liu.seSearch for publications in DiVA
Change search
Refine search result
1 - 12 of 12
CiteExportLink to result list
Permanent link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Rows per page
  • 5
  • 10
  • 20
  • 50
  • 100
  • 250
Sort
  • Standard (Relevance)
  • Author A-Ö
  • Author Ö-A
  • Title A-Ö
  • Title Ö-A
  • Publication type A-Ö
  • Publication type Ö-A
  • Issued (Oldest first)
  • Issued (Newest first)
  • Created (Oldest first)
  • Created (Newest first)
  • Last updated (Oldest first)
  • Last updated (Newest first)
  • Disputation date (earliest first)
  • Disputation date (latest first)
  • Standard (Relevance)
  • Author A-Ö
  • Author Ö-A
  • Title A-Ö
  • Title Ö-A
  • Publication type A-Ö
  • Publication type Ö-A
  • Issued (Oldest first)
  • Issued (Newest first)
  • Created (Oldest first)
  • Created (Newest first)
  • Last updated (Oldest first)
  • Last updated (Newest first)
  • Disputation date (earliest first)
  • Disputation date (latest first)
Select
The maximal number of hits you can export is 250. When you want to export more records please use the 'Create feeds' function.
  • 1.
    Ben Sedrine, Nabiha
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology. University of Aveiro, Portugal; University of Aveiro, Portugal.
    Zukauskaite, Agne
    Linköping University, Department of Physics, Chemistry and Biology. Linköping University, Faculty of Science & Engineering. Fraunhofer Institute Appl Solid State Phys, Germany.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Jensen, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Schoeche, S.
    University of Nebraska, NE 68588 USA.
    Schubert, M.
    University of Nebraska, NE 68588 USA.
    Darakchieva, Vanya
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Infrared dielectric functions and optical phonons of wurtzite YxAl1-xN (0 less than= x less than= 0.22)2015In: Journal of Physics D: Applied Physics, ISSN 0022-3727, E-ISSN 1361-6463, Vol. 48, no 41, p. 415102-Article in journal (Refereed)
    Abstract [en]

    YAlN is a new member of the group-III nitride family with potential for applications in next generation piezoelectric and light emitting devices. We report the infrared dielectric functions and optical phonons of wurtzite (0001) YxAl1-xN epitaxial films with 0 less than= x less than= 0.22. The films are grown by magnetron sputtering epitaxy on c-plane Al2O3 and their phonon properties are investigated using infrared spectroscopic ellipsometry and Raman scattering spectroscopy. The infrared-active E-1(TO) and LO, and the Raman active E-2 phonons are found to exhibit one-mode behavior, which is discussed in the framework of the MREI model. The compositional dependencies of the E-1(TO), E-2 and LO phonon frequencies, the high-frequency limit of the dielectric constant, epsilon(infinity), the static dielectric constant, epsilon(0), and the Born effective charge Z(B) are established and discussed.

  • 2.
    Ben Sedrine, Nebiha
    et al.
    Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.
    Zukauskaite, Agne
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Darakchieva, Vanya
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, The Institute of Technology.
    Bandgap Engineering and Optical Constants of YxAl1-xN Alloys2013In: Japanese Journal of Applied Physics, ISSN 0021-4922, E-ISSN 1347-4065, Vol. 52, no 8Article in journal (Refereed)
    Abstract [en]

    We study wurtzite Yx Al1-xN (0 andlt;= x andlt;= 0:22) films with (0001) orientation deposited by magnetron sputtering epitaxy on Si(100) substrates and we determine the alloys band gap energies and optical constants. Room temperature spectroscopic ellipsometry (SE) is employed in the energy range from 1 to 6.3 eV, and data modeling based on the standard dielectric function model is used. As a result of the SE data analysis the Yx Al1-xN refractive index and extinction coefficient are determined. The band gap of Yx Al1-xN is found to decrease linearly from 6.2 eV (x=0) down to 4.5 eV (x=0:22). We further observe an increase of the refractive index with increasing Y content; from 1.93 to 2.20 (at 2 eV) for x=0 and 0.22, respectively, reflecting the increase in material density.

  • 3.
    Höglund, Carina
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Alling, Björn
    Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics . Linköping University, The Institute of Technology.
    Bareño, Javier
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Czigány, Zsolt
    Research Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, P.O. Box 49, H-1525 Budapest, Hungary.
    Persson, Per O. Å.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Wingqvist, Gunilla
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Zukauskaite, Agne
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Wurtzite-structure Sc1-xAlxN solid solution films grown by reactive magnetron sputter epitaxy: structural characterization and first-principles calculations2010In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 107, no 12, p. 123515-Article in journal (Refereed)
    Abstract [en]

    AlN(0001) was alloyed with ScN with molar fractions up to ~22%, while retaining a singlecrystal wurtzite (w-) structure and with lattice parameters matching calculated values. Material synthesis was realized by magnetron sputter epitaxy of thin films starting from optimal conditions for the formation of w-AlN onto lattice-matched w-AlN seed layers on Al2O3(0001) and MgO(111) substrates. Films with ScN contents between 23% and ~50% exhibit phase separation into nanocrystalline ScN and AlN, while ScN-rich growth conditions yield a transformation to rocksalt-structure Sc1-xAlxN(111) films. The experimental results are analyzed with ion beam analysis, X-ray diffraction, and transmission electron microscopy, together with ab-initio calculations of mixing enthalpies and lattice parameters of solid solutions in wurtzite, rocksalt, and layered hexagonal phases.

  • 4.
    Kerdsongpanya, Sit
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Van Nong, Ngo
    Technical University of Denmark.
    Pryds, Nini
    Technical University of Denmark.
    Zukauskaite, Agne
    Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.
    Jensen, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Lu, Jun
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Wingqvist, Gunilla
    Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.
    Eklund, Per
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Anomalously high thermoelectric power factor in epitaxial ScN thin films2011In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 99, no 23, p. 232113-Article in journal (Refereed)
    Abstract [en]

    Thermoelectric properties of ScN thin films grown by reactive magnetron sputtering on Al2O3(0001) wafers are reported. X-ray diffraction and elastic recoil detection analyses show that the composition of the films is close to stoichiometry with trace amounts (similar to 1 at. % in total) of C, O, and F. We found that the ScN thin-film exhibits a rather low electrical resistivity of similar to 2.94 mu Omega m, while its Seebeck coefficient is approximately similar to-86 mu V/K at 800 K, yielding a power factor of similar to 2.5 x 10(-3) W/mK(2). This value is anomalously high for common transition-metal nitrides.

  • 5.
    Tholander, Christopher
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Tasnádi, Ferenc
    Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics. Linköping University, Faculty of Science & Engineering.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Palisaitis, Justinas
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Persson, Per O A
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Jensen, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Sandström, Per
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Alling, Björn
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering. Max-Planck-Institut für Eisenforschung GmbH, Düsseldorf, Germany.
    Zukauskaitè, Agne
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering. Fraunhofer Institute for Applied Solid State Physics IAF, Freiburg, Germany.
    Ab initio calculations and experimental study of piezoelectric YxIn1-xN thin films deposited using reactive magnetron sputter epitaxy2016In: Acta Materialia, ISSN 1359-6454, E-ISSN 1873-2453, Vol. 105, p. 199-206Article in journal (Refereed)
    Abstract [en]

    By combining theoretical prediction and experimental verification we investigate the piezoelectric properties of yttrium indium nitride (YxIn1-xN). Ab initio calculations show that the YxIn1-xN wurtzite phase is lowest in energy among relevant alloy structures for 0≤x≤0.5. Reactive magnetron sputter epitaxy was used to prepare thin films with Y content up to x=0.51. The composition dependence of the lattice parameters observed in the grown films is in agreement with that predicted by the theoretical calculations confirming the possibility to synthesize a wurtzite solid solution. An AlN buffer layer greatly improves the crystalline quality and surface morphology of subsequently grown YxIn1-xN films. The piezoelectric response in films with x=0.09 and x=0.14 is observed using piezoresponse force microscopy. Theoretical calculations of the piezoelectric properties predict YxIn1−xN to have comparable piezoelectric properties to ScxAl1-xN.

  • 6.
    Wingqvist, Gunilla
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Tasnadi, Ferenc
    Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics . Linköping University, The Institute of Technology.
    Zukauskaite, Agne
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Arwin, Hans
    Linköping University, Department of Physics, Chemistry and Biology, Applied Optics . Linköping University, The Institute of Technology.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Increased electromechanical coupling in w-ScxAl1-xN2010In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 97, no 11, p. 112902-Article in journal (Refereed)
    Abstract [en]

    AlN is challenged as the material choice in important thin film electroacoustic devices for modern wireless communication applications. We present the promise of superior electromechanical coupling (kt2), in w−ScxAl1−xN by studying its dielectric properties. w−ScxAl1−xN (0≤x≤0.3) thin films grown by dual reactive magnetron sputtering exhibited low dielectric losses along with minor increased dielectric constant (ε). Ellipsometry measurements of the high frequency ε showed good agreement with density function perturbation calculations. Our data show that kt2 will improve from 7% to 10% by alloying AlN with up to 20 mol % ScN.

     

  • 7.
    Zukauskaite, Agne
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Broitman, Esteban
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Sandström, Per
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Nanoprobe Mechanical and Piezoelectric Characterization of ScxAl1-xN(0001) Thin Films2015In: Physica Status Solidi (a) applications and materials science, ISSN 1862-6300, E-ISSN 1862-6319, Vol. 212, no 3, p. 666-673Article in journal (Refereed)
    Abstract [en]

    Nanoindentation with in-situ electrical characterization was used to characterize piezoelectric scandium aluminum nitride (ScxAl1-xN) thin films with Sc contents up to x=0.3. The films were prepared by reactive magnetron sputtering using Al2O3 substrates with TiN seed layer/bottom electrodes at a substrate temperature of 400 °C. X-ray diffraction shows c-axis oriented wurtzite ScxAl1-xN, where the crystal quality decreases with increasing x. Piezoresponse force microscopy in mapping mode shows a single piezoelectric polarization phase in all samples. The hardness and decreases from 17 GPa in AlN to 11 GPa in Sc0.3Al0.7N, while reduced elastic modulus decreases from 265 GPa to 224 GPa, respectively. Both direct and converse piezoelectric measurements are demonstrated by first applying the load and generating the voltage and later by applying the voltage and measuring film displacement using a conductive boron doped nanoindenter tip. The Sc0.2Al0.8N films exhibit an increase in generated voltage by 15% in comparison to AlN and a correspondingly larger displacement upon applied voltage, comparable to results obtained by double beam interferometry and piezoresponse force microscopy.

     

  • 8.
    Žukauskaitė, Agnė
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Metastable ScAlN and YAlN Thin Films Grown by Reactive Magnetron Sputter Epitaxy2014Doctoral thesis, comprehensive summary (Other academic)
    Abstract [en]

    Metastable ScxAl1-xN and YxAl1-xN thin films were deposited in an ultra high vacuum system using reactive magnetron sputter epitaxy from elemental Al, Sc, and Y targets in Ar/N2 gas mixture. Their structural, electrical, optical, mechanical, and piezoelectrical properties were investigated by using the transmission electron microscopy, x-ray diffraction, spectroscopic ellipsometry, I-V and C-V measurements, nanoindentation, and two different techniques for piezoelectric characterization: piezoresponse force microscopy and double beam interferometry.

    Compared to AlN, improved electromechanical coupling and increase in piezoelectric response was found in ScxAl1-xN/TiN/Al2O3 structures with Sc content up to x=0.2. Decreasing the growth temperature down to 400 °C improved the microstructure and crystalline quality of the material. Microstructure of the films had a stronger influence on piezoelectric properties than the crystalline quality, which affected the leakage currents. When x was increased from x=0 to x=0.3, the hardness and reduced Young’s modulus Er showed a decrease from 17 GPa to 11 GPa, and 265 GPa down to 224 GPa, respectively. In ScxAl1-xN/InyAl1-yN superlattices, ScxAl1-xN layers negative lattice mismatched to In-rich InyAl1-yN were found to be stable at higher Sc concentration (x=0.4) than lattice-matched or positive lattice mismatched layers, confirmed by first principle (ab initio) calculations using density-functional formalism.

    Al-rich YxAl1-xN thin films were synthesized and reported for the first time. Formation of solid solution was observed up to x=0.22 and an increase in growth temperature up to 900°C improved the crystalline quality of the YxAl1-xN films. The band gap of YxAl1-xN decreased from 6.2 eV for AlN down to 4.5 eV (x=0.22) and was shown to follow Vegard’s rule. Refractive indices and extinction coefficients were also determined. Lattice constants of wurtzite YxAl1-xN measured experimentally are in good agreement with theoretical predictions obtained through ab initio calculations. The mixing enthalpy

    List of papers
    1. Increased electromechanical coupling in w-ScxAl1-xN
    Open this publication in new window or tab >>Increased electromechanical coupling in w-ScxAl1-xN
    Show others...
    2010 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 97, no 11, p. 112902-Article in journal (Refereed) Published
    Abstract [en]

    AlN is challenged as the material choice in important thin film electroacoustic devices for modern wireless communication applications. We present the promise of superior electromechanical coupling (kt2), in w−ScxAl1−xN by studying its dielectric properties. w−ScxAl1−xN (0≤x≤0.3) thin films grown by dual reactive magnetron sputtering exhibited low dielectric losses along with minor increased dielectric constant (ε). Ellipsometry measurements of the high frequency ε showed good agreement with density function perturbation calculations. Our data show that kt2 will improve from 7% to 10% by alloying AlN with up to 20 mol % ScN.

     

    National Category
    Physical Sciences
    Identifiers
    urn:nbn:se:liu:diva-59839 (URN)10.1063/1.3489939 (DOI)000282032900055 ()
    Note
    Original Publication: Gunilla Wingqvist, Ferenc Tasnadi, Agne Zukauskaite, Jens Birch, Hans Arwin and Lars Hultman, Increased electromechanical coupling in w-ScxAl1-xN, 2010, Applied Physics Letters, (97), 11, 112902. http://dx.doi.org/10.1063/1.3489939 Copyright: American Institute of Physics http://www.aip.org/ Available from: 2010-09-27 Created: 2010-09-27 Last updated: 2017-12-12Bibliographically approved
    2. Microstructure and Dielectric Properties of Piezoelectric Magnetron Sputtered w-ScxAl1-xN thin films
    Open this publication in new window or tab >>Microstructure and Dielectric Properties of Piezoelectric Magnetron Sputtered w-ScxAl1-xN thin films
    Show others...
    2012 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 111, no 9, p. 093527-Article in journal (Refereed) Published
    Abstract [en]

    Piezoelectric wurtzite ScxAl1-xN (x=0, 0.1, 0.2, 0.3) thin films were epitaxially grown by reactive magnetron co-sputtering from elemental Sc and Al targets. Al2O3(0001) wafers with TiN(111) seed and electrode layers were used as substrates. X-ray diffraction shows that an increase in the Sc content results in the degradation of the crystalline quality. Samples grown at 400 °C possess true dielectric behavior with quite low dielectric losses and the leakage current is negligible. For ScAlN samples grown at 800 °C, the crystal structure is poor and leakage current is high. Transmission electron microscopy with energy dispersive x-ray spectroscopy mapping shows a mass separation into ScN-rich and AlN-rich domains for x≥0.2 when substrate temperature is increased from 400 to 800 °C. The piezoelectric response of epitaxial ScxAl1-xN films measured by piezoresponse force microscopy and double beam interferometry shows up to 180% increase by the addition of Sc up to x=0.2 independent of substrate temperature, in good agreement with previous theoretical predictions based on density-functional theory.

    Place, publisher, year, edition, pages
    American Institute of Physics (AIP), 2012
    National Category
    Natural Sciences
    Identifiers
    urn:nbn:se:liu:diva-76471 (URN)10.1063/1.4714220 (DOI)000304109900044 ()
    Available from: 2012-04-10 Created: 2012-04-10 Last updated: 2017-12-07Bibliographically approved
    3. Nanoprobe Mechanical and Piezoelectric Characterization of ScxAl1-xN(0001) Thin Films
    Open this publication in new window or tab >>Nanoprobe Mechanical and Piezoelectric Characterization of ScxAl1-xN(0001) Thin Films
    Show others...
    2015 (English)In: Physica Status Solidi (a) applications and materials science, ISSN 1862-6300, E-ISSN 1862-6319, Vol. 212, no 3, p. 666-673Article in journal (Refereed) Published
    Abstract [en]

    Nanoindentation with in-situ electrical characterization was used to characterize piezoelectric scandium aluminum nitride (ScxAl1-xN) thin films with Sc contents up to x=0.3. The films were prepared by reactive magnetron sputtering using Al2O3 substrates with TiN seed layer/bottom electrodes at a substrate temperature of 400 °C. X-ray diffraction shows c-axis oriented wurtzite ScxAl1-xN, where the crystal quality decreases with increasing x. Piezoresponse force microscopy in mapping mode shows a single piezoelectric polarization phase in all samples. The hardness and decreases from 17 GPa in AlN to 11 GPa in Sc0.3Al0.7N, while reduced elastic modulus decreases from 265 GPa to 224 GPa, respectively. Both direct and converse piezoelectric measurements are demonstrated by first applying the load and generating the voltage and later by applying the voltage and measuring film displacement using a conductive boron doped nanoindenter tip. The Sc0.2Al0.8N films exhibit an increase in generated voltage by 15% in comparison to AlN and a correspondingly larger displacement upon applied voltage, comparable to results obtained by double beam interferometry and piezoresponse force microscopy.

     

    Place, publisher, year, edition, pages
    John Wiley & Sons, 2015
    National Category
    Physical Sciences
    Identifiers
    urn:nbn:se:liu:diva-103830 (URN)10.1002/pssa.201431634 (DOI)000351530800029 ()
    Note

    On the day of the defence date of the Ph.D. Thesis, the status of this article was Manuscript.

    Available from: 2014-01-29 Created: 2014-01-29 Last updated: 2017-12-06Bibliographically approved
    4. Stabilization of Wurtzite Sc0.4Al0.6N in Pseudomorphic Epitaxial ScxAl1-xN/InyAl1-yN Superlattices
    Open this publication in new window or tab >>Stabilization of Wurtzite Sc0.4Al0.6N in Pseudomorphic Epitaxial ScxAl1-xN/InyAl1-yN Superlattices
    Show others...
    2015 (English)In: Acta Materialia, ISSN 1359-6454, E-ISSN 1873-2453, Vol. 94, p. 101-110Article in journal (Refereed) Published
    Abstract [en]

    Pseudomorphic stabilization in wurtzite ScxAl1-xN/AlN and ScxAl1-xN/InyAl1-yN superlattices (x=0.2, 0.3, and 0.4; y=0.2-0.72), grown by reactive magnetron sputter epitaxy was investigated. X-ray diffraction and transmission electron microscopy show that in ScxAl1-xN/AlN superlattices the compressive biaxial stresses due to positive lattice mismatch in Sc0.3Al0.7N and Sc0.4Al0.6N lead to loss of epitaxy, although the structure remains layered. For the negative lattice mismatched In-rich ScxAl1-xN/InyAl1-yN superlattices a tensile biaxial stress promotes the stabilization of wurtzite ScxAl1-xN even for the highest investigated concentration x=0.4. Ab initio calculations with fixed in-plane lattice parameters show a reduction in mixing energy for wurtzite ScxAl1-xN under tensile stress when x≥0.375 and support the experimental results.

    Place, publisher, year, edition, pages
    Elsevier, 2015
    National Category
    Natural Sciences
    Identifiers
    urn:nbn:se:liu:diva-103831 (URN)10.1016/j.actamat.2015.04.033 (DOI)000357143500010 ()
    Available from: 2014-01-29 Created: 2014-01-29 Last updated: 2017-12-06Bibliographically approved
    5. YxAl1-xN Thin Films
    Open this publication in new window or tab >>YxAl1-xN Thin Films
    Show others...
    2012 (English)In: Journal of Physics D: Applied Physics, ISSN 0022-3727, E-ISSN 1361-6463, Vol. 45, no 42, p. 422001-Article in journal (Refereed) Published
    Abstract [en]

    Reactive magnetron sputtering was used to deposit YxAl1-xN thin films, 0≤x≤0.22, onto Al2O3(0001) and Si(100) substrates. X-ray diffraction and analytical electron microscopy show that the films are solid solutions. Lattice constants are increasing with Y concentration, in agreement with ab initio calculations. Spectroscopic ellipsometry measurements reveal a band gap decrease from 6.2 eV (x=0) down to 4.9 eV (x=0.22). Theoretical investigations within the special quasirandom structure approach show that the wurtzite structure has the lowest mixingenthalpy for 0≤x≤0.75.

    Place, publisher, year, edition, pages
    Institute of Physics Publishing (IOPP), 2012
    National Category
    Natural Sciences
    Identifiers
    urn:nbn:se:liu:diva-76472 (URN)10.1088/0022-3727/45/42/422001 (DOI)000309766700001 ()
    Note

    funding agencies|Linkoping Linnaeus Initiative on Nanoscale Functional Materials (LiLiNFM)||Swedish Research Council (VR)|349-2008-6582|FCT Portugal|SFRH/BPD/66818/2009|VR|2010-3848|Swedish Governmental Agency for Innovation Systems (VINNOVA)|2011-03486|

    Available from: 2012-04-10 Created: 2012-04-10 Last updated: 2017-12-07Bibliographically approved
    6. Bandgap Engineering and Optical Constants of YxAl1-xN Alloys
    Open this publication in new window or tab >>Bandgap Engineering and Optical Constants of YxAl1-xN Alloys
    Show others...
    2013 (English)In: Japanese Journal of Applied Physics, ISSN 0021-4922, E-ISSN 1347-4065, Vol. 52, no 8Article in journal (Refereed) Published
    Abstract [en]

    We study wurtzite Yx Al1-xN (0 andlt;= x andlt;= 0:22) films with (0001) orientation deposited by magnetron sputtering epitaxy on Si(100) substrates and we determine the alloys band gap energies and optical constants. Room temperature spectroscopic ellipsometry (SE) is employed in the energy range from 1 to 6.3 eV, and data modeling based on the standard dielectric function model is used. As a result of the SE data analysis the Yx Al1-xN refractive index and extinction coefficient are determined. The band gap of Yx Al1-xN is found to decrease linearly from 6.2 eV (x=0) down to 4.5 eV (x=0:22). We further observe an increase of the refractive index with increasing Y content; from 1.93 to 2.20 (at 2 eV) for x=0 and 0.22, respectively, reflecting the increase in material density.

    Place, publisher, year, edition, pages
    Japan Society of Applied Physics, 2013
    National Category
    Engineering and Technology
    Identifiers
    urn:nbn:se:liu:diva-98153 (URN)10.7567/JJAP.52.08JM02 (DOI)000323883100159 ()
    Note

    Funding Agencies|FCT|REF:SFRH/BPD/66818/2009|Swedish Research Council (VR)|2010-3848|Linko "ping Linnaeus Initiative on Nanoscale Functional Materials (LiLiNFM)||Swedish Governmental Agency for Innovation Systems (VINNOVA)|2011-03486|

    Available from: 2013-09-30 Created: 2013-09-30 Last updated: 2017-12-06
  • 9.
    Žukauskaitė, Agnė
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Metastable YAlN and ScAlN thin films: growth and characterization2012Licentiate thesis, comprehensive summary (Other academic)
    Abstract [en]

    ScxAl1-xN and YxAl1-xN thin films were deposited in a ultra high vacuum system using reactive magnetron co-sputtering from elemental Al, Sc and Y targets in Ar/N2. Their mechanical, electrical, optical, and piezoelectrical properties were investigated with the help of transmission electron microscopy, xray diffraction, ellipsometry, I-V and C-V measurements, and two different techniques for piezoelectric characterization: piezoresponse force microscopy and double beam interferometry. Compared to AlN, improved electromechanical coupling and increase in piezoelectric response was found in ScxAl1-xN/TiN/Al2O3 structures with Sc content up to x=0.2. Microstructure of the films had a stronger influence on piezoelectric properties than the crystalline quality, which affected the leakage currents. YxAl1-xN thin films show a formation of solid solution up to x=0.22. Lattice constants obtained experimentally are in good agreement with theoretical predictions obtained through first principle (ab initio) calculations using density-functional formalism. The mixing enthalpy for wurtzite, cubic, and layered hexagonal phases of the YxAl1-xN system was also calculated.

    List of papers
    1. Increased electromechanical coupling in w-ScxAl1-xN
    Open this publication in new window or tab >>Increased electromechanical coupling in w-ScxAl1-xN
    Show others...
    2010 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 97, no 11, p. 112902-Article in journal (Refereed) Published
    Abstract [en]

    AlN is challenged as the material choice in important thin film electroacoustic devices for modern wireless communication applications. We present the promise of superior electromechanical coupling (kt2), in w−ScxAl1−xN by studying its dielectric properties. w−ScxAl1−xN (0≤x≤0.3) thin films grown by dual reactive magnetron sputtering exhibited low dielectric losses along with minor increased dielectric constant (ε). Ellipsometry measurements of the high frequency ε showed good agreement with density function perturbation calculations. Our data show that kt2 will improve from 7% to 10% by alloying AlN with up to 20 mol % ScN.

     

    National Category
    Physical Sciences
    Identifiers
    urn:nbn:se:liu:diva-59839 (URN)10.1063/1.3489939 (DOI)000282032900055 ()
    Note
    Original Publication: Gunilla Wingqvist, Ferenc Tasnadi, Agne Zukauskaite, Jens Birch, Hans Arwin and Lars Hultman, Increased electromechanical coupling in w-ScxAl1-xN, 2010, Applied Physics Letters, (97), 11, 112902. http://dx.doi.org/10.1063/1.3489939 Copyright: American Institute of Physics http://www.aip.org/ Available from: 2010-09-27 Created: 2010-09-27 Last updated: 2017-12-12Bibliographically approved
    2. Microstructure and Dielectric Properties of Piezoelectric Magnetron Sputtered w-ScxAl1-xN thin films
    Open this publication in new window or tab >>Microstructure and Dielectric Properties of Piezoelectric Magnetron Sputtered w-ScxAl1-xN thin films
    Show others...
    2012 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 111, no 9, p. 093527-Article in journal (Refereed) Published
    Abstract [en]

    Piezoelectric wurtzite ScxAl1-xN (x=0, 0.1, 0.2, 0.3) thin films were epitaxially grown by reactive magnetron co-sputtering from elemental Sc and Al targets. Al2O3(0001) wafers with TiN(111) seed and electrode layers were used as substrates. X-ray diffraction shows that an increase in the Sc content results in the degradation of the crystalline quality. Samples grown at 400 °C possess true dielectric behavior with quite low dielectric losses and the leakage current is negligible. For ScAlN samples grown at 800 °C, the crystal structure is poor and leakage current is high. Transmission electron microscopy with energy dispersive x-ray spectroscopy mapping shows a mass separation into ScN-rich and AlN-rich domains for x≥0.2 when substrate temperature is increased from 400 to 800 °C. The piezoelectric response of epitaxial ScxAl1-xN films measured by piezoresponse force microscopy and double beam interferometry shows up to 180% increase by the addition of Sc up to x=0.2 independent of substrate temperature, in good agreement with previous theoretical predictions based on density-functional theory.

    Place, publisher, year, edition, pages
    American Institute of Physics (AIP), 2012
    National Category
    Natural Sciences
    Identifiers
    urn:nbn:se:liu:diva-76471 (URN)10.1063/1.4714220 (DOI)000304109900044 ()
    Available from: 2012-04-10 Created: 2012-04-10 Last updated: 2017-12-07Bibliographically approved
    3. YxAl1-xN Thin Films
    Open this publication in new window or tab >>YxAl1-xN Thin Films
    Show others...
    2012 (English)In: Journal of Physics D: Applied Physics, ISSN 0022-3727, E-ISSN 1361-6463, Vol. 45, no 42, p. 422001-Article in journal (Refereed) Published
    Abstract [en]

    Reactive magnetron sputtering was used to deposit YxAl1-xN thin films, 0≤x≤0.22, onto Al2O3(0001) and Si(100) substrates. X-ray diffraction and analytical electron microscopy show that the films are solid solutions. Lattice constants are increasing with Y concentration, in agreement with ab initio calculations. Spectroscopic ellipsometry measurements reveal a band gap decrease from 6.2 eV (x=0) down to 4.9 eV (x=0.22). Theoretical investigations within the special quasirandom structure approach show that the wurtzite structure has the lowest mixingenthalpy for 0≤x≤0.75.

    Place, publisher, year, edition, pages
    Institute of Physics Publishing (IOPP), 2012
    National Category
    Natural Sciences
    Identifiers
    urn:nbn:se:liu:diva-76472 (URN)10.1088/0022-3727/45/42/422001 (DOI)000309766700001 ()
    Note

    funding agencies|Linkoping Linnaeus Initiative on Nanoscale Functional Materials (LiLiNFM)||Swedish Research Council (VR)|349-2008-6582|FCT Portugal|SFRH/BPD/66818/2009|VR|2010-3848|Swedish Governmental Agency for Innovation Systems (VINNOVA)|2011-03486|

    Available from: 2012-04-10 Created: 2012-04-10 Last updated: 2017-12-07Bibliographically approved
  • 10.
    Žukauskaitė, Agnė
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Tholander, Christopher
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Pališaitis, Justinas
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Persson, Per O. Å.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Darakchieva, Vanya
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, The Institute of Technology.
    Ben Sedrine, Nebiha
    Instituto Tecnológico e Nuclear, 2686-953 Sacavém and CFNUL, Lisbon 1649-003, Portugal.
    Tasnádi, Ferenc
    Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics. Linköping University, The Institute of Technology.
    Alling, Björn
    Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics. Linköping University, The Institute of Technology.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    YxAl1-xN Thin Films2012In: Journal of Physics D: Applied Physics, ISSN 0022-3727, E-ISSN 1361-6463, Vol. 45, no 42, p. 422001-Article in journal (Refereed)
    Abstract [en]

    Reactive magnetron sputtering was used to deposit YxAl1-xN thin films, 0≤x≤0.22, onto Al2O3(0001) and Si(100) substrates. X-ray diffraction and analytical electron microscopy show that the films are solid solutions. Lattice constants are increasing with Y concentration, in agreement with ab initio calculations. Spectroscopic ellipsometry measurements reveal a band gap decrease from 6.2 eV (x=0) down to 4.9 eV (x=0.22). Theoretical investigations within the special quasirandom structure approach show that the wurtzite structure has the lowest mixingenthalpy for 0≤x≤0.75.

  • 11.
    Žukauskaitė, Agnė
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology. Fraunhofer Institute for Applied Solid State Physics, Freiburg, Germany.
    Tholander, Christopher
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Tasnádi, Ferenc
    Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics. Linköping University, The Institute of Technology.
    Alling, Björn
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Pališaitis, Justinas
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Lu, Jun
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Persson, Per O. Å.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Stabilization of Wurtzite Sc0.4Al0.6N in Pseudomorphic Epitaxial ScxAl1-xN/InyAl1-yN Superlattices2015In: Acta Materialia, ISSN 1359-6454, E-ISSN 1873-2453, Vol. 94, p. 101-110Article in journal (Refereed)
    Abstract [en]

    Pseudomorphic stabilization in wurtzite ScxAl1-xN/AlN and ScxAl1-xN/InyAl1-yN superlattices (x=0.2, 0.3, and 0.4; y=0.2-0.72), grown by reactive magnetron sputter epitaxy was investigated. X-ray diffraction and transmission electron microscopy show that in ScxAl1-xN/AlN superlattices the compressive biaxial stresses due to positive lattice mismatch in Sc0.3Al0.7N and Sc0.4Al0.6N lead to loss of epitaxy, although the structure remains layered. For the negative lattice mismatched In-rich ScxAl1-xN/InyAl1-yN superlattices a tensile biaxial stress promotes the stabilization of wurtzite ScxAl1-xN even for the highest investigated concentration x=0.4. Ab initio calculations with fixed in-plane lattice parameters show a reduction in mixing energy for wurtzite ScxAl1-xN under tensile stress when x≥0.375 and support the experimental results.

  • 12.
    Žukauskaitė, Agnė
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Wingqvist, Gunilla
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Pališaitis, Justinas
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Jensen, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Persson, Per O. Å.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Matloub, Ramin
    Ceramics Laboratory, Ecole Polytechnique Fédérale de Lausanne EPFL, Lausanne, SwitzerlandNational Laboratory, Oak Ridge, TN 37831, United States.
    Muralt, Paul
    Ceramics Laboratory, Ecole Polytechnique Fédérale de Lausanne EPFL, Lausanne, Switzerland.
    Kim, Yunseok
    Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States.
    Birch, Jens
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Hultman, Lars
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
    Microstructure and Dielectric Properties of Piezoelectric Magnetron Sputtered w-ScxAl1-xN thin films2012In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 111, no 9, p. 093527-Article in journal (Refereed)
    Abstract [en]

    Piezoelectric wurtzite ScxAl1-xN (x=0, 0.1, 0.2, 0.3) thin films were epitaxially grown by reactive magnetron co-sputtering from elemental Sc and Al targets. Al2O3(0001) wafers with TiN(111) seed and electrode layers were used as substrates. X-ray diffraction shows that an increase in the Sc content results in the degradation of the crystalline quality. Samples grown at 400 °C possess true dielectric behavior with quite low dielectric losses and the leakage current is negligible. For ScAlN samples grown at 800 °C, the crystal structure is poor and leakage current is high. Transmission electron microscopy with energy dispersive x-ray spectroscopy mapping shows a mass separation into ScN-rich and AlN-rich domains for x≥0.2 when substrate temperature is increased from 400 to 800 °C. The piezoelectric response of epitaxial ScxAl1-xN films measured by piezoresponse force microscopy and double beam interferometry shows up to 180% increase by the addition of Sc up to x=0.2 independent of substrate temperature, in good agreement with previous theoretical predictions based on density-functional theory.

1 - 12 of 12
CiteExportLink to result list
Permanent link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf