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  • 1.
    Alami, Jones
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Plasma och beläggningsfysik. Linköpings universitet, Tekniska högskolan.
    Eklund, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Wilhelmsson, O.
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
    Jansson, U.
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Helmersson, Ulf
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Plasma och beläggningsfysik. Linköpings universitet, Tekniska högskolan.
    High-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target2006Ingår i: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 515, nr 4, s. 1731-1736Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We have deposited Ti-Si-C thin films using high-power impulse magnetron sputtering (HIPIMS) from a Ti3SiC2 compound target. The as-deposited films were composite materials with TiC as the main crystalline constituent. X-ray diffraction and photoelectron spectroscopy indicated that they also contained amorphous SiC, and for films deposited on inclined substrates, crystalline Ti5Si3Cx. The film morphology was dense and flat, while films deposited with dc magnetron sputtering under comparable conditions were rough and porous. Due to the high degree of ionization of the sputtered species obtained in HIPIMS, it is possible to control the film composition, in particular the C content, by tuning the substrate inclination angle, the Ar process pressure, and the bias voltage.

  • 2.
    Eklund, Per
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Wilhelmsson, Ola
    Uppsala universitet.
    Jansson, Ulf
    Uppsala universitet.
    Isberg, Peter
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Synthesis and characterization of Ti-Si-C compounds for electrical contact applications2005Ingår i: IEEE Holm Conference on Electrical Contacts,2005, Piscataway: IEEE , 2005, s. 277-283Konferensbidrag (Refereegranskat)
  • 3.
    Eklund, Per
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Wilhelmsson, Ola
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Sweden.
    Isberg, Peter
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Birch, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Persson, Per O. Å.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Jansson, Ulf
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Sweden.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Structural, electrical, and mechanical properties of nc-TiC/a-SiC nanocomposite thin films2005Ingår i: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 23, nr 6, s. 2486-2495Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We have synthesized Ti–Si–C nanocomposite thin films by dc magnetron sputtering from a Ti3SiC2 compound target in an Ar discharge on Si(100), Al2O3(0001), and Al substrates at temperatures from room temperature to 300  °C. Electron microscopy, x-ray diffraction, and x-ray photoelectron spectroscopy showed that the films consisted of nanocrystalline (nc-) TiC and amorphous (a-) SiC, with the possible presence of a small amount of noncarbidic C. The growth mode was columnar, yielding a nodular film-surface morphology. Mechanically, the films exhibited a remarkable ductile behavior. Their nanoindentation hardness and E-modulus values were 20 and 290  GPa, respectively. The electrical resistivity was 330  µ  cm for optimal Ar pressure (4  mTorr) and substrate temperature (300  °C). The resulting nc-TiC/a-SiC films performed well as electrical contact material. These films' electrical-contact resistance against Ag was remarkably low, 6  µ at a contact force of 800  N compared to 3.2  µ for Ag against Ag. The chemical stability of the nc-TiC/a-SiC films was excellent, as shown by a Battelle flowing mixed corrosive-gas test, with no N, Cl, or S contaminants entering the bulk of the films.

  • 4.
    Eklund, Per
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Murugaiah, Anand
    Department of Materials Science and Engineering, Drexel University, Philadelphia, USA.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Czigany, Zsolt
    Research Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, Budapest, Hungary.
    Frodelius, Jenny
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Barsoum, Michel W.
    Department of Materials Science and Engineering, Drexel University, Philadelphia, USA.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Homoepitaxial growth of Ti-Si-C MAX-phase thin films on bulk Ti3SiC2 substrates2007Ingår i: Journal of Crystal Growth, ISSN 0022-0248, E-ISSN 1873-5002, Vol. 304, nr 1, s. 264-269Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Ti3SiC2 films were grown on polycrystalline Ti3SiC2 bulk substrates using DC magnetron sputtering. The crystallographic orientation of the film grains is shown to be determined by the respective substrate-grain orientation through homoepitaxial MAX-phase growth. For a film composition close to Ti:Si:C=3:1:2, the films predominantly consist of MAX phases, both Ti3SiC2 and the metastable Ti4SiC3. Lower Si content resulted in growth of TiC with Ti3SiC2 as a minority phase. Thus, MAX-phase heterostructures with preferred crystallographic relationships can also be realized.

  • 5.
    Eklund, Per
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Palmquist, Jens-Petter
    Uppsala universitet.
    Wilhelmsson, Ola
    Uppsala universitet.
    Jansson, Ulf
    Uppsala universitet.
    Emmerlich, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Högberg, Hans
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Comment on "Pulsed laser deposition and properties of Mn+1AXx phase formulated Ti3SiC2 thin films"2004Ingår i: Tribology letters, ISSN 1023-8883, E-ISSN 1573-2711, Vol. 17, nr 4, s. 977-978Artikel i tidskrift (Övrigt vetenskapligt)
    Abstract [en]

    A recent paper by Hu et al. claimed synthesis of the MAX-phase Ti3SiC2at 100-300 °C using pulsed laser deposition. In this comment, we find that the evidence presented by Hu et al. is insufficient to show Ti3SiC2 formation. In fact, there is a simpler interpretation of their results from X-ray diffraction and transmission electron microscopy, namely that the material produced is a cubic TiC-based compound.

  • 6.
    Eklund, Per
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Palmquist, JP
    Department of Materials Chemistry, The Angström Laboratory, Uppsala University, Uppsala, Swede.
    Wilhelmsson, O
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Jansson, U
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Emmerlich, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Högberg, Hans
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Comment on "Pulsed laser deposition and properties of M(n+1)AX(x) phase formulated Ti3SiC2 thin films''2004Ingår i: Tribology letters, ISSN 1023-8883, E-ISSN 1573-2711, Vol. 17, nr 4, s. 977-978s. 977-978Artikel i tidskrift (Övrigt vetenskapligt)
    Abstract [en]

    A recent paper by Hu et al. claimed synthesis of the MAX-phase Ti3SiC2 at 100 - 300 degreesC using pulsed laser deposition. In this comment, we find that the evidence presented by Hu et al. is insufficient to show Ti3SiC2 formation. In fact, there is a simpler interpretation of their results from X-ray diffraction and transmission electron microscopy, namely that the material produced is a cubic TiC-based compound.

  • 7.
    Eklund, Per
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Virojanadara, Chariya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Johansson, Leif
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Photoemission studies of Ti3SiC2 and nanocrystalline-TiC/amorphous-SiC nanocomposite thin films2006Ingår i: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 74, nr 4, s. 045417-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Photoemissionstudies using synchrotron radiation have been performed on epitaxial Ti3SiC2(0001)and compound nanocrystalline (nc-)TiC/amorphous (a-)SiC thin films deposited by magnetronsputtering. As-introduced samples were found to be covered by surfaceoxides, SiOx and TiOx. These oxides could be removed byin-situ annealing to ~1000  °C. For as-annealed Ti3SiC2(0001), surface Si wasobserved and interpreted as originating from decomposition of Ti3SiC2 throughSi out-diffusion. For nc-TiC/a-SiC annealed in situ to ~1000  °C, thesurface instead exhibited a dominant contribution from graphitic carbon, alsowith the presence of Si, due to C and Siout-diffusion from the a-SiC compound or from grain boundaries.

  • 8.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    MAX phase thin films: unique multifunctional ceramics with the elements Ti, Si, Ge, Sn, and C2006Doktorsavhandling, sammanläggning (Övrigt vetenskapligt)
    Abstract [en]

    Mn+1AXn phases are ternary carbides or nitrides (X) consisting of an early transition metal (M), and (A)- group element (group III-V). They combine ceramic and metallic properties with high oxidation and thermal shock resistance as well as low resistivity. Depending on stoichiometry, they can be classified as 211 (n=1), 312 (n=2), and 413 (n=3) phases. The main purpose of this Thesis is to present the synthesis by epitaxial growth of Tin+1ACn (A: Si, Ge, Sn; n=1-3) thin solid films and to report on the material’s intrinsic mechanical and electrical properties. DC magnetron sputtering of MAX-phase carbides from three individual elemental targets is presented as an original and successful deposition method. The emphasis is on the archetypical Ti3SiC2, but I also demonstrate growth of a wide range of other single-crystal Tin+1ACn thin films, including Ti2GeC, Ti3GeC2, Ti2SnC, previously available only in bulk form, as well as completely new phases of Ti4SiC3, Ti4GeC3, and Ti3SnC2, together with some intergrown 523 (211+312) and 725 (312+413) structures.

    A combination of x-ray diffraction (XRD), transmission electron micrcoscopy (TEM) analysis, x-ray photoelectron spectroscopy, elastic recoil detection analysis, and Rutherford backscattering spectrometry of the films reveal single-phase and epitaxial growth of Tin+1SiCn(0001) (n = 2, 3) and Ti2GeC MAX phases at substrate temperatures (TS) above 700 to 1000 °C. For TS = 500 – 700 °C, Si is accommodated at twin boundaries between TiC(111) planes. Depositions at TS = RT – 350 °C yield nc-TiC/SiC nanocomposite films or TiC growth with substitutionally incorporated Si due to kinetic constraints. Vacuum-annealing with in situ XRD measurements of the films between 800 – 1400 °C revealed a thermal stability of up to ~1000 °C. A MAX-phase decomposition model is presented within this Thesis. It starts by Si out-diffusion and evaporation from the surface between ~1000 – 1100 °C and is accompanied by any O uptake and SiO evaporation. Subsequently, the free Ti3C2 slabs relax and undergo detwinning. The decomposition process is ended by TiC0.67 formation by C redistribution and recrystallization with void formation.

    The mechanical response to deformation was tested on Ti3SiC2(0001) films using nanoindentation. Small applied normal forces yielding a minimum on plastic deformation reveal hardness values of up to 24 GPa, which decrease with larger indentation depths. Young’s moduli between 320 and 343 GPa were measured. Atomic force microscopy (AFM) surface imaging and Focused Ion Beam cross-sectional TEM studies confirm that mechanical deformation in this ductile ceramic takes place by kink formation and delamination along basal planes, due to edge dislocation pile-ups forming the kink boundaries resulting in local deformation-energy dissipation. Friction measurements yield a friction coefficient (μ) of 0.1 for normal loads of FN = 100-200 μN. μ increases to 0.8 with increased FN up to 0.24 N, as delamination and kinking are introduced accompanied by third-body abrasion as shown by scanning electron microscopy. By comparing electrical resistivity values obtained by four-point probe measurements, it is found that all studied MAX-phase thin film systems exhibit good conduction properties.

    Delarbeten
    1. Growth of Ti3SiC2 thin films by elemental target magnetron sputtering
    Öppna denna publikation i ny flik eller fönster >>Growth of Ti3SiC2 thin films by elemental target magnetron sputtering
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    2004 (Engelska)Ingår i: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 96, nr 9, s. 4817-4826Artikel i tidskrift (Refereegranskat) Published
    Abstract [en]

    Epitaxial Ti3SiC2(0001) thin films have been deposited by dc magnetron sputtering from three elemental targets of Ti, C, and Si onto MgO(111) and Al2O3(0001) substrates at temperatures of 800–900 °C. This process allows composition control to synthesize Mn+1AXn (MAX) phases (M: early transition metal; A: A-group element; X: C and∕or N; n=1–3) including Ti4SiC3. Depositions on MgO(100) substrates yielding the Ti–Si–C MAX phases with (105), as the preferred orientation. Samples grown at different substrate temperatures, studied by means of transmission electron microscopy and x-ray diffraction investigations, revealed the constraints of Ti3SiC2 nucleation due to kinetic limitations at substrate temperatures below 700 °C. Instead, there is a competitive TiCx growth with Si segregation to form twin boundaries or Si substitutional incorporation in TiCx. Physical properties of the as-deposited single-crystal Ti3SiC2 films were determined. A low resistivity of 25 μΩ cm was measured. The Young’s modulus, ascertained by nanoindentation, yielded a value of 343–370 GPa. For the mechanical deformation response of the material, probing with cube corner and Berkovich indenters showed an initial high hardness of almost 30 GPa. With increased maximum indentation loads, the hardness was observed to decrease toward bulk values as the characteristic kink formation sets in with dislocation ordering and delamination at basal planes.

    Nationell ämneskategori
    Naturvetenskap
    Identifikatorer
    urn:nbn:se:liu:diva-29682 (URN)10.1063/1.1790571 (DOI)15069 (Lokalt ID)15069 (Arkivnummer)15069 (OAI)
    Tillgänglig från: 2009-10-09 Skapad: 2009-10-09 Senast uppdaterad: 2017-12-13
    2. Mn+1AXn phases in the Ti-Si-C system studied by thin-film synthesis and ab initio calculations
    Öppna denna publikation i ny flik eller fönster >>Mn+1AXn phases in the Ti-Si-C system studied by thin-film synthesis and ab initio calculations
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    2004 (Engelska)Ingår i: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 70, nr 16, s. 165401-Artikel i tidskrift (Refereegranskat) Published
    Abstract [en]

    Thin films of Mn+1AXn layered compounds in the Ti-Si-C system were deposited on MgO(111) and Al2O3(0001) substrates held at 900°C using dc magnetron sputtering from elemental targets of Ti, Si, and C. We report on single-crystal and epitaxial deposition of Ti3SiC2 (the previously reported MAX phase in the Ti-Si-C system), a previously unknown MAX phase Ti4SiC3 and another type of structure having the stoichiometry of Ti5Si2C3 and Ti7Si2C5. The latter two structures can be viewed as an intergrowth of 2 and 3 or 3 and 4 M layers between each A layer. In addition, epitaxial films of Ti5Si3Cx were deposited and Ti5Si4 is also observed. First-principles calculations, based on density functional theory (DFT) of Tin+1SiCn for n=1,2,3,4 and the observed intergrown Ti5Si2C3 and Ti7Si2C5 structures show that the calculated difference in cohesive energy between the MAX phases reported here and competing phases (TiC, Ti3SiC2, TiSi2, and Ti5Si3) are very small. This suggests that the observed Ti5Si2C3 and Ti7Si2C5 structures at least should be considered as metastable phases. The calculations show that the energy required for insertion of a Si layer in the TiC matrix is independent of how close the Si layers are stacked. Hardness and electrical properties can be related to the number of Si layers per Ti layer. This opens up for designed thin film structures the possibility to tune properties.

    Nationell ämneskategori
    Naturvetenskap
    Identifikatorer
    urn:nbn:se:liu:diva-29680 (URN)10.1103/PhysRevB.70.165401 (DOI)15067 (Lokalt ID)15067 (Arkivnummer)15067 (OAI)
    Tillgänglig från: 2009-10-09 Skapad: 2009-10-09 Senast uppdaterad: 2017-12-13
    3. Kink formation around indents in laminated Ti3SiC2 thin films studied in the nanoscale
    Öppna denna publikation i ny flik eller fönster >>Kink formation around indents in laminated Ti3SiC2 thin films studied in the nanoscale
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    2003 (Engelska)Ingår i: Scripta Materialia, ISSN 1359-6462, E-ISSN 1872-8456, Vol. 49, nr 2, s. 155-160Artikel i tidskrift (Refereegranskat) Published
    Abstract [en]

    The deformation mechanisms in ductile Ti3SiC2(0 0 0 1) single-crystal films have been analysed by nanoindentation and cross-sectional transmission electron microscopy. Permanent deformation includes formation of kink bands, as the nanolaminated material buckles out at the perimeter of the contact area, and delamination cracks. Evidence is presented for incipient kink-band formation.

    Nyckelord
    Carbides, Nanoindentation, Nanolaminated MAX phases, Thin films, Transmission electron microscopy
    Nationell ämneskategori
    Teknik och teknologier
    Identifikatorer
    urn:nbn:se:liu:diva-46574 (URN)10.1016/S1359-6462(03)00214-8 (DOI)
    Tillgänglig från: 2009-10-11 Skapad: 2009-10-11 Senast uppdaterad: 2017-12-13
    4. Thermal stability of Ti3SiC2 thin films
    Öppna denna publikation i ny flik eller fönster >>Thermal stability of Ti3SiC2 thin films
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    2007 (Engelska)Ingår i: Acta Materialia, ISSN 1359-6454, E-ISSN 1873-2453, Vol. 55, nr 4, s. 1479-1488Artikel i tidskrift (Refereegranskat) Published
    Abstract [en]

    The thermal stability of Ti3SiC2(0 0 0 1) thin films is studied by in situ X-ray diffraction analysis during vacuum furnace annealing in combination with X-ray photoelectron spectroscopy, transmission electron microscopy and scanning transmission electron microscopy with energy dispersive X-ray analysis. The films are found to be stable during annealing at temperatures up to ∼1000 °C for 25 h. Annealing at 1100–1200 °C results in the rapid decomposition of Ti3SiC2 by Si out-diffusion along the basal planes via domain boundaries to the free surface with subsequent evaporation. As a consequence, the material shrinks by the relaxation of the Ti3C2 slabs and, it is proposed, by an in-diffusion of O into the empty Si-mirror planes. The phase transformation process is followed by the detwinning of the as-relaxed Ti3C2 slabs into (1 1 1)-oriented TiC0.67 layers, which begin recrystallizing at 1300 °C. Ab initio calculations are provided supporting the presented decomposition mechanisms.

    Nyckelord
    Ti3SiC2 thin films, Phase transformations, X-ray diffraction, Transmission electron microscopy, Ab initio electron theory
    Nationell ämneskategori
    Naturvetenskap
    Identifikatorer
    urn:nbn:se:liu:diva-14478 (URN)10.1016/j.actamat.2006.10.010 (DOI)
    Tillgänglig från: 2007-05-14 Skapad: 2007-05-14 Senast uppdaterad: 2017-12-13
    5. Micro and macroscale tribological behavior of epitaxial Ti3SiC2 thin films
    Öppna denna publikation i ny flik eller fönster >>Micro and macroscale tribological behavior of epitaxial Ti3SiC2 thin films
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    2008 (Engelska)Ingår i: Wear, ISSN 0043-1648, E-ISSN 1873-2577, Vol. 264, nr 11-12, s. 914-919Artikel i tidskrift (Refereegranskat) Published
    Abstract [en]

    Ti3SiC2(0 0 0 1) thin films prepared by magnetron sputtering were investigated for their response to tribomechanical strain induced during ball-on-disk experiments with 6 mm alumina balls and scratch tests with a 1 μm cono-spherical diamond tip. Normal loads of 100 μN to 0.24 N were applied resulting in a friction coefficient of 0.1 for the low loads. With higher applied normal loads, the friction coefficient increased up to 0.8. Analysis of the wear tracks using atomic force microscopy, scanning electron microscopy, and Raman spectroscopy revealed excessive debris resulting in third-body abrasion and fast wear. The formation of the debris can be explained by the generation of subsurface delamination cracks on basal planes. Subsequent kink formation obstructs the ball movement which results in the removal of the kinked film parts.

    Ort, förlag, år, upplaga, sidor
    Amsterdam, Netherlands: Elsevier, 2008
    Nationell ämneskategori
    Naturvetenskap
    Identifikatorer
    urn:nbn:se:liu:diva-39728 (URN)10.1016/j.wear.2007.06.013 (DOI)000254766900002 ()50916 (Lokalt ID)50916 (Arkivnummer)50916 (OAI)
    Tillgänglig från: 2009-10-10 Skapad: 2009-10-10 Senast uppdaterad: 2017-12-13Bibliografiskt granskad
    6. Growth and characterization of MAX-phase thin films
    Öppna denna publikation i ny flik eller fönster >>Growth and characterization of MAX-phase thin films
    Visa övriga...
    2005 (Engelska)Ingår i: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 193, nr 1-3, s. 6-10Artikel i tidskrift (Refereegranskat) Published
    Abstract [en]

    We report that magnetron sputtering can be applied to synthesize MAX-phase films of several systems including Ti–Si–C, Ti–Ge–C, Ti–Al–C, and Ti–Al–N. In particular, epitaxial films of the known phases Ti3SiC2, Ti3GeC2, Ti2GeC, Ti3AlC2, Ti2AlC, and Ti2AlN as well as the newly discovered thin film phases Ti4SiC3, Ti4GeC3 and intergrown structures can be deposited at 900–1000 °C on Al2O3(0001) and MgO(111) pre-seeded with TiC or Ti(Al)N. From XTEM and AFM we suggest a growth and nucleation model where MAX-phase nucleation is initiated at surface steps or facets on the seed layer and followed by lateral growth. Differences between the growth behavior of the systems with respect to phase distribution and phase stabilities are discussed. Characterization of mechanical properties for Tin+1Si–Cn films with nanoindentation show decreased hardness from about 25 to 15 GPa upon penetration of the basal planes with characteristic large plastic deformation with pile up dependent on the choice of MAX material. This is explained by cohesive delamination of the basal planes and kink band formation, in agreement with the observations made for bulk material. Measurements of the electrical resistivity for Ti–Si–C and Ti–Al–N films with four-point probe technique show values of 30 and 39 μΩ cm, respectively, comparable to bulk materials.

    Nationell ämneskategori
    Naturvetenskap
    Identifikatorer
    urn:nbn:se:liu:diva-24507 (URN)10.1016/j.surfcoat.2004.08.174 (DOI)6636 (Lokalt ID)6636 (Arkivnummer)6636 (OAI)
    Tillgänglig från: 2009-10-07 Skapad: 2009-10-07 Senast uppdaterad: 2017-12-13
    7. Electrical resistivity of Tin+1ACn (A = Si, Ge, Sn, n = 1–3) thin films
    Öppna denna publikation i ny flik eller fönster >>Electrical resistivity of Tin+1ACn (A = Si, Ge, Sn, n = 1–3) thin films
    Visa övriga...
    2007 (Engelska)Ingår i: Journal of Materials Research, ISSN 0884-2914, E-ISSN 2044-5326, Vol. 22, nr 8, s. 2279-2287Artikel i tidskrift (Refereegranskat) Published
    Abstract [en]

    We have investigated the electrical resistivity of (0001)-oriented Tin+1ACn (A = Si, Ge, Sn, n = 1–3) thin films deposited by magnetron sputtering onto Al2O3(0001) substrates at temperatures ranging from 500 to 950 °C. Four-point-probe measurements show that all films are good conductors with resistivity values of ∼21–51 μΩ cm for Ti–Si–C films, ∼15–50 μΩ cm for Ti–Ge–C films, and ∼46 μΩ cm for Ti2SnC. We find a general trend of decreasing resistivity with decreasing n for the Ti–Si–C and Ti–Ge–C systems due to the increased metallicity obtained with increasing density of A-element layers. We also show that crystalline quality and competitive growth of impurity phases affect the measured resistivity values. The effect of a given impurity phase largely depends on its location in the sample. Specifically, a TiCx layer in the center of the film constricts the current flow and results in an increased measured resistivity value. However, TiCx transition or seed layers at the substrate–film interface as well as surface segregation of Ge and Ti5Ge3Cx (for Ti–Ge–C) have only little effect on the measured resistivity values. For the Ti–Sn–C system, the resistivity is mainly influenced by the segregation of metallic Sn, yielding a wide spread in the measured values ranging from 20–46 μΩ cm, in the order of increased film purity.

    Nationell ämneskategori
    Naturvetenskap
    Identifikatorer
    urn:nbn:se:liu:diva-14476 (URN)10.1557/jmr.2007.0284 (DOI)
    Tillgänglig från: 2007-05-14 Skapad: 2007-05-14 Senast uppdaterad: 2017-12-13
  • 9.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik och mätteknik. Linköpings universitet, Tekniska högskolan.
    Thin film growth and characterization of Ti-Si-C MAX-phases2004Licentiatavhandling, sammanläggning (Övrigt vetenskapligt)
    Abstract [en]

    This thesis describes the growth of Ti-Si-C MAX-phases on A12O3(0001) and MgO(111) substrates with the emphasis on epitaxial Ti3SiC2 thin films by means of DC magnetron sputtering. Ti3SiC2, Ti4SiC3 as well as the two intergrown structures Ti5Si2C3 and Ti7Si2C5 were grown using sputtering from three individual elemental targets of Ti, Si, and C, respectively. X-ray diffraction analysis of the films revealed single-phase and epitaxial growth of Tin+1SiCn(0001) (n = 2, 3) MAX-phases at substrate temperatures above 700 °C. MgO(100) substrates as growth templates provided growth of Ti3SiC2 in a preferred orientation of (1015). TEM and XRD investigations showed that at 700 °C and below Si is accommodated at twin boundaries between TiC(111) planes. Depositions at substrate temperatures of 350 °C and RT resulted in nanocrystalline TiC growth with substitutionally-incorporated Si due to kinetic constraints.

    Mechanical properties were investigated using nanoindentation with cube corner and Berkovich indenters. With small indentation depth, hardness values of up to 24 GPa were measured for Ti3SiC2 films. Increasing maximum loads yielded lower hardnesses approaching bulk values. Young's moduli of 320 and 343 GPa were observed applying cube comer and Berkovich indenter, respectively. Cross-sectional TEM through indentations made with a Berkovich indenter were used to study the deformation behavior of the MAX-phases. Deformation energy is dissipated in kink formation, with edge dislocation pile-ups at the kink boundary, and delamination along basal planes.

    Four-point probe measurements on Ti3SiC2 MAX-phase thin films deposited at 900 °C showed a low room temperature resistivity of ~ 25 µΩcm, which increased with lower deposition temperatures. Ti4SiC3 films demonstrated an increased resistivity up to ~ 50 µΩcm.

  • 10.
    Emmerlich, Jens
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Eklund, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Rittrich, Dirk
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Electrical resistivity of Tin+1ACn (A = Si, Ge, Sn, n = 1–3) thin films2007Ingår i: Journal of Materials Research, ISSN 0884-2914, E-ISSN 2044-5326, Vol. 22, nr 8, s. 2279-2287Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We have investigated the electrical resistivity of (0001)-oriented Tin+1ACn (A = Si, Ge, Sn, n = 1–3) thin films deposited by magnetron sputtering onto Al2O3(0001) substrates at temperatures ranging from 500 to 950 °C. Four-point-probe measurements show that all films are good conductors with resistivity values of ∼21–51 μΩ cm for Ti–Si–C films, ∼15–50 μΩ cm for Ti–Ge–C films, and ∼46 μΩ cm for Ti2SnC. We find a general trend of decreasing resistivity with decreasing n for the Ti–Si–C and Ti–Ge–C systems due to the increased metallicity obtained with increasing density of A-element layers. We also show that crystalline quality and competitive growth of impurity phases affect the measured resistivity values. The effect of a given impurity phase largely depends on its location in the sample. Specifically, a TiCx layer in the center of the film constricts the current flow and results in an increased measured resistivity value. However, TiCx transition or seed layers at the substrate–film interface as well as surface segregation of Ge and Ti5Ge3Cx (for Ti–Ge–C) have only little effect on the measured resistivity values. For the Ti–Sn–C system, the resistivity is mainly influenced by the segregation of metallic Sn, yielding a wide spread in the measured values ranging from 20–46 μΩ cm, in the order of increased film purity.

  • 11.
    Emmerlich, Jens
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Gassner, Gert
    Department of Physical Metallurgy and Materials Testing, University of Leoben, Austria.
    Eklund, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Micro and macroscale tribological behavior of epitaxial Ti3SiC2 thin films2008Ingår i: Wear, ISSN 0043-1648, E-ISSN 1873-2577, Vol. 264, nr 11-12, s. 914-919Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Ti3SiC2(0 0 0 1) thin films prepared by magnetron sputtering were investigated for their response to tribomechanical strain induced during ball-on-disk experiments with 6 mm alumina balls and scratch tests with a 1 μm cono-spherical diamond tip. Normal loads of 100 μN to 0.24 N were applied resulting in a friction coefficient of 0.1 for the low loads. With higher applied normal loads, the friction coefficient increased up to 0.8. Analysis of the wear tracks using atomic force microscopy, scanning electron microscopy, and Raman spectroscopy revealed excessive debris resulting in third-body abrasion and fast wear. The formation of the debris can be explained by the generation of subsurface delamination cracks on basal planes. Subsequent kink formation obstructs the ball movement which results in the removal of the kinked film parts.

  • 12.
    Emmerlich, Jens
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Sasvári, Szilvia
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Persson, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Palmquist, Jens-Petter
    Department of Material Chemistry, Uppsala University, The Ångström Laboratory, Uppsala, Sweden .
    Jansson, Ulf
    Department of Material Chemistry, Uppsala University, The Ångström Laboratory, Uppsala, Sweden .
    Molina-Aldareguia, Jon M.
    CEIT (Centro de Estudios e Investigaciones Técnicas e Gipuzkoa), Spain .
    Czigány, Zsolt
    Research Institute for Technical Physics and Materials Science, Hungary .
    Growth of Ti3SiC2 thin films by elemental target magnetron sputtering2004Ingår i: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 96, nr 9, s. 4817-4826Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Epitaxial Ti3SiC2(0001) thin films have been deposited by dc magnetron sputtering from three elemental targets of Ti, C, and Si onto MgO(111) and Al2O3(0001) substrates at temperatures of 800–900 °C. This process allows composition control to synthesize Mn+1AXn (MAX) phases (M: early transition metal; A: A-group element; X: C and∕or N; n=1–3) including Ti4SiC3. Depositions on MgO(100) substrates yielding the Ti–Si–C MAX phases with (105), as the preferred orientation. Samples grown at different substrate temperatures, studied by means of transmission electron microscopy and x-ray diffraction investigations, revealed the constraints of Ti3SiC2 nucleation due to kinetic limitations at substrate temperatures below 700 °C. Instead, there is a competitive TiCx growth with Si segregation to form twin boundaries or Si substitutional incorporation in TiCx. Physical properties of the as-deposited single-crystal Ti3SiC2 films were determined. A low resistivity of 25 μΩ cm was measured. The Young’s modulus, ascertained by nanoindentation, yielded a value of 343–370 GPa. For the mechanical deformation response of the material, probing with cube corner and Berkovich indenters showed an initial high hardness of almost 30 GPa. With increased maximum indentation loads, the hardness was observed to decrease toward bulk values as the characteristic kink formation sets in with dislocation ordering and delamination at basal planes.

  • 13.
    Emmerlich, Jens
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Music, Denis
    Materials Chemistry, RWTH Aachen University, Germany.
    Eklund, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Wilhelmsson, Ola
    Department of Materials Chemistry, Uppsala University, Uppsala, Sweden.
    Jansson, Ulf
    Department of Materials Chemistry, Uppsala University, Uppsala, Sweden.
    Schneider, Jochen M.
    Materials Chemistry, RWTH Aachen University, Germany.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Thermal stability of Ti3SiC2 thin films2007Ingår i: Acta Materialia, ISSN 1359-6454, E-ISSN 1873-2453, Vol. 55, nr 4, s. 1479-1488Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The thermal stability of Ti3SiC2(0 0 0 1) thin films is studied by in situ X-ray diffraction analysis during vacuum furnace annealing in combination with X-ray photoelectron spectroscopy, transmission electron microscopy and scanning transmission electron microscopy with energy dispersive X-ray analysis. The films are found to be stable during annealing at temperatures up to ∼1000 °C for 25 h. Annealing at 1100–1200 °C results in the rapid decomposition of Ti3SiC2 by Si out-diffusion along the basal planes via domain boundaries to the free surface with subsequent evaporation. As a consequence, the material shrinks by the relaxation of the Ti3C2 slabs and, it is proposed, by an in-diffusion of O into the empty Si-mirror planes. The phase transformation process is followed by the detwinning of the as-relaxed Ti3C2 slabs into (1 1 1)-oriented TiC0.67 layers, which begin recrystallizing at 1300 °C. Ab initio calculations are provided supporting the presented decomposition mechanisms.

  • 14.
    Högberg, Hans
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Eklund, Per
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Emmerlich, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Birch, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Epitaxial Ti2GeC, Ti3GeC2, and Ti4GeC3 MAX-phase thin films grown by magnetron sputtering2005Ingår i: Journal of Materials Research, ISSN 0884-2914, E-ISSN 2044-5326, Vol. 20, nr 4, s. 779-782Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We have grown single-crystal thin films of Ti2GeC and Ti3GeC2 and a new phase Ti4GeC3, as well as two new intergrown MAX-structures, Ti5Ge2C3 and Ti7Ge2C5. Epitaxial films were grown on Al2O3(0001) substrates at 1000 °C using direct current magnetron sputtering. X-ray diffraction shows that Ti–Ge–C MAX-phases require higher deposition temperatures in a narrower window than their Ti–Si–C correspondences do, while there are similarities in phase distribution. Nanoindentation reveals a Young’s modulus of 300 GPa, lower than that of Ti3SiC2. Four-point probe measurements yield resistivity values of 50–200 μΩcm. The lowest value is obtained for phase-pure Ti3GeC2(0001) films.

  • 15.
    Högberg, Hans
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Emmerlich, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Eklund, Per
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Wilhelmsson, Ola
    Palmquist, Jens-Petter
    Jansson, Ulf
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Growth and characterization of epitaxial MAX-phase thin films from the Tin+1(Si,Ge,Sn)Cn systems2006Ingår i: 11th International Ceramics Congress, CIMTEC,2006, Zürich: TransTech Publications , 2006, s. 2648-Konferensbidrag (Refereegranskat)
    Abstract [en]

      

  • 16.
    Högberg, Hans
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Joelsson, Torbjörn
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Eklund, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Molina-Aldareguia, Jon M.
    Department of Materials, CEIT, Spain.
    Palmquist, Jens-Petter
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
    Wilhelmsson, Ola
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
    Jansson, Ulf
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
    Growth and characterization of MAX-phase thin films2005Ingår i: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 193, nr 1-3, s. 6-10Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We report that magnetron sputtering can be applied to synthesize MAX-phase films of several systems including Ti–Si–C, Ti–Ge–C, Ti–Al–C, and Ti–Al–N. In particular, epitaxial films of the known phases Ti3SiC2, Ti3GeC2, Ti2GeC, Ti3AlC2, Ti2AlC, and Ti2AlN as well as the newly discovered thin film phases Ti4SiC3, Ti4GeC3 and intergrown structures can be deposited at 900–1000 °C on Al2O3(0001) and MgO(111) pre-seeded with TiC or Ti(Al)N. From XTEM and AFM we suggest a growth and nucleation model where MAX-phase nucleation is initiated at surface steps or facets on the seed layer and followed by lateral growth. Differences between the growth behavior of the systems with respect to phase distribution and phase stabilities are discussed. Characterization of mechanical properties for Tin+1Si–Cn films with nanoindentation show decreased hardness from about 25 to 15 GPa upon penetration of the basal planes with characteristic large plastic deformation with pile up dependent on the choice of MAX material. This is explained by cohesive delamination of the basal planes and kink band formation, in agreement with the observations made for bulk material. Measurements of the electrical resistivity for Ti–Si–C and Ti–Al–N films with four-point probe technique show values of 30 and 39 μΩ cm, respectively, comparable to bulk materials.

  • 17.
    Isberg, Peter
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Eklund, Per
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Emmerlich, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Högberg, Hans
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Ljungcrantz, Henrik
    Impact Coatings AB.
    Amorphous and nanocomposite MAX compounds for wear protective coatings on components and tools as well as electrical contacts2005Patent (Övrig (populärvetenskap, debatt, mm))
  • 18.
    Magnuson, Martin
    et al.
    Uppsala University.
    Mattesini, M.
    Uppala University.
    Wilhelmsson, Ola
    Uppsala University.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Palmquist, Jens-Petter
    Uppsala University.
    Li, Sa
    Uppsala University.
    Ahuja, Rajeev
    Uppsala University.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Eriksson, Olle
    Uppsala University.
    Jansson, Ulf
    Uppsala University.
    Electronic structure and chemical bonding in Ti4SiC3 investigated by soft x-ray emission spectroscopy and first-principles theory2006Ingår i: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 74, nr 20Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Theelectronic structure in the new transition-metal carbide Ti4SiC3 has beeninvestigated by bulk-sensitive soft x-ray emission spectroscopy and compared tothe well-studied Ti3SiC2 and TiC systems. The measured high-resolution TiL, C K, and Si L x-ray emission spectra arediscussed with ab initio calculations based on density-functional theory includingcore-to-valence dipole matrix elements. The detailed investigations of the Ti-Cand Ti-Si chemical bonds provide increased understanding of the physicalproperties of these nanolaminates. A strongly modified spectral shape isdetected for the intercalated Si monolayers due to Si 3phybridization with the Ti 3d orbitals. As a result ofrelaxation of the crystal structure and the charge-transfer from Ti(and Si) to C, the strength of the Ti-C covalentbond is increased. The differences between the electronic and crystalstructures of Ti4SiC3 and Ti3SiC2 are discussed in relation tothe number of Si layers per Ti layer in thetwo systems and the corresponding change of materials properties.

  • 19.
    Magnuson, Martin
    et al.
    Uppsala University.
    Palmquist, Jens-Petter
    Uppsala University.
    Mattesini, M.
    Uppsala University.
    Li, Sa
    Uppsala University.
    Ahuja, Rajeev
    Uppsala University.
    Eriksson, Olle
    Uppsala University.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Wilhelmsson, Ola
    Uppsala University.
    Eklund, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Jansson, Ulf
    Uppsala University.
    Electronic structure investigation of Ti3AlC2 , Ti3SiC2 , and Ti3GeC2 by soft x-ray emission spectroscopy2005Ingår i: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 72, nr 24Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The electronic structures of epitaxially grown films of Ti3AlC2 , Ti3SiC2 , and Ti3GeC2 have been investigated by bulk-sensitive soft x-ray emission spectroscopy. The measured high-resolution Ti L , C K , Al L , Si L , and Ge M emission spectra are compared with ab initio density-functional theory including core-to-valence dipole matrix elements. A qualitative agreement between experiment and theory is obtained. A weak covalent Ti-Al bond is manifested by a pronounced shoulder in the Ti L emission of Ti3AlC2 . As Al is replaced with Si or Ge, the shoulder disappears. For the buried Al and Si layers, strongly hybridized spectral shapes are detected in Ti3AlC2 and Ti3SiC2 , respectively. As a result of relaxation of the crystal structure and the increased charge-transfer from Ti to C, the Ti-C bonding is strengthened. The differences between the electronic structures are discussed in relation to the bonding in the nanolaminates and the corresponding change of materials properties.

  • 20.
    Molina-Aldareguia, J.M.
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Palmquist, J.-P.
    Ångström Laboratory, Department of Materials Chemistry, Uppsala University, Uppsala, Sweden.
    Jansson, U.
    Ångström Laboratory, Department of Materials Chemistry, Uppsala University, Uppsala, Sweden.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Kink formation around indents in laminated Ti3SiC2 thin films studied in the nanoscale2003Ingår i: Scripta Materialia, ISSN 1359-6462, E-ISSN 1872-8456, Vol. 49, nr 2, s. 155-160Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The deformation mechanisms in ductile Ti3SiC2(0 0 0 1) single-crystal films have been analysed by nanoindentation and cross-sectional transmission electron microscopy. Permanent deformation includes formation of kink bands, as the nanolaminated material buckles out at the perimeter of the contact area, and delamination cracks. Evidence is presented for incipient kink-band formation.

  • 21.
    Palmquist, Jens-Petter
    et al.
    Uppsala University, Department of Materials Chemistry, The Ångström Laboratory, Uppsala, Sweden.
    Li, Sa
    Uppsala University, Department of Physics, The Ångström Laboratory, Uppsala, Sweden.
    Persson, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Emmerlich, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Wilhelmsson, Ola
    Uppsala University, Department of Materials Chemistry, The Ångström Laboratory, Uppsala, Sweden.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Katsnelson, M. I.
    Uppsala University, Department of Physics, The Ångström Laboratory, Uppsala, Sweden.
    Johansson, Börje
    Uppsala University, Department of Physics, The Ångström Laboratory, Uppsala, Sweden.
    Ahuja, Rajeev
    Uppsala University, Department of Physics, The Ångström Laboratory, Uppsala, Sweden.
    Eriksson, Olle
    Uppsala University, Department of Physics, The Ångström Laboratory, Uppsala, Sweden.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Jansson, Ulf
    Uppsala University, Department of Materials Chemistry, The Ångström Laboratory, Uppsala, Sweden.
    Mn+1AXn phases in the Ti-Si-C system studied by thin-film synthesis and ab initio calculations2004Ingår i: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 70, nr 16, s. 165401-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Thin films of Mn+1AXn layered compounds in the Ti-Si-C system were deposited on MgO(111) and Al2O3(0001) substrates held at 900°C using dc magnetron sputtering from elemental targets of Ti, Si, and C. We report on single-crystal and epitaxial deposition of Ti3SiC2 (the previously reported MAX phase in the Ti-Si-C system), a previously unknown MAX phase Ti4SiC3 and another type of structure having the stoichiometry of Ti5Si2C3 and Ti7Si2C5. The latter two structures can be viewed as an intergrowth of 2 and 3 or 3 and 4 M layers between each A layer. In addition, epitaxial films of Ti5Si3Cx were deposited and Ti5Si4 is also observed. First-principles calculations, based on density functional theory (DFT) of Tin+1SiCn for n=1,2,3,4 and the observed intergrown Ti5Si2C3 and Ti7Si2C5 structures show that the calculated difference in cohesive energy between the MAX phases reported here and competing phases (TiC, Ti3SiC2, TiSi2, and Ti5Si3) are very small. This suggests that the observed Ti5Si2C3 and Ti7Si2C5 structures at least should be considered as metastable phases. The calculations show that the energy required for insertion of a Si layer in the TiC matrix is independent of how close the Si layers are stacked. Hardness and electrical properties can be related to the number of Si layers per Ti layer. This opens up for designed thin film structures the possibility to tune properties.

  • 22. Rester, M.
    et al.
    Neidhardt, Jörg
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Eklund, Per
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Emmerlich, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Ljungcrantz, H.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Mitterer, C.
    Annealing studies of nanocomposite Ti-Si-C thin films with respect to phase stability and tribological performance2006Ingår i: Materials Science & Engineering: A, ISSN 0921-5093, E-ISSN 1873-4936, Vol. 429, nr 1-2, s. 90-95Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Nanocomposite Ti-Si-C thin films were deposited by dc magnetron sputtering from a Ti3SiC2 target onto Si(1 0 0) and high-speed steel substrates at 300 °C. The as-deposited films consisted of nanocrystalline (nc-) TiCx and amorphous (a-) SiCx, as determined by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Annealing in vacuum up to 1450 °C resulted in improved crystallinity and a decreased volume fraction of the amorphous phase. Additionally, differential scanning calorimetry (DSC) was used to monitor heat flows connected to the respective reactions in the material, where a broad exothermic peak attributed to grain growth of crystalline TiCx appeared, while an exothermic reaction related to the formation of Ti3SiC2 was not detected. Tribological testing in a ball-on-disk setup was conducted at room temperature, 500 and 700 °C against an alumina counterpart. The room temperature measurement resulted in a coefficient of friction value of 0.8, at elevated temperatures the coefficient of friction decreased to 0.4. © 2006 Elsevier B.V. All rights reserved.

  • 23.
    Riascos, Henry
    et al.
    Universidad Tecnológica de Pereira, Colombia.
    Neidhardt, Jörg
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Radnoczi, G. Z.
    Research Institute for Technical Physics Materials Science, Budapest.
    Emmerlich, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Zambrano, G.
    Universidad del Valle Excellence Center for Novel Materials, Cali, Colombia.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Prieto, P.
    Universidad del Valle Excellence Center for Novel Materials, Cali, Colombia.
    Structure and properties of pulsed-laser deposited carbon nitride thin films2006Ingår i: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 497, nr 1-2, s. 1-6Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Carbon nitride (CNx) thin films were deposited on silicon (100) and (111) substrates at 300 °C by laser ablation of a graphite target using a pulsed Nd:YAG laser in a nitrogen atmosphere. The composition and structural properties of the films were investigated as functions of gas pressure and laser fluence. X-ray photoelectron spectroscopy (XPS) revealed a strong dependence of the amount of structurally incorporated nitrogen upon gas pressure. A maximum was observed at the highest laser fluence of 10 J/cm2 and at an intermediate pressure of 4 Pa. Further analyses of the XPS N 1s core level spectra of the CNx films, exhibiting the highest elasticity in nanoindentation experiments, revealed a typical double-peak arrangement; most pronounced for the highest laser fluence at low pressures. These two peak components indicate that the nitrogen bonded onto a graphitic structure dominates over the two-fold coordinated pyridine-like bonding configuration. This favors the growth of intersecting corrugated graphene structures that may be considered to have “fullerene-like” microstructures. Additionally, Fourier Transformed Infrared Spectroscopy analyses of films deposited at different pressures show the presence of 2229 and 2273 cm− 1 stretching peaks associated with CN triple bonds (CN) of nitriles and isocyanides, 1640 cm− 1 and 1545 cm− 1 associated with the CC and CN and a peak at 1730 cm− 1, which is connected to the CO carbonyls groups. Films grown at 0.66 Pa revealed the strongest CN peak.

  • 24.
    Scabarozi, T.H.
    et al.
    Department of Materials Engineering, Drexel University, Philadelphia, PA 19104, United States, Department of Physics and Astronomy, Rowan University, Glassboro, NJ 08028, United States.
    Eklund, Per
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Emmerlich, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Högberg, Hans
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Meehan, T.
    Department of Physics and Astronomy, Rowan University, Glassboro, NJ 08028, United States.
    Finkel, P.
    Department of Physics and Astronomy, Rowan University, Glassboro, NJ 08028, United States.
    Barsoum, M.W.
    Department of Materials Engineering, Drexel University, Philadelphia, PA 19104, United States.
    Hettinger, J.D.
    Department of Physics and Astronomy, Rowan University, Glassboro, NJ 08028, United States.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Lofland, S.E.
    Department of Physics and Astronomy, Rowan University, Glassboro, NJ 08028, United States.
    Weak electronic anisotropy in the layered nanolaminate Ti 2 GeC2008Ingår i: Solid State Communications, ISSN 0038-1098, E-ISSN 1879-2766, Vol. 146, nr 11-12, s. 498-501Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We have investigated the anisotropy in electronic transport of the layered ternary Ti2GeC by comparing the results of measurements on c-axis oriented epitaxial thin-film and polycrystalline bulk samples. The electrical conductivities, Hall coefficients, and magnetoresistances were analyzed within a multi-band framework. An adequate description of the magnetotransport data on the film with the highest mobility required the use of the explicit field-dependent conductivity tensor with three conduction bands. The analysis indicated that n ˜ p, although with n ˜ 3.5 × 1027 m- 3. The ratio of the a- to c-axis conductivities is small and contrary to theoretical predictions. © 2008 Elsevier Ltd. All rights reserved.

  • 25.
    Wilhelmsson, O.
    et al.
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, P.O. Box 538, SE-751 21 Uppsala, Sweden.
    Palmquist, J.-P.
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, P.O. Box 538, SE-751 21 Uppsala, Sweden.
    Lewin, E.
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, P.O. Box 538, SE-751 21 Uppsala, Sweden.
    Emmerlich, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Eklund, Per
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Persson, Per
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Högberg, Hans
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Li, S.
    Ahuja, R.
    Uppsala University, Dept. of Physics, The Ångström Laboratory, P.O. Box 530, SE-751 21 Uppsala, Sweden.
    Eriksson, O.
    Uppsala University, Dept. of Physics, The Ångström Laboratory, P.O. Box 530, SE-751 21 Uppsala, Sweden.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Jansson, U.
    Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, P.O. Box 538, SE-751 21 Uppsala, Sweden.
    Deposition and characterization of ternary thin films within the Ti-Al-C system by DC magnetron sputtering2006Ingår i: Journal of Crystal Growth, ISSN 0022-0248, E-ISSN 1873-5002, Vol. 291, nr 1, s. 290-300Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The formation of ternary compounds within the Ti-Al-C system was studied by magnetron sputtering for thin-film deposition and first-principles calculations for phase stability. As-deposited films were characterized with X-ray diffraction (XRD) and high-resolution transmission electron microscopy (TEM). The hardness and Young's moduli of the material were studied by nanoindentation. Epitaxial and phase-pure films of Mn+1AXn phases Ti3AlC2 and Ti2AlC as well as the perovskite phase Ti3AlC were deposited on Al2O3(00l) wafers kept at temperatures between 800 and 900 °C. The only ternary phases observed at low temperatures (300 °C) were Ti3AlC and cubic (Ti,Al)C, the latter can be described as a metastable solid solution of Al in TiC similar to the more studied (Ti,Al)N system. The difficulties to form MAX phases at low substrate temperatures were attributed of requirement for a sufficient diffusivity to partition the elements corresponding to the relatively complex crystal structures with long c-axes. While MAX-phase synthesis at 800 °C is significantly lower than contemporary bulk sintering processes, a reduction of the substrate temperature towards 300 °C in the present thin-film deposition experiments resulted in stacking sequence variations and the intergrowth of (Ti,Al)C. © 2006 Elsevier B.V. All rights reserved.

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