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  • 1.
    Arwin, Hans
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tillämpad optik.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Paskova, Tanja
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Paskov, Plamen
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Schubert, Mattias
    Department of Electrical Engineering University of Nebraska.
    Figge, S
    Hommel, D
    Haskell, B A
    Fini, P T
    Nakamura, S
    Assessment of phonon mode characteristics via infrared spectroscopic ellipsometry on a-plane GaN2005Ingår i: ICSN-6,2005, 2005Konferensbidrag (Övrigt vetenskapligt)
  • 2.
    Ashkenov, N.
    et al.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany.
    Mbenkum, B.N.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany.
    Bundesmann, C.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany.
    Riede, V.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany.
    Lorenz, M.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany.
    Spemann, D.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany.
    Kaidashev, E.M.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany, Rostov State University, Mech./Appl. Math. Research Institute, 200/1 Stachky Avenue, Rostov-on-Don 344090, Russian Federation.
    Kasic, A.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany.
    Schubert, M.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany.
    Grundmann, M.
    Universität Leipzig, Fak. F. Phys. and Geowissenschaften, Inst. F. Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany.
    Wagner, G.
    Inst. F. Nichtklassische Chem. e.V., Universität Leipzig, Permoserstraße 15, 04318 Leipzig, Germany.
    Neumann, H.
    Inst. F. O. e.V., Permoserstrasse 15, 04303 Leipzig, Germany.
    Darakchieva, Vanya
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Arwin, Hans
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tillämpad optik.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Infrared dielectric functions and phonon modes of high-quality ZnO films2003Ingår i: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 93, nr 1, s. 126-133Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    A study was performed on the phonon modes and infrared dielectric functions of high-quality ZnO thin films. The pulsed laser deposition technique was used to deposit the ZnO films on c-plane sapphire substrates and were investigated by high-resolution transmission electron microscopy, high-resolution x-ray diffraction and Rutherford backscattering experiments. The accurate long-wavelength dielectric constant limits of the films were also obtained and were compared with near-band-gap index-of-refraction data upon the Lyddane-Sachs-Teller relation for both film and bulk samples. It was found that the phonon modes of the film were highly consistent with those of the bulk sample.

  • 3. Atanassov, A
    et al.
    Baleva, M
    Darakchieva, Vanya
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Goranova, E
    Grazing incident asymmetric X-ray diffraction of beta-FeSi2 layers, produced by ion beam synthesis2004Ingår i: Vacuum, ISSN 0042-207X, E-ISSN 1879-2715, Vol. 76, nr 02-Mar, s. 277-280Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The crystal structure of beta-FeSi2 phase, prepared by ion beam synthesis (IBS) method, followed by rapid thermal annealing (RTA) is investigated by grazing incident asymmetric X-ray diffraction (GIAXRD). The X-ray spectra, obtained at different grazing angles, indicated that the beta-FeSi2 phase is formed in the whole implantation range. From the comparison of the reflections intensities ratios, it is found that in the metal-deficient regions, where the beta-FeSi2 phase is present in the form of precipitates, the crystallites orientation is influenced by the one of the silicon substrates, while the orientation in the metal-rich region is different and depends on the annealing temperature. (C) 2004 Elsevier Ltd. All rights reserved.

  • 4.
    Barradas, N. P.
    et al.
    Instituto Tecnológico e Nuclear, E.N. 10, Sacavém 2686‐953, Portugal.
    Lorenz, K
    Instituto Tecnológico e Nuclear, E.N. 10, Sacavém 2686‐953, Portugal.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Alves, E
    Instituto Tecnológico e Nuclear, E.N. 10, Sacavém 2686‐953, Portugal.
    A Double Scattering Analytical Model For Elastic Recoil Detection Analysis2011Ingår i: AIP Conference Proceedings, Volume 1336, 2011, s. 314-318Konferensbidrag (Refereegranskat)
    Abstract [en]

    We present an analytical model for calculation of double scattering in elastic recoil detection measurements. Only events involving the beam particle and the recoil are considered, i.e. 1) an ion scatters off a target element and then produces a recoil, and 2) an ion produces a recoil which then scatters off a target element. Events involving intermediate recoils are not considered, i.e. when the primary ion produces a recoil which then produces a second recoil. If the recoil element is also present in the stopping foil, recoil events in the stopping foil are also calculated. We included the model in the standard code for IBA data analysis NDF, and applied it to the measurement of hydrogen in Si.

  • 5.
    Ben Sedrine, N.
    et al.
    Institute Tecnology and Nucl, Sacavem, Portugal.
    Bouhafs, C.
    Centre Rech and Technology Energie, Lab Photovolt Semicond and Nanostruct, Hammam Lif 2050, Tunisia.
    Harmand, J.C.
    CNRS.
    Chtourou, R.
    Centre Rech and Technology Energie, Lab Photovolt Semicond and Nanostruct, Hammam Lif 2050, Tunisia.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Effect of nitrogen on the GaAs0.9-xNxSb0.1 dielectric function from the near-infrared to the ultraviolet2010Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 97, nr 20, s. 201903-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We study the effect of nitrogen on the GaAs0.9-xNxSb0.1 (x = 0.00, 0.65%, 1.06%, 1.45%, and 1.90%) alloy dielectric function by spectroscopic ellipsometry in the energy range from 0.73 to 4.75 eV. The compositional dependences of the critical points energies for the GaAs0.9-xNxSb0.1 are obtained. In addition to the GaAs intrinsic transitions E-1, E-1+ Delta(1), and E-0, the nitrogen-induced Gamma-point optical transitions E-0 and E+, together with a third transition E-#, are identified. We find that with increasing the N content, the E-0 transition shifts to lower energies while the E+ and (E)# transitions shift to higher energies. We suggest that the origin of the E-0, E+, and E-# transitions may be explained by the double band anticrossing (BAC) model, consisting of a conduction BAC model and a valence BAC model.

  • 6.
    Ben Sedrine, N
    et al.
    Centre Rech and Technology Energie, Sacavem.
    Bouhafs, C
    Centre Rech and Technology Energie, Sacavem.
    Schubert, M
    University of Nebraska.
    Harmand, J C
    CNRS.
    Chtourou, R
    Centre Rech and Technology Energie, Sacavem.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Optical properties of GaAs0.9-xNxSb0.1 alloy films studied by spectroscopic ellipsometry2011Ingår i: THIN SOLID FILMS, ISSN 0040-6090, Vol. 519, nr 9, s. 2838-2842Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Spectroscopic ellipsometry from 0.73 to 4.75 eV was used to study the optical properties of epitaxial GaAs0.9-xNxSb0.1 layers with x=0.00, 0.65, 1.06, 1.45 and 1.90%. The ellipsometric experimental spectra were fitted using a multilayer model employing the model dielectric function to describe the GaAs0.9-xNxSb0.1 optical response. We have identified the Gamma-point E-0, E+, and E-# transitions of GaAs0.9-xNxSb0.1 and have determined the effect of nitrogen on the respective transition energies. We have demonstrated that a lower N content can provide an equal E+-E-0 energy splitting for GaAs0.9-xNxSb0.1 with respect to GaAs1-xNx.

  • 7.
    Ben Sedrine, Nabiha
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan. University of Aveiro, Portugal; University of Aveiro, Portugal.
    Zukauskaite, Agne
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska fakulteten. Fraunhofer Institute Appl Solid State Phys, Germany.
    Birch, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska fakulteten.
    Jensen, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska fakulteten.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska fakulteten.
    Schoeche, S.
    University of Nebraska, NE 68588 USA.
    Schubert, M.
    University of Nebraska, NE 68588 USA.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska fakulteten.
    Infrared dielectric functions and optical phonons of wurtzite YxAl1-xN (0 less than= x less than= 0.22)2015Ingår i: Journal of Physics D: Applied Physics, ISSN 0022-3727, E-ISSN 1361-6463, Vol. 48, nr 41, s. 415102-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    YAlN is a new member of the group-III nitride family with potential for applications in next generation piezoelectric and light emitting devices. We report the infrared dielectric functions and optical phonons of wurtzite (0001) YxAl1-xN epitaxial films with 0 less than= x less than= 0.22. The films are grown by magnetron sputtering epitaxy on c-plane Al2O3 and their phonon properties are investigated using infrared spectroscopic ellipsometry and Raman scattering spectroscopy. The infrared-active E-1(TO) and LO, and the Raman active E-2 phonons are found to exhibit one-mode behavior, which is discussed in the framework of the MREI model. The compositional dependencies of the E-1(TO), E-2 and LO phonon frequencies, the high-frequency limit of the dielectric constant, epsilon(infinity), the static dielectric constant, epsilon(0), and the Born effective charge Z(B) are established and discussed.

  • 8.
    Ben Sedrine, Nebiha
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Zukauskaite, Agne
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Birch, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Bandgap Engineering and Optical Constants of YxAl1-xN Alloys2013Ingår i: Japanese Journal of Applied Physics, ISSN 0021-4922, E-ISSN 1347-4065, Vol. 52, nr 8Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We study wurtzite Yx Al1-xN (0 andlt;= x andlt;= 0:22) films with (0001) orientation deposited by magnetron sputtering epitaxy on Si(100) substrates and we determine the alloys band gap energies and optical constants. Room temperature spectroscopic ellipsometry (SE) is employed in the energy range from 1 to 6.3 eV, and data modeling based on the standard dielectric function model is used. As a result of the SE data analysis the Yx Al1-xN refractive index and extinction coefficient are determined. The band gap of Yx Al1-xN is found to decrease linearly from 6.2 eV (x=0) down to 4.5 eV (x=0:22). We further observe an increase of the refractive index with increasing Y content; from 1.93 to 2.20 (at 2 eV) for x=0 and 0.22, respectively, reflecting the increase in material density.

  • 9.
    Boosalis, A.
    et al.
    University of Nebraska, USA .
    Hofmann, T.
    University of Nebraska, USA.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Yakimova, Rositsa
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Schubert, M.
    University of Nebraska, USA .
    Visible to vacuum ultraviolet dielectric functions of epitaxial graphene on 3C and 4H SiC polytypes determined by spectroscopic ellipsometry2012Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 101, nr 1Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Spectroscopic ellipsometry measurements in the visible to vacuum-ultraviolet spectra (3.5-9.5 eV) are performed to determine the dielectric function of epitaxial graphene on SiC polytypes, including 4H (C-face and Si-face) and 3C SiC (Si-face). The model dielectric function of graphene is composed of two harmonic oscillators and allows the determination of graphene quality, morphology, and strain. A characteristic van Hove singularity at 4.5 eV is present in the dielectric function of all samples, in agreement with observations on exfoliated as well as chemical vapor deposited graphene in the visible range. Model dielectric function analysis suggests that none of our graphene layers experience a significant degree of strain. Graphene grown on the Si-face of 4H SiC exhibits a dielectric function most similar to theoretical predictions for graphene. The carbon buffer layer common for graphene on Si-faces is found to increase polarizability of graphene in the investigated spectrum.

  • 10.
    Boosalis, Alexander
    et al.
    Department of Electrical Engineering, University of Nebraska–Lincoln, Lincoln, Nebraska, U.S.A..
    Hofmann, Tino
    Department of Electrical Engineering, University of Nebraska–Lincoln, Lincoln, Nebraska, U.S.A..
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Yakimova, Rositza
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Tiwald, Tom
    J.A. Woollam Co., Lincoln, Nebraska, U.S.A..
    Schubert, Mathias
    Department of Electrical Engineering, University of Nebraska–Lincoln, Lincoln, Nebraska, U.S.A..
    Spectroscopic Mapping Ellipsometry of Graphene Grown on 3C SiC2012Ingår i: MRS Proceedings Volume 1407, 2012, s. aa20-43Konferensbidrag (Refereegranskat)
    Abstract [en]

    Spectroscopic mapping ellipsometry measurements in the visible spectrum (1.25 to 5.35 eV) are performed to determine the lateral variations of epitaxial graphene properties as grown on 3C SiC. Data taken in the visible spectrum is sensitive to both the Drude absorption of free charge carriers and the characteristic exciton enhanced van Hove singularity at 5 eV. Subsequent analysis with simple oscillator models allows the determination of physical parameters such as free charge carrier scattering time and local graphene thickness with a lateral resolution of 50 microns.

  • 11.
    Bouhafs, Chamseddine
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Persson, Ingemar
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Tiberj, A.
    University of Montpellier 2, France.
    Persson, Per O A
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Paillet, M.
    University of Montpellier 2, France.
    Zahab, A. -A.
    University of Montpellier 2, France.
    Landois, P.
    University of Montpellier 2, France.
    Juillaguet, S.
    University of Montpellier 2, France.
    Schoeche, S.
    University of Nebraska, NE 68588 USA; University of Nebraska, NE 68588 USA.
    Schubert, M.
    University of Nebraska, NE 68588 USA; University of Nebraska, NE 68588 USA.
    Yakimova, Rositsa
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Structural properties and dielectric function of graphene grown by high-temperature sublimation on 4H-SiC(000-1)2015Ingår i: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 117, nr 8, s. 085701-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Understanding and controlling growth of graphene on the carbon face (C-face) of SiC presents a significant challenge. In this work, we study the structural, vibrational, and dielectric function properties of graphene grown on the C-face of 4H-SiC by high-temperature sublimation in an argon atmosphere. The effect of growth temperature on the graphene number of layers and crystallite size is investigated and discussed in relation to graphene coverage and thickness homogeneity. An amorphous carbon layer at the interface between SiC and the graphene is identified, and its evolution with growth temperature is established. Atomic force microscopy, micro-Raman scattering spectroscopy, spectroscopic ellipsometry, and high-resolution cross-sectional transmission electron microscopy are combined to determine and correlate thickness, stacking order, dielectric function, and interface properties of graphene. The role of surface defects and growth temperature on the graphene growth mechanism and stacking is discussed, and a conclusion about the critical factors to achieve decoupled graphene layers is drawn. (C) 2015 AIP Publishing LLC.

  • 12.
    Catarino, N
    et al.
    Instituto Tecnológico e Nuclear/IST - Estrada Nacional 10, 2686-953 Sacavém, Portugal, EU .
    Nogales, E
    Departamento de Física de Materiales, Universidad Complutense - 28040 Madrid, Spain, EU .
    Franco, N
    Instituto Tecnológico e Nuclear/IST - Estrada Nacional 10, 2686-953 Sacavém, Portugal, EU and Centro de Física Nuclear da Universidade de Lisboa - Av. Prof. Gama Pinto, 1649-003 Lisboa, Portugal, EU.
    Darakchieva, Vanya
    Instituto Tecnol´ogico e Nuclear/IST, Sacavem, Portugal, EU; Centro de F´ısica Nuclear da Universidade de Lisboa - Av. Prof. Gama Pinto, 1649-003 Lisboa, Portugal, EU .
    Miranda, S. M. C.
    Instituto Tecnológico e Nuclear/IST - Estrada Nacional 10, 2686-953 Sacavém, Portugal, EU .
    Mendez, B
    Departamento de Física de Materiales, Universidad Complutense - 28040 Madrid, Spain, EU .
    Alves, E
    Instituto Tecnológico e Nuclear/IST - Estrada Nacional 10, 2686-953 Sacavém, Portugal, EU and Centro de Física Nuclear da Universidade de Lisboa - Av. Prof. Gama Pinto, 1649-003 Lisboa, Portugal, EU.
    Marques, J. G.
    Instituto Tecnológico e Nuclear/IST - Estrada Nacional 10, 2686-953 Sacavém, Portugal, EU and Centro de Física Nuclear da Universidade de Lisboa - Av. Prof. Gama Pinto, 1649-003 Lisboa, Portugal, EU.
    Lorenz, K
    Instituto Tecnológico e Nuclear/IST - Estrada Nacional 10, 2686-953 Sacavém, Portugal, EU and Centro de Física Nuclear da Universidade de Lisboa - Av. Prof. Gama Pinto, 1649-003 Lisboa, Portugal, EU.
    Enhanced dynamic annealing and optical activation of Eu implanted a-plane GaN2012Ingår i: Europhysics letters, ISSN 0295-5075, E-ISSN 1286-4854, Vol. 97, nr 6, s. 68004-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The implantation damage build-up and optical activation of a-plane and c-plane GaN epitaxial films were compared upon 300 keV Eu implantation at room temperature. The implantation defects cause an expansion of the lattice normal to the surface, i.e. along the a-direction in a-plane and along the c-direction in c-plane GaN. The defect profile is bimodal with a pronounced surface damage peak and a second damage peak deeper in the bulk of the samples in both cases. For both surface orientations, the bulk damage saturates for high fluences. Interestingly, the saturation level for a-plane GaN is nearly three times lower than that for c-plane material suggesting very efficient dynamic annealing and strong resistance to radiation. a-plane GaN also shows superior damage recovery during post-implant annealing compared to c-plane GaN. For the lowest fluence, damage in a-plane GaN was fully removed and strong Eu-related red luminescence is observed. Although some residual damage remained after annealing for higher fluences as well as in all c-plane samples, optical activation was achieved in all samples revealing the red emission lines due to the 5D0 7F2transition in the Eu3+ ion. The presented results demonstrate a great promise for the use of ion beam processing for a-plane GaN based electronic devices as well as for the development of radiation tolerant electronics.

  • 13.
    Cubarovs, Mihails
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Pedersen, Henrik
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Jens, Jensen
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Persson, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Henry, Anne
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Epitaxial CVD growthof sp2-hybridized boron nitrideusing aluminum nitride as buffer layer2011Ingår i: Physica Status Solidi. Rapid Research Letters, ISSN 1862-6254, E-ISSN 1862-6270, Vol. 5, nr 10-11, s. 397-399Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Epitaxial growth of sp2-hybridized boron nitride (BN) using chemical vapour deposition, with ammonia and triethyl boron as precursors, is enabled on sapphire by introducing an aluminium nitride (AlN) buffer layer. This buffer layer is formed by initial nitridation of the substrate. Epitaxial growth is verified by X-ray diffraction measurements in Bragg–Brentano configuration, pole figure measurements and transmission electron microscopy. The in-plane stretching vibration of sp2-hybridized BN is observed at 1366 cm–1 from Raman spectroscopy. Time-of-flight elastic recoil detection analysis confirms almost perfect stoichiometric BN with low concentration of carbon, oxygen and hydrogen contaminations.

  • 14.
    Darakchieva, Vanya
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Infrared generalized ellipsometry on non-polar and superlattice group-III nitride films: Strain and phonon anisotropy2008Ingår i: Physica Status Solidi (A) Applications and Materials, ISSN 1862-6300, Vol. 205, nr 4, s. 905-913Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    This contribution reviews the application of generalized infrared spectroscopic ellipsometry (GIRSE) to studies of optical phonons in heteroepitaxial wurtzite GaN films with a-plane orientation and c-plane Al(Ga)N/GaN superlattices. We demonstrate the capability of GIRSE to detect spectrally narrow dichroism, caused by anisotropic strain in non-polar oriented films thereby allowing a precise location of the phonon mode resonances for different polarizations. A distinct correlation between anisotropic strain components, which have been independently asessed by high-resolution X-ray diffraction, and phonon frequencies reveal the phonon deformation potentials. Further, GIRSF is shown to be a valuable tool in identification of superlattice phonon modes and their character. The frequency shifts of the superlattice modes with respect to the strain-free positions are analyzed versus strain and composition in order to assess the mode suitability for estimation of strain, polarization doping, and composition for the individual layers in complex device heterostructures. © 2008 WILEY-VCH Verlag GmbH & Co. KGaA.

  • 15.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Unraveling the free electron behavior in InN2008Ingår i: International Conference on electronic Materials 2008, IUMRS-ICEM 2008,2008, 2008, s. 34-Konferensbidrag (Refereegranskat)
    Abstract [en]

      

  • 16.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Barradas, N P
    Institute Tecnol and Nucl, P-2686953 Sacavem, Portugal CFNUL, P-1649003 Lisbon, Portugal .
    Xie, Mengyao
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Lorenz, K
    Institute Tecnol and Nucl, P-2686953 Sacavem, Portugal CFNUL, P-1649003 Lisbon, Portugal .
    Alves, E
    Institute Tecnol and Nucl, P-2686953 Sacavem, Portugal CFNUL, P-1649003 Lisbon, Portugal .
    Schubert, M
    University Nebraska, Department Elect Engn, Lincoln, NE 68588 USA .
    Persson, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Giuliani, Finn
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Munnik, F
    Forschungszentrum Dresden Rossendorf, D-01314 Dresden, Germany .
    Hsiao, Ching-Lien
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Tu, L W
    Natl Sun Yat Sen University, Department Phys, Kaohsiung 80424, Taiwan Natl Sun Yat Sen University, Centre Nanosci and Nanotechnol, Kaohsiung 80424, Taiwan .
    Schaff, W J
    Cornell University, Department Elect and Comp Engn, Ithaca, NY 14853 USA .
    Role of impurities and dislocations for the unintentional n-type conductivity in InN2009Ingår i: PHYSICA B-CONDENSED MATTER, ISSN 0921-4526, Vol. 404, nr 22, s. 4476-4481Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We present a study on the role of dislocations and impurities for the unintentional n-type conductivity in high-quality InN grown by molecular beam epitaxy. The dislocation densities and H profiles in films with free electron concentrations in the low 10(17) cm(-1) and mid 10(18) cm(-3) range are measured, and analyzed in a comparative manner. It is shown that dislocations alone could not account for the free electron behavior in the InN films. On the other hand, large concentrations of H sufficient to explain, but exceeding substantially, the observed free electron densities are found. Furthermore, enhanced concentrations of H are revealed at the film surfaces, resembling the free electron behavior with surface electron accumulation. The low-conductive film was found to contain C and it is suggested that C passivates the H donors or acts as an acceptor, producing compensated material in this case. Therefore, it is concluded that the unintentional impurities play an important role for the unintentional n-type conductivity in InN. We suggest a scenario of H incorporation in InN that may reconcile the previously reported observations for the different role of impurities and dislocations for the unintentional n-type conductivity in InN.

  • 17.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Beckers, Manfred
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Xie, Mengyao
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Monemar, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Carlin, J.-F
    Grandjean, N.
    Strain and compositional analyzes of Al-rich Al1-xInxN alloys grown by MOVPE: impact on the applicability of Vegard's rule2008Ingår i: Physica Status Solidi (C) Current Topics in Solid State Physics, 2008, s. 1859-1862Konferensbidrag (Refereegranskat)
    Abstract [en]

    We have studied composition and strain in Al1–xInxN films with 0.128 x 0.22 grown on GaN-buffered sapphire substrates by metalorganic vapor phase epitaxy. A good agreement between the In contents determined by Rutherford backscattering spectrometry (RBS) and Xray diffraction (XRD) is found for x 18, suggesting applicability of Vegard's rule in the narrow compositional range around the lattice matching to GaN. The increase of the In content up to x = 0.22 leads to a formation of sub-layers with a higher composition, accompanied by deviations from Vegard's rule. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

  • 18.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Beckers, Manfred
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Xie, Mengyao
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Monemar, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Carlin, J-. F.
    Feltin, E.
    Gonschorek, M.
    Grandjean, N.
    Effects of strain and composition on the lattice parameters and applicability of Vegard's rule in Al-rich Al1-x Inx N films grown on sapphire2008Ingår i: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 103, nr 10, s. 103513-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The lattice parameters and strain evolution in Al1-x In x N films with 0.07≤x≤0.22 grown on GaN-buffered sapphire substrates by metal organic vapor phase epitaxy have been studied by reciprocal space mapping. Decoupling of compositional effects on the strain determination was accomplished by measuring the In contents in the films both by Rutherford backscattering spectrometry (RBS) and x-ray diffraction (XRD). Differences between XRD and RBS In contents are discussed in terms of compositions and biaxial strain in the films. It is suggested that strain plays an important role for the observed deviation from Vegard's rule in the case of pseudomorphic films. On the other hand, a good agreement between the In contents determined by XRD and RBS is found for Al1-x Inx N films with low degree of strain or partially relaxed, suggesting applicability of Vegard's rule in the narrow compositional range around the lattice matching to GaN. © 2008 American Institute of Physics.

  • 19.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Birch, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Paskov, Plamen
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Tungasmita, Sukkaneste
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Strain evolution in high temperature AlN buffer layers for HVPE-GaN growth2002Ingår i: Physica status solidi. A, Applied research, ISSN 0031-8965, E-ISSN 1521-396X, Vol. 190, nr 1, s. 59-64Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    High temperature AlN buffer layers are deposited on a-plane sapphire by reactive magnetron sputtering. The effect of the buffer thickness on the AlN structural properties and surface morphology are studied in correlation with the subsequent hydride vapour phase epitaxy of GaN. A minimum degree of mosaicity and screw dislocation density is determined for a 50 nm thick AlN buffer. With increasing the AlN thickness, a strain relaxation occurs as a result of misfit dislocation generation and higher degree of mosaicity. A blue shift of the E-1(TO) frequency evaluated by means of infrared reflection spectroscopy is linearly correlated with an increase in biaxial compressive stress in the films through the IR stress factor k(E1)(b) = 2.57 +/- 0.26 cm(-1) GPa(-1).

  • 20.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Birch, Jens
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Schubert, M
    Paskova, Tanja
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Tungasmita, S
    Wagner, G
    Kasic, A
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Strain-related structural and vibrational properties of thin epitaxial AIN layers2004Ingår i: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 70, nr 4, s. 045411-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The effect of film thickness on the strain and structural properties of thin epitaxial AIN films has been investigated by high resolution x-ray diffraction techniques and transmission electron microscopy. As a result a sublayer model of the degree of strain and related defects for all films is proposed. A sublayer with low defect density and a strain gradient is found to be present in all films and it reaches a maximum thickness of 65 nm. The films are compressively strained and the strain relaxation after a thickness of 65 nm is shown to be accompanied by misfit dislocation generation and increase of the mosaic tilt. The vibrational properties of the films have been studied by generalized infrared spectroscopic ellipsometry. The proposed sublayer model has been successfully applied to the analysis of the ellipsometry data through model calculations of the infrared dielectric function which confirm the sublayer model. It is found that the strain gradient results in a gradient of the phonon mode frequencies and broadening parameter. The initial strain relaxation in the films leads to narrowing of the observable infrared modes, while further strain relaxation broadens the modes when substantial defect generation occurs.

  • 21.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Boosalis, A.
    Department of Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska, USA.
    Zakharov, A. A.
    Lund University, Maxlab, Lund, Sweden.
    Hofmann, T.
    Department of Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska, USA.
    Schubert, M.
    Department of Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska, USA.
    Tiwald, T. E.
    J. A. Woollam Co., Lincoln, Nebraska, USA.
    Iakimov, Tihomir
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Vasiliauskas, Remigijus
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Yakimova, Rositsa
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Large-area microfocal spectroscopic ellipsometry mapping of thickness and electronic properties of epitaxial graphene on Si- and C-face of 3C-SiC(111)2013Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 102, nr 21, s. 213116-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Microfocal spectroscopic ellipsometry mapping of the electronic properties and thickness of epitaxial graphene grown by high-temperature sublimation on 3C-SiC (111) substrates is reported. Growth of one monolayer graphene is demonstrated on both Si- and C-polarity of the 3C-SiC substrates and it is shown that large area homogeneous single monolayer graphene can be achieved on the Si-face substrates. Correlations between the number of graphene monolayers on one hand and the main transition associated with an exciton enhanced van Hove singularity at ∼4.5 eV and the free-charge carrier scattering time, on the other are established. It is shown that the interface structure on the Si- and C-polarity of the 3C-SiC(111) differs and has a determining role for the thickness and electronic properties homogeneity of the epitaxial graphene.

  • 22.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Hofmann, T.
    Schubert, M.
    Lu, H.
    Schaff, W.J.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Conduction band effective mass anisotropy and nonparabolicity of InN2006Ingår i: 3rd Workshop on Indium Nitride,2006, 2006Konferensbidrag (Refereegranskat)
    Abstract [en]

    Invited talk

  • 23.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Hofmann, T.
    Schubert, M.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Lu, H.
    Schaff, W.J.
    Hsiao, C.-L.
    Liu, T.-W.
    Chen, L.-C.
    Muto, D.
    Nanishi, Y.
    New insight into the free carrier properties of InN2008Ingår i: International workshop on Nitride semiconductors IWN2008,2008, 2008Konferensbidrag (Refereegranskat)
    Abstract [en]

      

  • 24.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Hofmann, T.
    University of Nebraska-Lincoln, USA.
    Schubert, M.
    University of Nebraska-Lincoln, USA.
    Sernelius, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Teoretisk Fysik. Linköpings universitet, Tekniska högskolan.
    Giuliani, Finn
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Xie, Mengyao
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Persson, Per O. A.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Monemar, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Schaff, W. J.
    Cornell University, Ithaca, NY, USA.
    Hsiao, C.-L.
    National Taiwan University, Taipei, Taiwan.
    Chen, L.-C.
    National Taiwan University, Taipei, Taiwan.
    Nanishi, Y
    Ritsumeikan University, Shiga, Japan.
    Unravelling the free electron behavior in InN2008Ingår i: Optoelectronic and Microelectronic Materials and Devices, 2008, IEEE , 2008, s. 90-97Konferensbidrag (Refereegranskat)
    Abstract [en]

    Precise measurement of the optical Hall effect in InN using magneto-optical generalized ellipsometry at IR and THz wavelengths, allows us to decouple the surface accumulation and bulk electron densities in InN films by non-contact optical means and further to precisely measure the effective mass and mobilities for polarizations parallel and perpendicular to the optical axis. Studies of InN films with different thicknesses, free electron densities and surface orientations enable an intricate picture of InN free electron properties to emerge. Striking findings on the scaling factors of the bulk electron densities with film thickness further supported by transmission electron microscopy point to an additional thickness dependent doping mechanism unrelated to dislocations. Surface electron accumulation is observed to occur not only at polar but also at non-polar and semi-polar wurtzite InN, and zinc blende InN surfaces. The persistent surface electron density shows a complex behavior with bulk density and surface orientation. This behavior might be exploited for tuning the surface charge in InN.

  • 25.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik. Linköpings universitet, Tekniska högskolan.
    Hofmann, T
    University of Nebraska.
    Schubert, M
    University of Nebraska.
    Sernelius, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Teoretisk Fysik. Linköpings universitet, Tekniska högskolan.
    Monemar, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik. Linköpings universitet, Tekniska högskolan.
    Persson, Per
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Giuliani, Finn
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Alves, E
    Sacavem, Portugal.
    Lu, H
    Cornell University.
    Schaff, W J
    Cornell University.
    Free electron behavior in InN: On the role of dislocations and surface electron accumulation2009Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 94, nr 2, s. 022109-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The free electron behavior in InN is studied on the basis of decoupled bulk and surface accumulation electron densities in InN films measured by contactless optical Hall effect. It is shown that the variation in the bulk electron density with film thickness does not follow the models of free electrons generated by dislocation-associated nitrogen vacancies. This finding, further supported by transmission electron microscopy results, indicates the existence of a different thickness-dependent doping mechanism. Furthermore, we observe a noticeable dependence of the surface electron density on the bulk density, which can be exploited for tuning the surface charge in future InN based devices.

  • 26.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Lorenz, K
    Institute of Tecnology and Nucl, Portugal .
    Barradas, N P
    Institute of Tecnology and Nucl, Portugal .
    Alves, E
    Institute of Tecnology and Nucl, Portugal .
    Monemar, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Schubert, M
    University of Nebraska.
    Franco, N
    Institute of Tecnology and Nucl, Portugal .
    L Hsiao, C
    National Taiwan University.
    Chen, L C
    National Taiwan University.
    Schaff, W J
    Cornell University.
    Tu, L W
    National Sun Yat Sen University.
    Yamaguchi, T
    Ritsumeikan University.
    Nanishi, Y
    Ritsumeikan University.
    Hydrogen in InN: A ubiquitous phenomenon in molecular beam epitaxy grown material2010Ingår i: APPLIED PHYSICS LETTERS, ISSN 0003-6951, Vol. 96, nr 8, s. 081907-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We study the unintentional H impurities in relation to the free electron properties of state-of-the-art InN films grown by molecular beam epitaxy (MBE). Enhanced concentrations of H are revealed in the near surface regions of the films, indicating postgrowth surface contamination by H. The near surface hydrogen could not be removed upon thermal annealing and may have significant implications for the surface and bulk free electron properties of InN. The bulk free electron concentrations were found to scale with the bulk H concentrations while no distinct correlation with dislocation density could be inferred, indicating a major role of hydrogen for the unintentional conductivity in MBE InN.

  • 27.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Lorenz, K
    CFNUL.
    Xie, Mengyao
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Alves, E
    CFNUL.
    Hsiao, C L
    National Taiwan University.
    Chen, L C
    National Taiwan University.
    Tu, L W
    National Sun Yat Sen University.
    Schaff, W J
    Cornell University.
    Yamaguchi, T
    Ritsumeikan University.
    Nanishi, Y
    Ritsumeikan University.
    Unintentional incorporation of hydrogen in wurtzite InN with different surface orientations2011Ingår i: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 110, nr 6, s. 063535-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We have studied hydrogen impurities and related structural properties in state-of-the-art wurtzite InN films with polar, nonpolar, and semipolar surface orientations. The effects of thermal annealing and chemical treatment on the incorporation and stability of H are also discussed. The near-surface and bulk hydrogen concentrations in the as-grown films increase when changing the surface orientation from (0001) to (000 (1) over bar) to (1 (1) over bar 01) and to (11 (2) over bar0), which may be associated with a decrease in the grain size and change of the growth mode from 2D to 3D. Thermal annealing at 350 degrees C in N(2) leads to a reduction of H concentrations and the intrinsic levels of bulk H are found to correlate with the structural quality and defects in the annealed films.

  • 28.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Lorenz, K
    Institute Tecnol and Nucl, Portugal .
    Xie, Mengyao
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Alves, E
    Institute Tecnol and Nucl, Portugal .
    Schaff, W J
    Cornell University.
    Yamaguchi, T
    Ritsumeikan University.
    Nanishi, Y
    Ritsumeikan University.
    Ruffenach, S
    University of Montpellier 2.
    Moret, M
    University of Montpellier 2.
    Briot, O
    University of Montpellier 2.
    Unintentional incorporation of H and related structural and free-electron properties of c- and a-plane InN2012Ingår i: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, ISSN 1862-6300, Vol. 209, nr 1, s. 91-94Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    In this work, we present a comprehensive study on the hydrogen impurity depth profiles in InN films with polar c-plane and nonpolar a-plane surface orientations in relation to their structural and free-electron properties. We find that the as-grown nonpolar films exhibit generally higher bulk and near-surface H concentrations compared to the polar InN counter-parts. The latter may be partly associated with a change in the growth mode from 2D to 3D and a decrease in the grain size. Thermal annealing leads to a reduction of H concentrations and the intrinsic H levels are influenced by the structural characteristics of the films. The factors allowing reduction of bulk H and free electron concentrations in a-plane films are discussed.

  • 29.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Einfeldt, S.
    Hommel, D
    Lourdudoss, S.
    Phonons in strained AlGaN/GaN superlattices2007Ingår i: 6th International Symposium on Blue Laser and Light Emitting Diodes,2006, Physica Status Solidi, vol C4: WILEYVCH Verlag GmbH & Co. KGaA , 2007, s. 170-Konferensbidrag (Refereegranskat)
  • 30.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Usui, A.
    On the lattice parameters of GaN2007Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 91, nr 3, s. 031911-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The lattice parameters of low-defect density, undoped bulk GaN fabricated by hydride vapor phase epitaxy (HVPE) on (0001) sapphire and subsequent substrate removal, are precisely determined using high-resolution x-ray diffraction. The obtained values, c=5.18523 Å and a=3.18926 Å, are compared with the lattice parameters of freestanding HVPE GaN from different sources and found to be representative for state-of-the-art undoped HVPE bulk GaN material. A comparison with bulk GaN fabricated by the high-pressure technique and homoepitaxial GaN is made, and significant differences in the lattice parameters are found. The observed differences are discussed and a possible explanation is suggested. © 2007 American Institute of Physics.

  • 31.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Usui, A.
    R and D Division, Furukawa Co. Ltd., Tsukuba, Ibaraki, 305-0865, Japan.
    Saenger, M.
    Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588, United States.
    Schubert, M.
    Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588, United States.
    Lattice parameters of bulk GaN fabricated by halide vapor phase epitaxy2008Ingår i: Journal of Crystal Growth, ISSN 0022-0248, E-ISSN 1873-5002, Vol. 310, nr 5, s. 959-965Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The lattice parameters of low-defect density undoped bulk GaN fabricated by halide vapor phase epitaxy (HVPE) and removal of the substrate are precisely determined using high-resolution X-ray diffraction. The obtained values, c = 5.18523 over(A, °) and a = 3.18926 over(A, °) are compared with the lattice parameters of free-standing HVPE-GaN from different sources and found to be representative for state-of-the-art undoped HVPE bulk GaN material. A comparison with bulk GaN fabricated by the high pressure technique and homoepitaxial GaN layer is made, and the observed differences are discussed in terms of their free-electron concentrations, point and structural defects. © 2007 Elsevier B.V. All rights reserved.

  • 32.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Paskov, Plamen
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Birch, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Tungasmita, Sukkaneste
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Deformation potentials of the E-1(TO) mode in AlN2002Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 80, nr 13, s. 2302-2304Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The deformation potentials of the E-1(TO) mode in AlN are experimentally determined by combining infrared reflection spectroscopy and x-ray diffraction measurements and using a reported value of the Raman-stress factor for hydrostatically stressed bulk AlN. The deformation potentials are found to strongly depend on published stiffness constants of AlN. A comparison with earlier theoretically calculated values of the deformation potentials is made. (C) 2002 American Institute of Physics.

  • 33.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Paskov, Plamen
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Valcheva, E.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Heuken, M.
    Aixtron AG, D-52072 Aachen, Germany.
    Lattice parameters of GaN layers grown on a-plane sapphire: Effect of in-plane strain anisotropy2003Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 82, nr 5, s. 703-705Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The lattice parameters of GaN layers grown on a-plane sapphire were investigated. The hydride vapor phase epitaxy and metalorganic vapor phase epitaxy were used for the determination of parameters. The strain anisotropy was found to have different values in the films and obtained values of parameters were grouped around two values.

  • 34.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Paskov, Plamen
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Valcheva, E
    Paskova, Tanja
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Monemar, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Schubert, M
    Lu, H
    Schaff, W.J.
    Deformation potentials of the E1 (TO) and E2 modes of InN2004Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 84, nr 18, s. 3636-3638Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The determination of deformation potentials of E1(TO) and E 2 modes of InN were discussed. The deformation potentials were evaluated for two sets of stiffness constants using x-ray diffraction, IR spectroscopic ellipsometry (IRSE), Raman scattering, and Grüneisen parameter values. The InN layer were grown on GaN buffer layers on (0001) sapphire by molecular beam epitaxy. It was found that the strain-free values of the InN E1(TO) mode was 477.9 cm-1 and 491.9 cm -1 for the E2 modes.

  • 35.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Paskov, Plamen
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Valcheva, E.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Schubert, M.
    Fak. F. Physik and Geowissenschaften, Universität Leipzig, 04103 Leipzig, Germany.
    Bundesmann, C.
    Fak. F. Physik and Geowissenschaften, Universität Leipzig, 04103 Leipzig, Germany.
    Lu, H.
    Department of Electrical Engineering, Cornell University, Ithaca, NY 14853, United States.
    Schaff, W.J.
    Department of Electrical Engineering, Cornell University, Ithaca, NY 14853, United States.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Infrared ellipsometry and Raman studies of hexagonal InN films: Correlation between strain and vibrational properties2004Ingår i: Superlattices and Microstructures, ISSN 0749-6036, E-ISSN 1096-3677, Vol. 36, nr 4-6, s. 573-580Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The vibrational properties of InN films with different strain have been studied using Infrared ellipsometry and Raman scattering spectroscopy. We have established a correlation between the phonon mode parameters and the strain, which allows the determination of the deformation potentials and the strain-free frequencies of the InN E1(TO) and E2 modes. The LO phonons and their coupling to the free-carrier plasmon excitations are also discussed in relation to the carrier concentration in the films. © 2004 Elsevier Ltd. All rights reserved.

  • 36.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Paskova, T.
    Institute of Solid State Physics, University of Bremen, 28359 Bremen, Germany.
    Schubert, M.
    Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588, United States.
    Paskov, Plamen
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Arwin, Hans
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tillämpad optik.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Hommel, D.
    Institute of Solid State Physics, University of Bremen, 28359 Bremen, Germany.
    Heuken, M.
    Aixtron AG, D-52072 Aachen, Germany.
    Off, J.
    Institute of Physics 4, University of Stuttgart, 70569 Stuttgart, Germany.
    Haskell, B.A.
    Materials Department, University of California, Santa Barbara, CA 93106, United States.
    Fini, P.T.
    Materials Department, University of California, Santa Barbara, CA 93106, United States.
    Speck, J.S.
    Materials Department, University of California, Santa Barbara, CA 93106, United States.
    Nakamura, S.
    Materials Department, University of California, Santa Barbara, CA 93106, United States.
    Effect of anisotropic strain on phonons in a-plane and c-plane GaN layers2007Ingår i: Journal of Crystal Growth, ISSN 0022-0248, E-ISSN 1873-5002, Vol. 300, nr 1, s. 233-238Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We have studied phonons in two types of anisotropically strained GaN films: c-plane GaN films grown on a-plane sapphire and a-plane GaN films grown on r-plane sapphire. The anisotropic strain in the films is determined by high-resolution X-ray diffraction (HRXRD) in different measuring geometries and the phonon parameters have been assessed by generalized infrared spectroscopic ellipsometry (GIRSE). The effect of strain anisotropy on GaN phonon frequencies is presented and the phonon deformation potentials aA1 (TO), bA1 (TO), cE1 (TO) and cE1 (LO) are determined. © 2006 Elsevier B.V. All rights reserved.

  • 37.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Paskov, Plamen
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Arwin, Hans
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tillämpad optik.
    Schubert, M
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Figge, S
    Hommel, D
    Haskell, BA
    Fini, PT
    Nakamura, S
    Assessment of phonon mode characteristics via infrared spectroscopic ellipsometry on a-plane GaN2006Ingår i: Physica status solidi. B, Basic research, ISSN 0370-1972, E-ISSN 1521-3951, Vol. 243, nr 7, s. 1594-1598Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Generalized infrared spectroscopic ellipsometry was applied to study the vibrational properties of anisotropically strained a-plane GaN films with different thicknesses. We have established a correlation between the phonon mode parameters and the strain, which allows the determination of the deformation potentials and strain-free frequency of the GaN A,(TO) mode. These results are compared with previous theoretical and experimental findings and discussed.

  • 38.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Paskov, Plamen
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Materiefysik.
    Ashkenov, N.
    Fak. fur Phy. and Geowissenschaften, Universität Leipzig, 04103 Leipzig, Germany.
    Schubert, M.
    Fak. fur Phy. and Geowissenschaften, Universität Leipzig, 04103 Leipzig, Germany.
    Residual strain in HVPE GaN free-standing and re-grown homoepitaxial layers2003Ingår i: Physica status solidi. A, Applied research, ISSN 0031-8965, E-ISSN 1521-396X, Vol. 195, nr 3, s. 516-522Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The lattice parameters of as-grown hydride vapor phase epitaxy GaN layers on sapphire, free-standing layers after the substrate lift-off, and homoepitaxial layers grown on the free-standing layers are measured. The in-plane and out-of-plane strains are calculated. It is found that the substrate removal leads to strain relaxation in the crack-free GaN free-standing layers to a certain extent. A small increase of the strain in the GaN homoepitaxial layers compared to the free-standing layers is observed. Cathodoluminescence (CL) spectroscopy and imaging, photoluminescence (PL) and Raman measurements are used as complementary tools in the residual strain analysis.

  • 39.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Paskova, Tanja
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Paskov, Plamen
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Ashkenov, N.
    Schubert, M.
    Structural characteristics and lattice parameters of hydride vapor phase epitaxial GaN free-standing quasisubstrates2005Ingår i: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 97, nr 1, s. 013517-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We have studied the lattice parameters of hydride vapor phase epitaxy (HVPE)-GaN quasisubstrates in relation to their structural properties. Layers grown on single-layer metalorganic vapor phase epitaxy (MOVPE) templates and on epitaxial lateral overgrown MOVPE templates are characterized by Raman scattering, high-resolution x-ray diffraction, and reciprocal space mapping. The strain relaxation in the films versus their thickness was found to proceed similarly in the GaN samples grown using the two types of templates but the strain saturates at different nonzero levels. The lattice parameters of relatively thin HVPE-GaN free-standing quasisubstrates indicate that no total strain relaxation is achieved after the sapphire removal. The lattice parameters of the thick quasisubstrates grown on different templates are not affected by the separation process and are found to have values very close to the reference strain-free lattice parameters of GaN powder. © 2005 American Institute of Physics.

  • 40.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Schubert, M.
    Optical phonons in a-plane GaN under anisotropic strain2008Ingår i: Group-III nitrides with nonpolar surfaces: growth, properties and devices / [ed] Tanya Paskova, Wiley , 2008, 1, s. 219-253Kapitel i bok, del av antologi (Övrigt vetenskapligt)
    Abstract [en]

    This is the first monograph to discuss in detail the current stage of development of nonpolar nitrides, with specific emphasis on the three main topics of crystal growth, properties and device studies. World–class researchers summarize their own recent achievements in their respective fields of expertise, covering both nonpolar and semipolar nitride materials. The bulk of the discussion in each chapter is related to the physical properties of the material obtained by the respective technique, in particular, defect density and properties of the defects in nonpolar nitrides. In addiiton, the optical and vibrational properties are also addressed in several chapters, as is progress in heterostructures, quantum wells and dots based on the AlGaN/GaN and the InGaN/GaN systems. Finally, an outlook of the application areas of the differently grown materials is presented in most chapters, together with the capabilities and limitations of the respective growth approaches used.

  • 41.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Schubert, M.
    Arwin, Hans
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tillämpad optik.
    Paskov, Plamen
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Monemar, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Hommel, D.
    Off, J.
    Scholz, F.
    Heuken, M.
    Haskell, B.A.
    Fini, P.T.
    Speck, S.J.
    Nakamura, S.
    Anisotropic strain and phonon deformation potentials in GaN2007Ingår i: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 75, nr 19, s. 195217-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We report optical phonon frequency studies in anisotropically strained c -plane- and a -plane-oriented GaN films by generalized infrared spectroscopic ellipsometry and Raman scattering spectroscopy. The anisotropic strain in the films is obtained from high-resolution x-ray diffraction measurements. Experimental evidence for splitting of the GaN E1 (TO), E1 (LO), and E2 phonons under anisotropic strain in the basal plane is presented, and their phonon deformation potentials c E1 (TO), c E1 (LO), and c E2 are determined. A distinct correlation between anisotropic strain and the A1 (TO) and E1 (LO) frequencies of a -plane GaN films reveals the a A1 (TO), b A1 (TO), a E1 (LO), and b E1 (LO) phonon deformation potentials. The a A1 (TO) and b A1 (TO) are found to be in very good agreement with previous results from Raman experiments. Our a A1 (TO) and a E1 (LO) phonon deformation potentials agree well with recently reported theoretical estimations, while b A1 (TO) and b E1 (LO) are found to be significantly larger than the theoretical values. A discussion of the observed differences is presented. © 2007 The American Physical Society.

  • 42.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Schubert, M.
    Fak. für Phys./Geowiss., Iniversität Leipzig, 04103 Leipzig, Germany.
    Birch, Jens
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik.
    Kasic, A.
    Tungasmita, Sukkaneste
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Paskova, Tanja
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Generalized infrared ellipsometry study of thin epitaxial AlN layers with complex strain behavior2003Konferensbidrag (Refereegranskat)
    Abstract [en]

    The effect of film thickness on the strain and structural properties of thin epitaxial AlN films has been investigated, and a sub-layer model of the degree of strain and related defects for all films is suggested. The vibrational properties of the films have been studied by generalized infrared spectroscopic ellipsometry. The proposed sub-layer model has been successfully applied to the analysis of the ellipsometry data trough model calculations of the infrared dielectric function. © 2003 Elsevier B.V. All rights reserved.

  • 43.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Schubert, M
    University of Nebraska.
    Hofmann, T
    University of Nebraska.
    Monemar, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Hsiao, Ching-Lien
    National Taiwan University.
    Liu, Ting-Wei
    National Taiwan University.
    Chen, Li-Chyong
    National Taiwan University.
    Schaff, W J
    Cornell University.
    Takagi, Y
    Ritsumeikan University.
    Nanishi, Y
    Ritsumeikan University.
    Electron accumulation at nonpolar and semipolar surfaces of wurtzite InN from generalized infrared ellipsometry2009Ingår i: APPLIED PHYSICS LETTERS, ISSN 0003-6951, Vol. 95, nr 20, s. 202103-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The free electron properties of nonpolar (1120)-oriented and semipolar (1011)-oriented wurtzite InN films are studied by generalized infrared ellipsometry (GIRSE). We demonstrate the sensitivity of GIRSE to the surface charge accumulation layer and find a distinct surface electron accumulation to occur at all surfaces. The obtained surface electron sheet densities are found to vary from 0.9x10(13) to 2.3x10(14) cm(-2) depending on the surface orientation and bulk electron concentration. The upper limits of the surface electron mobility parameters of 417-644 cm(2)/V s are determined and discussed in the light of electron confinement at the surface.

  • 44.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Valcheva, E.
    Paskov, Plamen
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Schubert, M.
    Paskova, Tanja
    Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Amano, H.
    Akasaki, I.
    Phonon mode behavior in strained wurtzite AlN/GaN superlattices2005Ingår i: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 71, nr 11, s. 115329-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We have studied phonons in AlN/GaN superlattices with different periods but a constant well-to-barrier ratio using a combination of infrared spectroscopic ellipsometry and Raman scattering spectroscopy. The strain evolution in the superlattice structures is assessed by high-resolution x-ray diffraction and reciprocal space mapping. We have identified E1(TO), A 1(LO) and E2 localized, and E1(LO) and A 1(TO) delocalized superlattice modes. The dependencies of their frequencies on in-plane strain are analyzed and discussed, and the strain-free frequencies of the superlattice modes are estimated. A good agreement between theory and experiment is found in the case of GaN localized modes, while large deviations between theoretically estimated and experimentally determined frequency shifts are observed for the AlN localized modes. The delocalization effect on the A1(TO) and E1(LO) phonons, as well as the free-carrier effect on the E1(LO) phonon are also discussed. ©2005 The American Physical Society.

  • 45.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Xie, Mengyao
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Franco, N
    Institute Tecnol and Nucl, Sacavem, Portugal .
    Giuliani, F
    University London Imperial College of Science Technology and Medicine.
    Nunes, B
    Institute Super Tecn, Lisbon, Portugal .
    Alves, E
    Institute Tecnol and Nucl, Sacavem, Portugal .
    Hsiao, C L
    National Taiwan University.
    Chen, L C
    National Taiwan University.
    Yamaguchi, T
    Ritsumeikan University.
    Takagi, Y
    Ritsumeikan University.
    Kawashima, K
    Ritsumeikan University.
    Nanishi, Y
    Ritsumeikan University.
    Structural anisotropy of nonpolar and semipolar InN epitaxial layers2010Ingår i: JOURNAL OF APPLIED PHYSICS, ISSN 0021-8979, Vol. 108, nr 7, s. 073529-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We present a detailed study of the structural characteristics of molecular beam epitaxy grown nonpolar InN films with a- and m-plane surface orientations on r-plane sapphire and (100) gamma-LiAlO2, respectively, and semipolar (10 (1) over bar1) InN grown on r-plane sapphire. The on-axis rocking curve (RC) widths were found to exhibit anisotropic dependence on the azimuth angle with minima at InN [0001] for the a-plane films, and maxima at InN [0001] for the m-plane and semipolar films. The different contributions to the RC broadening are analyzed and discussed. The finite size of the crystallites and extended defects are suggested to be the dominant factors determining the RC anisotropy in a-plane InN, while surface roughness and curvature could not play a major role. Furthermore, strategy to reduce the anisotropy and magnitude of the tilt and minimize defect densities in a-plane InN films is suggested. In contrast to the nonpolar films, the semipolar InN was found to contain two domains nucleating on zinc-blende InN(111) A and InN(111) B faces. These two wurtzite domains develop with different growth rates, which was suggested to be a consequence of their different polarity. Both, a- and m-plane InN films have basal stacking fault densities similar or even lower compared to nonpolar InN grown on free-standing GaN substrates, indicating good prospects of heteroepitaxy on foreign substrates for the growth of InN-based devices.

  • 46.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Xie, Mengyao
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Rogalla, D
    Ruhr-Universität Bochum, Bochum, Germany.
    Becker, H-W
    Ruhr-Universität Bochum, Bochum, Germany.
    Lorenz, K
    Instituto Tecnológico e Nuclear, Sacavém, Portugal.
    Alves, E
    Instituto Tecnológico e Nuclear, Sacavém, Portugal.
    Ruffenach, S
    Groupe d'Etude des Semiconducteurs, Université Montpellier II, Montpellier, France.
    Moret, M
    Groupe d'Etude des Semiconducteurs, Université Montpellier II, Montpellier, France.
    Briot, O
    Groupe d'Etude des Semiconducteurs, Université Montpellier II, Montpellier, France.
    Free electron properties and hydrogen in InN grown by MOVPE2011Ingår i: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, ISSN 1862-6300, Vol. 208, nr 5, s. 1179-1182Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    In this work we present a comprehensive study on the hydrogen impurities, free electron, and structural properties of MOVPE InN films with state-of-the-art quality. We find a correlation between the decrease of free electron concentration and the reduction of bulk hydrogen in the films upon thermal annealing, while no changes in the dislocation densities and strain are observed. Our results suggest that hydrogen is a major source for the unintentional n-type doping in MOVPE InN.

  • 47.
    Darakchieva, Vanya
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Xie, Mengyao
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Tasnadi, Ferenc
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Teoretisk Fysik. Linköpings universitet, Tekniska högskolan.
    Abrikosov, Igor
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Teoretisk Fysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Monemar, Bo
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Kamimura, J
    Sophia University.
    Kishino, K
    Japan Science & Technology Agency.
    Lattice parameters, deviations from Vegards rule, and E-2 phonons in InAlN2008Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 93, nr 26, s. 261908-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    The lattice parameters of InxAl1-xN in the whole compositional range are studied using first-principle calculations. Deviations from Vegards rule are obtained via the bowing parameters, delta(a)=0.0412 +/- 0.0039 A and delta(c)=-0.060 +/- 0.010 A, which largely differ from previously reported values. Implications of the observed deviations from Vegards rule on the In content extracted from x-ray diffraction are discussed. We also combine these results with x-ray diffraction and Raman scattering studies on InxAl1-xN nanocolumns with 0.627 <= x <= 1 and determine the E-2 phonon frequencies versus In composition in the scarcely studied In-rich compositional range.

  • 48.
    Furlan, Andrej
    et al.
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Gueorguiev, Gueorgui Kostov
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Czigány, Zsolt
    Research Institute for Technical Physics and Materials Science, P.O. Box 49, Budapest, H-1525, Hungary.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Braun, Slawomir
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Ytors Fysik och Kemi. Linköpings universitet, Tekniska högskolan.
    Correia, Rosario
    I3N and Physics Department, University of Aveiro, 3810-193 Aveiro, Portugal.
    Högberg, Hans
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Hultman, Lars
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
    Structure and properties of phosphorus-carbide thin solid films2013Ingår i: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 548, nr 2, s. 247-254Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Phosphorus-carbide (CPx) thin films have been deposited by unbalanced reactive magnetron sputtering and investigated by TEM, XPS, SEM, ERDA, Raman scattering spectroscopy, nanoindentation testing, and four-point electrical probe techniques. As-deposited films with x=0.1 are electron amorphous with elements of FL structure and high mechanical resiliency with hardness of 34.4 GPa and elastic recovery of 72%. The electrical resistivity of the films are in the range 0.4-1.7 Ωcm for CP0.027, 1.4-22.9 Ωcm for CP0.1, and lower than the minimal value the four-point probe is able to detect for CPx with x≥0.2.

  • 49.
    Gonschorek, M.
    et al.
    Institute of Quantum Electronics and Photonics, Ecole Polytechnique F´d´rale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
    Carlin, J.-F.
    Institute of Quantum Electronics and Photonics, Ecole Polytechnique F´d´rale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
    Feltin, E.
    Institute of Quantum Electronics and Photonics, Ecole Polytechnique F´d´rale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
    Py, M.A.
    Institute of Quantum Electronics and Photonics, Ecole Polytechnique F´d´rale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
    Grandjean, N.
    Institute of Quantum Electronics and Photonics, Ecole Polytechnique F´d´rale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
    Darakchieva, Vanya
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Monemar, Bo
    Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
    Lorenz, M.
    Institut für Experimentelle Physik II, Fakultät für Physik und Geowissenschaften, Universität Leipzig, Linnstraße 3-5, 04103 Leipzig, Germany.
    Ramm, G.
    Institut für Experimentelle Physik II, Fakultät für Physik und Geowissenschaften, Universität Leipzig, Linnstraße 3-5, 04103 Leipzig, Germany.
    Two-dimensional electron gas density in Al1-x InMx N/AlN/GaN heterostructures (0.03=x=0.23)2008Ingår i: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 103, nr 9, s. 093714-Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    Compared to the AlGaN alloy, which can only be grown under tensile strain on GaN, the AlInN alloy is predicted by Vegard's law to be lattice-matched (LM) on fully relaxed GaN templates for an indium content of ~17.5%, i.e., it can be grown either tensely or compressively on GaN. The effect of strain on the polarization induced sheet charge density at the Al1-x Inx N/AlN/GaN heterointerfaces is carefully investigated for 6 and 14 nm thick AlInN barriers including a 1 nm thick AlN interlayer. The barrier indium content ranges at 0.03=x=0.23 for 6 nm thick barriers and 0.07=x=0.21 for 14 nm thick barriers. It is found that the two-dimensional electron gas (2DEG) density varies between (3.5±0.1) × 1013 cm-2 and (2.2±0.1) × 1013 cm-2 for 14 nm thick barriers. Finally, a 2DEG density up to (1.7±0.1) × 1013 cm-2 is obtained for a nearly LM AlInN barrier with ~14.5% indium on GaN as thin as 6 nm. © 2008 American Institute of Physics.

  • 50.
    Hofmann, T.
    et al.
    Institut fur Experimentelle Physik II, Universität Leipzig, Leipzig, Germany.
    Chavdarov, T.
    Institut fur Experimentelle Physik II, Universität Leipzig, Leipzig, Germany.
    Darakchieva, Vanya
    Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
    Lu, H.
    Department of Electrical and Computer Engineering, Cornell University, USA.
    Schaff, W.J.
    Department of Electrical and Computer Engineering, Cornell University, USA.
    Schubert, M.
    Department of Electrical Engineering and Center for Materials Research and Analysis (CMRA), University of Nebraska-Lincoln, Lincoln, USA.
    Anisotropy of the Γ-point effective mass and mobility in hexagonal InN2006Ingår i: Physica Status Solidi. C, Current topics in solid state physics, ISSN 1610-1634, E-ISSN 1610-1642, Vol. 3, nr 6, s. 1854-1857Artikel i tidskrift (Refereegranskat)
    Abstract [en]

    We determine the anisotropic electron effective mass and mobility parameters in wurtzite InN thin films with free electron concentration Nfrom 1.8 × 1017 cm–3 to 9.5 × 1018 cm–3 using Infrared Magneto-optic Generalized Ellipsometry. The room-temperature measurements were carried out with magnetic fields up to 4.5 T. For the Γ-point we estimate m* = 0.047m0 and m* = 0.039m0 for polarization perpendicular and parallel to the c -axis, respectively. Scattering by impurities or ionized donors may explain the decrease of mobility for polarization parallel to the c -axis from 1600 cm2/(Vs) to 800 cm2/(Vs) with increase in N , where the perpendicular mobility is further decreased, likely caused by additional grain boundary scattering.

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