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Room-temperature weak ferromagnetism of amorphous HfAlOx thin films deposited by pulsed laser deposition
Nanjing University, Peoples R China.
Nanjing University, Peoples R China.
Linköping University, Department of Physics, Chemistry and Biology, Biomolecular and Organic Electronics. Linköping University, The Institute of Technology.ORCID iD: 0000-0002-2582-1740
Nanjing University, Peoples R China.
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2006 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 89, no 24, 242504- p.Article in journal (Refereed) Published
Abstract [en]

The room-temperature weak ferromagnetism of amorphous HfAlOx thin films deposited by pulsed laser deposition on various substrates in oxygen-defective ambient is demonstrated. The magnetization is independent of film thickness, but depends on substrates and deposition temperatures. A magnetic moment of similar to 0.26 mu(B) per HfAlOx f.u. is recorded for HfAlOx films deposited under optimized conditions [deposited at 600 degrees C on (001) sapphire in high vacuum]. It is argued that interfacial defects are one of the possible sources of the weak ferromagnetism. (c) 2006 American Institute of Physics.

Place, publisher, year, edition, pages
American Institute of Physics (AIP) , 2006. Vol. 89, no 24, 242504- p.
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Physical Sciences
Identifiers
URN: urn:nbn:se:liu:diva-115718DOI: 10.1063/1.2405883ISI: 000242886500078OAI: oai:DiVA.org:liu-115718DiVA: diva2:796077
Available from: 2015-03-18 Created: 2015-03-18 Last updated: 2017-12-04

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Gao, Feng

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