Nitrogen-doped bcc-Cr films: Combining ceramic hardness with metallic toughness and conductivity
2016 (English)In: Scripta Materialia, ISSN 1359-6462, E-ISSN 1872-8456, Vol. 122, 40-44 p.Article in journal (Refereed) PublishedText
We report the first results on nanostructured N-doped bcc-Cr films exhibiting the unique combination of ceramic hardness with metallic toughness and electrical conductivity at unexpectedly low N concentrations, ~ 5 at.%. The Cr:N films are deposited at 200 C in N2/Ar mixtures by high-power pulsed magnetron sputtering using tunable time-domain control of Cr+ and Cr2+ ion fluxes incident at the film growth surface. Subplanted N atoms impede annealing of metal-ion induced point defects and hinder bcc-Cr grain growth, resulting in a material with a nearly isotropic nanostructure and atomically smooth surface, rather than typical Cr:N solid solutions consisting of faceted microcolumns. © 2016 Elsevier Ltd.
Place, publisher, year, edition, pages
Elsevier Ltd , 2016. Vol. 122, 40-44 p.
CrN, HIPIMS, Ion mass spectrometry, Magnetron sputtering, Resistivity, Thin films, Toughness, Transition-metal nitrides
IdentifiersURN: urn:nbn:se:liu:diva-129248DOI: 10.1016/j.scriptamat.2016.05.011ScopusID: 2-s2.0-84971328580OAI: oai:DiVA.org:liu-129248DiVA: diva2:936766
Funding Agencies|#2011.0143, Swedish Research Council; 2013-4018, Swedish Research Council; 2014-5790, Swedish Research Council2016-06-142016-06-142016-08-31