Vacuum arc plasma generation and thin film deposition from a TiB2 cathode
2015 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 107, no 18, 184103- p.Article in journal (Refereed) Published
We have studied the utilization of TiB2 cathodes for thin film deposition in a DC vacuum arc system. We present a route for attaining a stable, reproducible, and fully ionized plasma flux of Ti and B by removal of the external magnetic field, which leads to dissipation of the vacuum arc discharge and an increased active surface area of the cathode. Applying a magnetic field resulted in instability and cracking, consistent with the previous reports. Plasma analysis shows average energies of 115 and 26 eV, average ion charge states of 2.1 and 1.1 for Ti and B, respectively, and a plasma ion composition of approximately 50% Ti and 50% B. This is consistent with measured resulting film composition from X-ray photoelectron spectroscopy, suggesting a negligible contribution of neutrals and macroparticles to the film growth. Also, despite the observations of macroparticle generation, the film surface is very smooth. These results are of importance for the utilization of cathodic arc as a method for synthesis of metal borides. (C) 2015 AIP Publishing LLC.
Place, publisher, year, edition, pages
AMER INST PHYSICS , 2015. Vol. 107, no 18, 184103- p.
IdentifiersURN: urn:nbn:se:liu:diva-123139DOI: 10.1063/1.4935152ISI: 000364580800071OAI: oai:DiVA.org:liu-123139DiVA: diva2:877653
Funding Agencies|European Research Council under the European Community Seventh Framework Program (FP7)/ERC ; Swedish Research Council (VR) [642-2013-8020]; Knut and Alice Wallenberg Foundation; SSF synergy grant FUNCASE2015-12-072015-12-042016-01-14