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Simple Chemical Vapor Deposition Experiment
Linköping University, Department of Physics, Chemistry and Biology, Chemistry. Linköping University, The Institute of Technology.ORCID iD: 0000-0002-7171-5383
2014 (English)In: Journal of Chemical Education, ISSN 0021-9584, E-ISSN 1938-1328, Vol. 91, no 9, 1495-1497 p.Article in journal (Refereed) Published
Abstract [en]

Chemical vapor deposition (CVD) is a process commonly used for the synthesis of thin films for several important technological applications, for example, microelectronics, hard coatings, and smart windows. Unfortunately, the complexity and prohibitive cost of CVD equipment makes it seldom available for undergraduate chemistry students. Here, a simple CVD experiment designed to give hands-on experience with this technique using common chemical laboratory equipment is outlined. The experiment is suitable for an upper-level or graduate course on inorganic chemistry, materials chemistry or materials science. In the experiment, crystalline thin films of titanium nitride (TiN) are deposited using titanium tetrachloride, hydrogen, and nitrogen gas in an experimental setup based on a tithe furnace and common safety flasks. Typically, crystalline TiN films with some incorporation of TiO2 are deposited in this experiment. The experiment has been used in the teaching of both master and doctorial students.

Place, publisher, year, edition, pages
American Chemical Society, Division of Chemical Education , 2014. Vol. 91, no 9, 1495-1497 p.
Keyword [en]
Upper-Division Undergraduate; Laboratory Instructions; Inorganic Chemistry; Hands-On Learning/Manipulatives; Laboratory Equipment/Apparatus; Materials Science
National Category
Chemical Sciences
URN: urn:nbn:se:liu:diva-111455DOI: 10.1021/ed500183kISI: 000341963200038OAI: diva2:757256
Available from: 2014-10-21 Created: 2014-10-17 Last updated: 2015-03-11

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Pedersen, Henrik
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