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Manga: Manufacturable GaN
Fraunhofer-Institute for Applied Solid State Physics, Germany .
SiCrystal AG, Germany .
Norstel AB, Norrköping, Sweden .
Alcatel-Thales III-V Lab, Marcoussis, France .
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2011 (English)In: Proceedings of the 6th European Microwave Integrated Circuits Conference, IEEE , 2011, 336-339 p.Conference paper, Published paper (Refereed)
Abstract [en]

Manga is a five Nation (Germany, France, Italy, Sweden and United Kingdom) joint project realized by the European Defence Agency (EDA) which focuses on SiC substrates and a GaN epi wafers supply chain. The main objective of the project, started in March 2010, is to sustain the industrial development of semi-insulating silicon carbide substrates (SI SiC) and prove the industrial capability of Europe to deliver GaN HEMT and MMIC foundries with state-of-the-art GaN HEMT epitaxial wafers on SI-SiC substrates. This paper gives an overview on the current status of the technical developments achieved within the project.

Place, publisher, year, edition, pages
IEEE , 2011. 336-339 p.
National Category
Chemical Sciences
Identifiers
URN: urn:nbn:se:liu:diva-111504ISBN: 978-2-87487-023-1 (print)OAI: oai:DiVA.org:liu-111504DiVA: diva2:756895
Conference
6th European Microwave Integrated Circuit Conference (EuMIC 2011), Manchester, UK, 10-11 October 2011
Available from: 2014-10-20 Created: 2014-10-20 Last updated: 2014-10-29Bibliographically approved

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Janzén, Erik

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