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Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation
Linköping University, Department of Physics, Chemistry and Biology. Linköping University, Faculty of Science & Engineering.
PVD Prod Inc, MA 01887 USA.
PVD Prod Inc, MA 01887 USA.
Helmholtz Zentrum Geesthacht, Germany.
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2015 (English)In: Review of Scientific Instruments, ISSN 0034-6748, E-ISSN 1089-7623, Vol. 86, no 9, 095113- p.Article in journal (Refereed) Published
Abstract [en]

We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (greater than50 keV), high photon flux (greater than10(12) ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (less than1 s) two-dimensional (2D) detector, permits time-resolved in situ structural analysis of thin film formation processes. The high-energy synchrotron-radiation based x-rays result in small scattering angles (less than11 degrees), allowing large areas of reciprocal space to be imaged with a 2D detector. The system has been designed for use on the 1-tonne, ultra-high load, high-resolution hexapod at the P07 High Energy Materials Science beamline at PETRA III at the Deutsches Elektronen-Synchrotron in Hamburg, Germany. The deposition system includes standard features of a typical UHV deposition system plus a range of special features suited for synchrotron radiation studies and industry-relevant processes. We openly encourage the materials research community to contact us for collaborative opportunities using this unique and versatile scientific instrument. (C) 2015 AIP Publishing LLC.

Place, publisher, year, edition, pages
AMER INST PHYSICS , 2015. Vol. 86, no 9, 095113- p.
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:liu:diva-122441DOI: 10.1063/1.4930243ISI: 000362573300065PubMedID: 26429486OAI: oai:DiVA.org:liu-122441DiVA: diva2:866735
Note

Funding Agencies|Swedish Research Council via the Rontgen Angstrom Cluster (RAC) Frame Program [2011-6505]; German Federal Ministry of Education and Research (BMBF) [05K12CG1]

Available from: 2015-11-03 Created: 2015-11-02 Last updated: 2017-12-01

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Schroeder, JeremyNäslund, Lars-ÅkeRogström, LinaGhafoor, NaureenOdén, MagnusBirch, Jens

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Schroeder, JeremyNäslund, Lars-ÅkeRogström, LinaGhafoor, NaureenOdén, MagnusBirch, Jens
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Department of Physics, Chemistry and BiologyFaculty of Science & EngineeringThin Film PhysicsNanostructured Materials
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