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  • 1.
    Ahmad, Mohammed Metwally Gomaa
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. National Research Centre, Egypt.
    Yazdi, Gholamreza
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Schmidt, Susann
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Boshta, M.
    National Research Centre, Egypt.
    Khranovskyy, Volodymyr
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Eriksson, Fredrik
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Farag, B. S.
    National Research Centre, Egypt.
    Osman, M. B. S.
    Ain Shams University, Egypt.
    Yakimova, Rositsa
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Effect of precursor solutions on the structural and optical properties of sprayed NiO thin films2017In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 64, p. 32-38Article in journal (Refereed)
    Abstract [en]

    Nickel oxide thin films were deposited by a simple and low-cost spray pyrolysis technique using three different precursors: nickel nitrate, nickel chloride, and nickel acetate on corning glass substrates. X-ray diffraction show that the NiO films are polycrystalline and have a cubic crystal structure, although predominantly with a preferred 111-orientation in the growth direction and a random in-plane orientation. The deconvolution of the Ni 2p and O 1s core level X-ray photoelectron-spectra of nickel oxides produced by using different precursors indicates a shift of the binding energies. The sprayed NiO deposited from nickel nitrate has an optical transmittance in the range of 60-65% in the visible region. The optical band gap energies of the sprayed NiO films deposited from nickel nitrate, nickel chloride and nickel acetate are 3.5, 3.2 and 3.43 eV respectively. Also, the extinction coefficient and refractive index of NiO films have been calculated from transmittance and reflectance measurements. The average value of refractive index for sprayed films by nickel nitrate, nickel chloride and nickel acetate are 2.1, 1.6 and 1.85 respectively. It is revealed that the band gap and refractive index of NiO films by using nickel nitrate corresponds to the commonly reported values. We attribute the observed behavior in the optical band gap and optical constants as due to the change of the Ni/O ratio.

  • 2.
    Ali Soomro, Razium
    et al.
    University of Sindh, Pakistan; University of Bristol, England.
    Nafady, Aynam
    King Saud University, Saudi Arabia; Sohag University, Egypt.
    Hussain Ibupoto, Zafar
    University of Sindh, Pakistan.
    Tufail Hussain Sirajuddin; Sherazi, Syed
    University of Sindh, Pakistan.
    Willander, Magnus
    Linköping University, Department of Science and Technology, Physics and Electronics. Linköping University, Faculty of Science & Engineering.
    Ishaq Abro, Muhammad
    Mehran University of Engn and Technology, Pakistan.
    Development of sensitive non-enzymatic glucose sensor using complex nanostructures of cobalt oxide2015In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 34, p. 373-381Article in journal (Refereed)
    Abstract [en]

    The study reports the synthesis of cobalt oxide (Co3O4) nanostructures and their application in enzyme free electrochemical sensing of glucose. The synthesized nanostructures were elaborately characterized via number of analytical techniques including scanning electron microscopy, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR). The as-synthesized nanostructures of Co3O4 were found to exhibited nanodisc like morphology with the size dimension in range of 300-500 nm. The obtained morphological features were evaluated for their electrochemical potential towards oxidation of glucose which enabled development of sensitive (27.33 mu A mM(-1) cm(-2)), and stable enzyme free glucose sensor. In addition, the developed sensor showed excellent linearity (r(2)=0.9995), wide detection range (0.5-5.0 mM), lower detection limit (0.8 mu M) and extreme selectivity towards glucose in the presence of common interferents like dopamine (DP), ascorbic acid (AA) and uric acid (UA). The successfully application of developed sensor for real blood glucose analysis further reflects its capability for routine glucose measurement.

  • 3. Duteil, F.
    et al.
    Du, Chun-Xia
    Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology.
    Joelsson, K.B.
    Persson, Per
    Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.
    Hultman, Lars
    Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.
    Pozina, Galia
    Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Materials Science .
    Ni, Wei-Xin
    Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Surface and Semiconductor Physics .
    Hansson, Göran
    Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Surface and Semiconductor Physics .
    Luminescence and microstructure of Er/O co-doped Si structures grown by MBE using Er and SiO evaporation2000In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 3, no 5-6, p. 523-528Article in journal (Refereed)
    Abstract [en]

    Er and O co-doped Si structures have been prepared using molecular-beam epitaxy (MBE) with fluxes of Er and O obtained from Er and silicon monoxide (SiO) evaporation in high-temperature cells. The incorporation of Er and O has been studied for concentrations of up to 2×1020 and 1×1021 cm-3, respectively. Surface segregation of Er can take place, but with O co-doping the segregation is suppressed and Er-doped layers without any indication of surface segregation can be prepared. Si1-xGex and Si1-yCy layers doped with Er/O during growth at different substrate temperatures show more defects than corresponding Si layers. Strong emission at 1.54µm associated with the intra-4f transition of Er3+ ions is observed in electroluminescence (EL) at room temperature in reverse-biased p-i-n-junctions. To optimize the EL intensity we have varied the Er/O ratio and the temperature during growth of the Er/O-doped layer. Using an Er-concentration of around 1×1020 cm-3 we find that Er/O ratios of 1:2 or 1:4 give higher intensity than 1:1 while the stability with respect to breakdown is reduced for the highest used O concentrations. For increasing growth temperatures in the range 400-575 °C there is an increase in the EL intensity. A positive effect of post-annealing on the photoluminescence intensity has also been observed.

  • 4.
    Jacob, AP
    et al.
    Chalmers.
    Myrberg, T
    Chalmers.
    Friesel, M
    Chalmers.
    Nour, Omer
    Chalmers.
    Willander, Magnus
    Chalmers.
    Serincan, U
    Middle East Technical University.
    Turan, R
    Middle East Technical University.
    Ultrathin oxynitridation process through ion implantation in a poly Si1-xGex gate MOS capacitor2003In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 6, no 03-Jan, p. 37-41Article in journal (Refereed)
    Abstract [en]

    Effect of temperature and time of heat treatment on the distribution of ion-implanted nitrogen in poly Si0.65Ge0.35 gate MOS samples was studied. Secondary ion mass spectrometry (SIMS) was used for the qualitative analysis of the nitrogen distribution. Rapid thermal processing was carried out for a temperature range of 950-1070degreesC for the redistribution of ions. The nitrogen implantation doses were 5 x 10(14) cm(-2), 2 x 10(15) cm(-2) and 5 x 10(15) cm(-2), all with an implantation energy of 50 keV. For a uniform distribution of nitrogen in the SiO2 region, an optimal temperature at a well calibrated time must be applied and this depends on the implantation dose. For medium and high concentrations the optimal conditions were 1050degreesC and 15s, and 1070degreesC and 15s, respectively. A uniform nitrogen distribution could be obtained throughout the SiO2 film. Prolonged heat treatment can cause degradation of the oxide layer and movement of the nitrogen and oxygen into the channel and the poly-Si0.65Ge0.35 layer.

  • 5.
    Kaushik, Priya Darshni
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Jamia Millia Islamia, India.
    Aziz, Anver
    Jamia Millia Islamia, India.
    Siddiqui, Azher M.
    Jamia Millia Islamia, India.
    Greczynski, Grzegorz
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Jafari, Mohammad Javad
    Linköping University, Department of Physics, Chemistry and Biology, Molecular Physics. Linköping University, Faculty of Science & Engineering.
    Lakshmi, G. B. V. S.
    Interuniv Accelerator Centre, India.
    Avasthi, D. K.
    Interuniv Accelerator Centre, India; Amity Institute Nanotechnol, India.
    Syväjärvi, Mikael
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Yazdi, Gholamreza
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Modifications in structural, optical and electrical properties of epitaxial graphene on SiC due to 100 MeV silver ion irradiation2018In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 74, p. 122-128Article in journal (Refereed)
    Abstract [en]

    Epitaxial graphene (EG) on silicon carbide (SiC) is a combination of two robust materials that are excellent candidates for post silicon electronics. In this work, we systematically investigate structural changes in SiC substrate as well as graphene on SiC and explore the potential for controlled applications due to 100 MeV silver swift heavy ion (SHI) irradiation. Raman spectroscopy showed fluence dependent decrease in intensity of first and second order modes of SiC, along with decrease in Relative Raman Intensity upon ion irradiation. Similarly, Fourier-transform infrared (FTIR) showed fluence dependent decrease in Si-C bond intensity with presence of C = O, Si-O-Si, Si-Si and C-H bond showing introduction of vacancy, substitutional and sp(3) defects in both graphene and SiC. C1s spectra in XPS shows decrease in C = C graphitic peak and increase in interfacial layer following ion irradiation. Reduction in monolayer coverage of graphene after ion irradiation was observed by Scanning electron microscopy (SEM). Further, UV-Visible spectroscopy showed increase in absorbance of EG on SiC at increasing fluence. I-V characterization showed fluence dependent increase in resistance from 62.9 O in pristine sample to 480.1 Omega in sample irradiated at 6.6 x 10(12) ions/cm(2) fluence. The current study demonstrates how SHI irradiation can be used to tailor optoelectronic applicability of EG on SiC.

  • 6.
    Khranovskyy, Volodymyr
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Sendova, Mariana
    New Coll Florida, FL 34243 USA.
    Hosterman, Brian
    New Coll Florida, FL 34243 USA.
    McGinnis, Navin
    New Coll Florida, FL 34243 USA.
    Shtepliuk, Ivan
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Yakimova, Rositsa
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Temperature dependent study of basal plane stacking faults in Ag:ZnO nanorods by Raman and photoluminescence spectroscopy2017In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 69, p. 62-67Article in journal (Refereed)
    Abstract [en]

    We report the specific features of basal plane stacking faults (BSFs) in ZnO nanorods (NRs), studied by temperature dependent photoluminescence and Raman spectroscopy. At low temperature (4 K) the intense band of emission at 3.321 eV is attributed to the presence of BSFs defects and Ag as an acceptor dopant in ZnO. This specific peak red-shifts with the temperature increase, occupying the position 3.210 eV at RT. The nature of the emission is explained as exciton recombination of the electrons, confined in the homo-heterojunction QW, with the holes, localized near the Ag atoms close to SFs. Raman spectroscopy revealed that Ag: ZnO nanorods have slightly downshifted positions of the modes 330 cm(-1) and 440 cm(-1) by 4 cm(-1), which we explain as due to the presence of BSFs. It was also observed, that the longitudinal optical phonon mode ALO, which is common polar mode for ZnO, was not detected by Raman spectroscopy in the samples with high BSFs density. This feature can be explained as due to existence of the bound charge induced by the BSFs in the NRs.

  • 7.
    Lin, Li
    et al.
    Tech Univ Denmark, Denmark.
    Ou, Yiyu
    Tech Univ Denmark, Denmark.
    Jokubavicius, Valdas
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Syväjärvi, Mikael
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Liang, Meng
    Chinese Acad Sci, Peoples R China.
    Liu, Zhiqiang
    Chinese Acad Sci, Peoples R China.
    Yi, Xiaoyan
    Chinese Acad Sci, Peoples R China.
    Schuh, Philipp
    Univ Erlangen Nurnberg, Germany.
    Wellmann, Peter
    Univ Erlangen Nurnberg, Germany.
    Herstrom, Berit
    Tech Univ Denmark, Denmark.
    Jensen, Flemming
    Tech Univ Denmark, Denmark.
    Ou, Haiyan
    Tech Univ Denmark, Denmark.
    An adhesive bonding approach by hydrogen silsesquioxane for silicon carbide-based LED applications2019In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 91Article in journal (Refereed)
    Abstract [en]

    We report an adhesive bonding approach using hydrogen silsesquioxane (HSQ) for silicon carbide (SiC) samples. A hybrid light-emitting diode (LED) was successfully fabricated through bonding a near-ultraviolet (NUV) LED grown on a commercial 4H-SiC substrate to a free-standing boron-nitrogen co-doped fluorescent-SiC epi-layer. The bonding quality and the electrical performance of the hybrid LED device were characterized. Neither voids nor defects were observed which indicates a good bonding quality of the proposed HSQ approach. A strong warm white emission was successfully obtained from the hybrid LED through an electric current injection of 30 mA.

  • 8.
    Monemar, Bo
    et al.
    Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Materials Science .
    Paskov, Plamen
    Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Materials Science .
    Bergman, Peder
    Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Materials Science .
    Toropov, A.A.
    Shubina, T.V.
    Figge, S.
    Paskova, T.
    Hommel, D.
    Usui, A.
    Iwaya, M.
    Kamiyama, S.
    Amano, H.
    Akasaki, I.
    Optical signatures of dopants in GaN2006In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 9, no 1-3, p. 168-174Article in journal (Refereed)
    Abstract [en]

    The characteristic optical spectra for shallow donors and acceptors in GaN are discussed. The most accurate photoluminescence (PL) data are obtained from samples grown on freestanding GaN substrates, where strain shifts are absent and a low spectroscopic line width is obtained. Recent PL data for excitons bound to the O and Si donors are discussed in some detail, giving accurate values for the binding energies and excited bound donor states. The Mg-acceptor is the most important one for p-doping, but the related optical spectra are controversial. We show that there are two acceptors present in Mg-doped GaN, with two different acceptor bound exciton peaks, and also two corresponding lower energy donor-acceptor pair spectra. We give tentative evidence for their interpretation. © 2006 Elsevier Ltd. All rights reserved.

  • 9.
    Muhammad, Junaid
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Chen, Yen-Ting
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Palisaitis, Justinas
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Garbrecht, Magnus
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Hsiao, Ching-Lien
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Persson, Per
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Liquid-target Reactive Magnetron Sputter Epitaxy of High Quality GaN(0001ɸ)ɸ Nanorods on Si(111)2015In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 39, p. 702-710Article in journal (Refereed)
    Abstract [en]

    Direct current magnetron sputter epitaxy with a liquid Ga sputtering target hasbeen used to grow single-crystal GaN(0001) nanorods directly on Si(111)substrates at different working pressures ranging from 5 to 20 mTorr of pure N2,.The as-grown GaN nanorods exhibit very good crystal quality from bottom to topwithout stacking faults, as determined by transmission electron microscopy. Thecrystal quality is found to increase with increasing working pressure. X-raydiffraction results show that all the rods are highly (0001)-oriented. Thenanorods exhibit an N-polarity, as determined by convergent beam electrondiffraction methods. Sharp and well-resolved 4 K photoluminescence peaks at ~3.474 eV with a FWHM ranging from 1.7 meV to 35 meV are attributed to theintrinsic GaN band edge emission and corroborate the superior structuralproperties of the material. Texture measurements reveal that the rods haverandom in-plane orientation when grown on Si(111) with native oxide, while theyhave an in-plane epitaxial relationship of GaN[110] // Si[110] when grown onsubstrates without surface oxide.

  • 10.
    Shtepliuk, Ivan
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ivanov, Ivan Gueorguiev
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Iakimov, Tihomir
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Yakimova, Rositsa
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Kakanakova-Gueorguieva, Anelia
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Fiorenza, Patrick
    CNR IMM, Italy.
    Giannazzo, Filippo
    CNR IMM, Italy.
    Raman probing of hydrogen-intercalated graphene on Si-face 4H-SiC2019In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 96, p. 145-152Article in journal (Refereed)
    Abstract [en]

    We report the results of in-depth Raman study of quasi-free-standing monolayer graphene on the (0001) Si- face of 4H-SiC, which contains similar to 0.1-2.10(11) cm(-2) sp(3) defects that have been introduced by hydrogen intercalation. The nature of the intercalation-induced defects is elucidated and ascribed to the formation of the C-H bonds. At the higher intercalation temperature in the formed monolayer graphene the defect-related Raman scattering displays a great enhancement and new spectral features attributed to D and D+D modes appear. Comprehensive statistical analysis of the Raman data enabled us to estimate the homogeneity of the Raman scattering processes and to separate strain and doping effects. Analysis of the compressive strain and carrier density maps revealed that the intercalation temperature of 900 degrees C and intercalation time of 1 h are more favorable conditions for conversion of the buffer layer to uniformly relaxed and p-doped monolayer graphene in comparison to annealing at 1100 degrees C for 30 min.

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