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Characterization of Boron Nitride Thin Films
Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Chemistry. Linköping University, The Institute of Technology.ORCID iD: 0000-0002-7171-5383
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Functional Electronic Materials. Linköping University, The Institute of Technology.
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2013 (English)Conference paper, Published paper (Refereed)
Abstract [en]

Rhombohedral Boron Nitride layers were grown on sapphire substrate in a hot-wall CVD reactor. The characterization of those layers is reported and the results are discussed in correlation with the various growth parameters used.

Place, publisher, year, edition, pages
IEEE , 2013. 1-2 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-106877DOI: 10.1109/CLEOPR.2013.6600222ISI: 000334176100311ISBN: 978-146736475-1 (print)OAI: oai:DiVA.org:liu-106877DiVA: diva2:719890
Conference
10th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2013; Kyoto; Japan
Available from: 2014-05-27 Created: 2014-05-23 Last updated: 2015-03-11

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Pedersen, HenrikHögberg, HansFilippov, StanislavHenry, Anne

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Pedersen, HenrikHögberg, HansFilippov, StanislavHenry, Anne
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