Chromium oxide-based multilayer coatings deposited by reactive magnetron sputtering in an industrial setup
2008 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 203, no 1, 156-159 p.Article in journal (Refereed) Published
Chromium oxide-based multilayers were deposited by reactive magnetron sputtering in an industrial setup by employing one-fold substrate rotation and cyclic variation of the O2 flow. This simple method allows deposition of multilayers comprising alternating layers of ~ 1 μm thickness of columnar α-Cr2O3 and mixed layers consisting of ~ 50 nm-thick sublayers of amorphous CrOx and nanocrystalline Cr2O3.
Place, publisher, year, edition, pages
Elsevier, 2008. Vol. 203, no 1, 156-159 p.
X-ray diffraction (XRD), Scanning electron microscopy (SEM), Rutherford backscattering spectroscopy, Reactive sputtering, Chromium oxide, Multilayer
Other Materials Engineering
IdentifiersURN: urn:nbn:se:liu:diva-107928DOI: 10.1016/j.surfcoat.2008.08.035OAI: oai:DiVA.org:liu-107928DiVA: diva2:728092