High-temperature nanoindentation of epitaxial ZrB2 thin films
2016 (English)In: Scripta Materialia, ISSN 1359-6462, E-ISSN 1872-8456, Vol. 124, 117-120 p.Article in journal (Refereed) PublishedText
We use in-situ heated nanoindentation to investigate the high-temperature nanomechanical properties of epitaxial and textured ZrB2 films deposited by magnetron sputtering. Epitaxial films deposited on 4H-SiC(0001) show a hardness decrease from 47 GPa at room temperature to 33 GPa at 600 °C, while the reduced elastic modulus does not change significantly. High resolution electron microscopy (HRTEM) with selected area electron diffraction of the indented area in a 0001-textured film reveals a retained continuous ZrB2 film and no sign of crystalline phase transformation, despite massive deformation of the Si substrate. HRTEM analysis supports the high elastic recovery of 96% in the films.
Place, publisher, year, edition, pages
Elsevier, 2016. Vol. 124, 117-120 p.
Sputtering; Borides; Ceramic thin film; Nanoindentation; Transmission electron microscopy
IdentifiersURN: urn:nbn:se:liu:diva-130917DOI: 10.1016/j.scriptamat.2016.06.033OAI: oai:DiVA.org:liu-130917DiVA: diva2:956678