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beta-Ta and alpha-Cr thin films deposited by high power impulse magnetron sputtering and direct current magnetron sputtering in hydrogen containing plasmas
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
Impact Coatings AB, Linkoping, Sweden .
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
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2014 (English)In: Physica. B, Condensed matter, ISSN 0921-4526, E-ISSN 1873-2135, Vol. 439, 3-8 p.Article in journal (Refereed) Published
Abstract [en]

Thin films of beta-Ta and alpha-Cr were deposited on Si(1 0 0) and 1000 angstrom SiO2/Si(1 0 0), by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (dcMS) in hydrogen-containing plasmas. The films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction, scanning electron microscopy, elastic recoil detection analysis, and four-point probe measurements. The results showed that 001-oriented beta-Ta films containing up to similar to 8 at% hydrogen were obtained with HiPIMS, albeit with no chemical shift evident in XPS. The 110 oriented alpha-Cr films display a hydrogen content less than the detection limit of 1 at%, but H-2 favors the growth of high-purity films for both metals. The beta-Ta films deposited with dcMS are columnar, which seems independent of H-2 presence in the plasma, while the films grown by HIPIMS are more fine-grained. The latter type of microstructure was present for the alpha-Cr films and found to be independent on choice of technique or hydrogen in the plasma. The beta-Ta films show a resistivity of similar to 140-180 mu Omega cm, while alpha-Cr films exhibit values around 30 mu Omega cm; the lowest values obtained for films deposited by HiPIMS and with hydrogen in the plasma for both metals.

Place, publisher, year, edition, pages
Elsevier , 2014. Vol. 439, 3-8 p.
Keyword [en]
Hydrides; Thin films; beta-Ta; alpha-Cr; High power impulse magnetron sputtering; Direct current magnetron sputtering
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-105562DOI: 10.1016/j.physb.2013.11.038ISI: 000331620700002OAI: oai:DiVA.org:liu-105562DiVA: diva2:708876
Available from: 2014-03-31 Created: 2014-03-27 Last updated: 2017-12-05

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Högberg, HansTengdelius, LinaJensen, JensHultman, Lars

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