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Electrical Response to Mechanical Deformations in Cr-SiOx Cermet Thin Films (Respuesta Eléctrica a las Deformaciones Mecánicas en Películas Delgadas del Cermet Cr-SiOx)
University of Buenos Aires, Argentina.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology. University of Buenos Aires, Argentina.ORCID iD: 0000-0003-3277-1945
University of Buenos Aires, Argentina.
University of Buenos Aires, Argentina.
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1996 (Spanish)In: Anales AFA, ISSN 1850 – 1158, Vol. 7, no 1, 137-140 p.Article in journal (Refereed) Published
Abstract [en]

Electrical properties and strain gauge factor of Cr/SiOx cermet films with compositions 50/50 and 70/30 wt% were investigated in order to evaluate their use in strain gauge devices. The films were deposited by flash evaporation. The microstructures and resulting phases were characterized by electron diffraction and electron microscopy. The influence of the thickness and deposition rate on the sheet resistance, the temperature coefficient of resistance and the gauge factor were investigated. The results are consistent with a mixed conduction mechanism with metallic and a thermally activated tunneling components, between interconnected and discrete conductive phases, respectively.

Abstract [es]

Se investigaron las propiedades eléctricas y el factor extensométrico de películas del cermet- Cr/SiOx en composiciones 50/50 y 70/30 % en peso, para evaluar su uso en dispositivos "strain gauge". Las películas fueron depositadas por evaporación "flash". Las estructuras y fases resultantes fueron caracterizadas por microscopía y difracción de electrones. Se estudió la influencia del espesor y la velocidad del depósito sobre la resistencia laminar, el coeficiente térmico de resistencia y el factor extensométrico. Los resultados son consistentes con un mecanismo de conducción mixto, con una componente metálica y otra por efecto túnel térmicamente activado, entre fases conductoras interconectadas y discretas, respectivamente.

Place, publisher, year, edition, pages
1996. Vol. 7, no 1, 137-140 p.
National Category
Physical Sciences
URN: urn:nbn:se:liu:diva-112932OAI: diva2:774491
Available from: 2014-12-23 Created: 2014-12-23 Last updated: 2015-01-13Bibliographically approved

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Broitman, Esteban
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Thin Film PhysicsThe Institute of Technology
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