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A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CNX thin film growth with different inert gases
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
Hungarian Academic Science, Hungary.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.ORCID iD: 0000-0002-4898-5115
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2016 (English)In: Diamond and related materials, ISSN 0925-9635, E-ISSN 1879-0062, Vol. 64, 13-26 p.Article in journal (Refereed) PublishedText
Abstract [en]

Reactive direct current magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HiPIMS) discharges of carbon in different inert gas mixtures (N-2/Ne, N-2/Ar, and N-2/Kr) were investigated for the growth of carbon-nitride (CNX) thin films. Ion mass spectrometry showed that energies of abundant plasma cations are governed by the inert gas and the N-2-to-inert gas flow ratios. The population of ion species depends on the sputter mode; HiPIMS yields approximately ten times higher flux ratios of ions originating from the target to process gas ions than DCMS. Exceptional are discharges in Ne with N-2-to-Ne flow ratios <20%. Here, cation energies and the amount of target ions are highest without influence on the sputter mode. CNX thin films were deposited in 14% N-2/inert gas mixtures at substrate temperatures of 110 degrees C and 430 degrees C. The film properties show a correlation to the substrate temperature, the applied inert gas and sputter mode. The mechanical performance of the films is mainly governed by their morphology and composition, but not by their microstructure. Amorphous and fullerene-like CN0.14 films exhibiting a hardness of similar to 15 GPa and an elastic recovery of similar to 90% were deposited at 110 degrees C in reactive Kr atmosphere by DCMS and HiPIMS.

Place, publisher, year, edition, pages
ELSEVIER SCIENCE SA , 2016. Vol. 64, 13-26 p.
Keyword [en]
Magnetron sputtering; Inert gases; Plasma analysis; Langmuir probe measurement; CNX film stress; CNX hardness
National Category
Inorganic Chemistry Condensed Matter Physics
Identifiers
URN: urn:nbn:se:liu:diva-128146DOI: 10.1016/j.diamond.2016.01.009ISI: 000374608100003OAI: oai:DiVA.org:liu-128146DiVA: diva2:929591
Note

Funding Agencies|Carl Tryggers Foundation for Scientific Research; Hungarian Academy of Sciences

Available from: 2016-05-19 Created: 2016-05-19 Last updated: 2016-08-31

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Available from 2017-01-12 00:00

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Schmidt, SusannWissting, JonasGreczynski, GrzegorzJanzén, ErikJensen, JensIvanov, Ivan GueorguievHultman, Lars
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Thin Film PhysicsFaculty of Science & EngineeringSemiconductor Materials
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Diamond and related materials
Inorganic ChemistryCondensed Matter Physics

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