liu.seSearch for publications in DiVA
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Studying chemical vapor deposition processes with theoretical chemistry
Linköping University, Department of Physics, Chemistry and Biology, Chemistry. Linköping University, The Institute of Technology.ORCID iD: 0000-0002-7171-5383
National University of Ireland University of Coll Cork, Ireland .
2014 (English)In: Theoretical Chemistry accounts, ISSN 1432-881X, E-ISSN 1432-2234, Vol. 133, no 5, 1476- p.Article in journal (Refereed) Published
Abstract [en]

In a chemical vapor deposition (CVD) process, a thin film of some material is deposited onto a surface via the chemical reactions of gaseous molecules that contain the atoms needed for the film material. These chemical reactions take place on the surface and in many cases also in the gas phase. To fully understand the chemistry in the process and thereby also have the best starting point for optimizing the process, theoretical chemical modeling is an invaluable tool for providing atomic-scale detail on surface and gas phase chemistry. This overview briefly introduces to the non-expert the main concepts, history and application of CVD, including the pulsed CVD variant known as atomic layer deposition, and put into perspective the use of theoretical chemistry in modeling these processes.

Place, publisher, year, edition, pages
Springer Verlag (Germany) , 2014. Vol. 133, no 5, 1476- p.
Keyword [en]
Chemical vapor deposition; Atomic layer deposition; Thin films; Surface chemistry; Gas phase chemistry; Theoretical chemistry
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-106134DOI: 10.1007/s00214-014-1476-7ISI: 000333476400001OAI: oai:DiVA.org:liu-106134DiVA: diva2:714031
Available from: 2014-04-25 Created: 2014-04-24 Last updated: 2017-12-05

Open Access in DiVA

fulltext(635 kB)5364 downloads
File information
File name FULLTEXT01.pdfFile size 635 kBChecksum SHA-512
73ca93072f2deb4b6126277705321e640e8bda0dd9547eb34fd5b2df2a09c274dde24bbc8cab8eaa8da828e95b38a15ac22eaf662e5afb4a0788818f6d01a1e8
Type fulltextMimetype application/pdf

Other links

Publisher's full text

Authority records BETA

Pedersen, Henrik

Search in DiVA

By author/editor
Pedersen, Henrik
By organisation
ChemistryThe Institute of Technology
In the same journal
Theoretical Chemistry accounts
Engineering and Technology

Search outside of DiVA

GoogleGoogle Scholar
Total: 5364 downloads
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 148 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf