When patches match - a statistical view on matching under illumination variation
2014 (English)In: 2014 22ND INTERNATIONAL CONFERENCE ON PATTERN RECOGNITION (ICPR), IEEE COMPUTER SOC , 2014, 4364-4369 p.Conference paper (Refereed)
We discuss matching measures (scores and residuals) for comparing image patches under unknown affine photometric (=intensity) transformations. In contrast to existing methods, we derive a fully symmetric matching measure which reflects the fact that both copies of the signal are affected by measurement errors (noise), not only one. As it turns out, this evolves into an eigensystem problem; however a simple direct solution for all entities of interest can be given. We strongly advocate for constraining the estimated gain ratio and the estimated mean value offset to realistic ranges, thus preventing the matching scheme from locking into unrealistic correspondences.
Place, publisher, year, edition, pages
IEEE COMPUTER SOC , 2014. 4364-4369 p.
, International Conference on Pattern Recognition, ISSN 1051-4651
Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:liu:diva-121335DOI: 10.1109/ICPR.2014.747ISI: 000359818004084ISBN: 978-1-4799-5208-3OAI: oai:DiVA.org:liu-121335DiVA: diva2:853439
22nd International Conference on Pattern Recognition (ICPR)