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Interruption of Electrical Conductivity of Titanium Dental Implants Suggests a Path Towards Elimination Of Corrosion
University of Washington, WA 98195 USA.
University of Washington, WA 98195 USA.
University of Washington, WA 98195 USA.
University of Washington, WA 98195 USA.
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2015 (English)In: PLoS ONE, ISSN 1932-6203, E-ISSN 1932-6203, Vol. 10, no 10, e0140393- p.Article in journal (Refereed) Published
Abstract [en]

Peri-implantitis is an inflammatory disease that results in the destruction of soft tissue and bone around the implant. Titanium implant corrosion has been attributed to the implant failure and cytotoxic effects to the alveolar bone. We have documented the extent of titanium release into surrounding plaque in patients with and without peri-implantitis. An in vitro model was designed to represent the actual environment of an implant in a patients mouth. The model uses actual oral microbiota from a volunteer, allows monitoring electrochemical processes generated by biofilms growing on implants and permits control of biocorrosion electrical current. As determined by next generation DNA sequencing, microbial compositions in experiments with the in vitro model were comparable with the compositions found in patients with implants. It was determined that the electrical conductivity of titanium implants was the key factor responsible for the biocorrosion process. The interruption of the biocorrosion current resulted in a 4-5 fold reduction of corrosion. We propose a new design of dental implant that combines titanium in zero oxidation state for osseointegration and strength, interlaid with a nonconductive ceramic. In addition, we propose electrotherapy for manipulation of microbial biofilms and to induce bone healing in peri-implantitis patients.

Place, publisher, year, edition, pages
PUBLIC LIBRARY SCIENCE , 2015. Vol. 10, no 10, e0140393- p.
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
URN: urn:nbn:se:liu:diva-122525DOI: 10.1371/journal.pone.0140393ISI: 000362962300089PubMedID: 26461491OAI: diva2:868032

Funding Agencies|National Institutes of Health [5 T90 D021984-03]; International Team for Implantology [954_2013]; National Science Foundation [454]

Available from: 2015-11-09 Created: 2015-11-06 Last updated: 2015-12-02

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Vagin, Mikhail
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Physics and ElectronicsFaculty of Science & Engineering
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