin probe force microscopy (FM-KPFM) provides more accurate measurement of the SP than amplitude-modulated (AM)-KPFM. The discrepancy between experimental results obtained by different techniques is discussed. In addition, we use FM-KPFM for contactless measurements of the specific components of the device resistance. We show a strong non-Ohmic behavior of the electrode-graphene contact resistance and extract the graphene channel resistivity.

Place, publisher, year, edition, pages
Nature Publishing Group: Open Access Journals - Option B / Nature Publishing Group , 2013. Vol. 3
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-98143DOI: 10.1038/srep02597ISI: 000324016900001OAI: oai:DiVA.org:liu-98143DiVA: diva2:652295
Note

Funding Agencies|NMS under the IRD Graphene Project (NPL)||EU FP7 Project ConceptGraphene||

Available from: 2013-09-30 Created: 2013-09-30 Last updated: 2017-12-06

Open Access in DiVA

fulltext(1054 kB)195 downloads
File information
File name FULLTEXT01.pdfFile size 1054 kBChecksum SHA-512
072d47b71685b594725a3a3f829ad7a30ee851f1c2d7a0e5664e6b24c219b2eab0384b818ab796503262719e6ce6190d74a006b1bd9fb854acbc6331e5b952f5
Type fulltextMimetype application/pdf

Other links

Publisher's full text

Authority records BETA

Yakimova, Rositsa

Search in DiVA

By author/editor
Yakimova, Rositsa
By organisation
Semiconductor MaterialsThe Institute of Technology
In the same journal
Scientific Reports
Engineering and Technology

Search outside of DiVA

GoogleGoogle Scholar
Total: 195 downloads
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 114 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf