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  • 1.
    Heiler, Jonah
    et al.
    Univ Stuttgart, Germany; Luxembourg Inst Sci & Technol LIST, Luxembourg; Univ Luxembourg, Luxembourg.
    Korber, Jonathan
    Univ Stuttgart, Germany.
    Hesselmeier, Erik
    Univ Stuttgart, Germany.
    Kuna, Pierre
    Univ Stuttgart, Germany.
    Stohr, Rainer
    Univ Stuttgart, Germany.
    Fuchs, Philipp
    Univ Saarland, Germany.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Knolle, Wolfgang
    Leibniz Inst Surface Engn IOM, Germany.
    Becher, Christoph
    Univ Saarland, Germany.
    Kaiser, Florian
    Univ Stuttgart, Germany; Luxembourg Inst Sci & Technol LIST, Luxembourg; Univ Luxembourg, Luxembourg.
    Wrachtrup, Jorg
    Univ Stuttgart, Germany; Max Planck Inst Solid State Res, Germany.
    Correction: Spectral stability of V2 centres in sub-micron 4H-SiC membranes (vol 9, 34, 2024)2024In: NPJ QUANTUM MATERIALS, ISSN 2397-4648, Vol. 9, no 1, article id 39Article in journal (Other academic)
  • 2.
    Bathen, Marianne Etzelmueller
    et al.
    Swiss Fed Inst Technol, Switzerland; Univ Oslo, Norway.
    Kumar, Piyush
    Swiss Fed Inst Technol, Switzerland.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Belanche, Manuel
    Swiss Fed Inst Technol, Switzerland.
    Vines, Lasse
    Univ Oslo, Norway.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Grossner, Ulrike
    Swiss Fed Inst Technol, Switzerland.
    Dual configuration of shallow acceptor levels in 4H-SiC2024In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 177, article id 108360Article in journal (Refereed)
    Abstract [en]

    Acceptor dopants in 4H-SiC exhibit energy levels that are located deeper in the band gap than the thermal energy at room temperature (RT), resulting in incomplete ionization at RT. Therefore, a comprehensive understanding of the defect energetics and how the impurities are introduced into the material is imperative. Herein, we study impurity related defect levels in 4H-SiC epitaxial layers (epi-layers) grown by chemical vapor deposition (CVD) under various conditions using minority carrier transient spectroscopy (MCTS). We find two trap levels assigned to boron impurities, B and D, which are introduced to varying degrees depending on the growth conditions. A second acceptor level that was labeled X in the literature and attributed to impurity related defects is also observed. Importantly, both the B and X levels exhibit fine structure revealed by MCTS measurements. We attribute the fine structure to acceptor impurities at hexagonal and pseudo -cubic lattice sites in 4H-SiC, and tentatively assign the X peak to Al based on experimental findings and density functional theory calculations.

  • 3.
    Mock, Alyssa
    et al.
    Weber State Univ, UT 84408 USA.
    Richter, Steffen
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Lund Univ, Sweden.
    Papamichail, Alexis
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Stanishev, Vallery
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Popp, Andreas
    Leibniz Inst Kristallzuchtung, Germany.
    Bin Anooz, Saud
    Leibniz Inst Kristallzuchtung, Germany.
    Gogova-Petrova, Daniela
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ranga, Praneeth
    Univ Utah, UT 84112 USA.
    Krishnamoorthy, Sriram
    Univ Utah, UT 84112 USA; Univ Nebraska Lincoln, NE 68588 USA.
    Korlacki, Rafal
    Univ Nebraska, NE 68588 USA.
    Schubert, Mathias
    Lund Univ, Sweden; Univ Nebraska, NE 68588 USA.
    Darakchieva, Vanya
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Lund Univ, Sweden.
    Effective uniaxial dielectric function tensor and optical phonons in (¯2⁢01)-oriented 𝛽-Ga2⁢O3 films with equally distributed sixfold-rotation domains2024In: Physical Review Applied, E-ISSN 2331-7019, Vol. 22, no 4, article id 044003Article in journal (Refereed)
    Abstract [en]

    Monoclinic ,B-Ga2O3 films grown on c-plane sapphire have been shown to exhibit six (2<overline>01)-oriented domains, which are equally spaced by rotation around the surface normal and equally sized by volume that render the film optical response effectively uniaxial. We derive and discuss an optical model suitable for ellipsometry data analysis of such films. We model mid- and far-infrared ellipsometry data from undoped and electrically insulating films with an effective uniaxial dielectric tensor based on projections of all phonon modes within the rotation domains parallel and perpendicular to the sample normal, i.e., to the reciprocal lattice vector g2<overline>01. Two effective response functions are described by the model, and found sufficient to calculate ellipsometry data that best match measured ellipsometry data from a representative film. We propose to render either effective dielectric functions, or inverse effective dielectric functions, each separately for electric field directions parallel and perpendicular to g2<overline>01, by sums of Lorentz oscillators, which permit determination of either sets of transverse optical phonon-mode parameters, or sets of longitudinal optical phonon-mode parameters, respectively. Transverse optical modes common to both dielectric functions can be traced back to single-crystal modes with Bu character, while modes with Au character appear only within the dielectric function for polarization perpendicular to the sample surface. The thereby obtained parameter sets reveal all phonon modes anticipated from averaging over the sixfoldrotation domains of single crystal ,B-Ga2O3, but with slightly shifted transverse optical, and completely different longitudinal optical phonon modes. Structural analysis of the film revealed virtually strain-free material. We suggest small crystal grains and high density of grain boundaries as a possible origin for the observed transverse optical phonon-frequency shifts with respect to bulk material. The differences in longitudinal optical modes here compared to the bulk are hypothesized to be caused by averaging of the electric-field-induced polarization over many long-range ordered rotation domains. Our model can be useful for future analysis of free charge-carrier properties using infrared ellipsometry on multiple domain

  • 4.
    Koerber, Jonathan
    et al.
    Univ Stuttgart, Germany.
    Heiler, Jonah
    Univ Stuttgart, Germany; Luxembourg Inst Sci & Technol LIST, Luxembourg; Univ Luxembourg, Luxembourg.
    Fuchs, Philipp
    Univ Saarland, Germany.
    Flad, Philipp
    Univ Stuttgart, Germany.
    Hesselmeier, Erik
    Univ Stuttgart, Germany.
    Kuna, Pierre
    Univ Stuttgart, Germany.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Knolle, Wolfgang
    Leibniz Inst Surface Engn IOM, Germany.
    Becher, Christoph
    Univ Saarland, Germany.
    Kaiser, Florian
    Univ Stuttgart, Germany; Luxembourg Inst Sci & Technol LIST, Luxembourg; Univ Luxembourg, Luxembourg.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; Max Planck Inst Solid State Res, Germany.
    Fluorescence Enhancement of Single V2 Centers in a 4H-SiC Cavity Antenna2024In: Nano Letters, ISSN 1530-6984, E-ISSN 1530-6992, Vol. 24, no 30, p. 9289-9295Article in journal (Refereed)
    Abstract [en]

    Solid state quantum emitters are a prime candidate in distributed quantum technologies since they inherently provide a spin-photon interface. An ongoing challenge in the field, however, is the low photon extraction due to the high refractive index of typical host materials. This challenge can be overcome using photonic structures. Here, we report the integration of V2 centers in a cavity-based optical antenna. The structure consists of a silver-coated, 135 nm-thin 4H-SiC membrane functioning as a planar cavity with a broadband resonance yielding a theoretical photon collection enhancement factor of similar to 34. The planar geometry allows us to identify over 20 single V2 centers at room temperature with a mean (maximum) count rate enhancement factor of 9 (15). Moreover, we observe 10 V2 centers with a mean absorption line width below 80 MHz at cryogenic temperatures. These results demonstrate a photon collection enhancement that is robust to the lateral emitter position.

  • 5.
    Hesselmeier, Erik
    et al.
    Univ Stuttgart, Germany.
    Kuna, Pierre
    Univ Stuttgart, Germany.
    Knolle, Wolfgang
    Leibniz Inst Surface Engn IOM, Germany.
    Kaiser, Florian
    Luxembourg Inst Sci & Technol LIST, Luxembourg; Univ Luxembourg, Luxembourg.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Vorobyov, Vadim
    Univ Stuttgart, Germany.
    Wrachtrup, Jorg
    Univ Stuttgart, Germany; Max Planck Inst Solid State Phys, Germany.
    High-Fidelity Optical Readout of a Nuclear-Spin Qubit in Silicon Carbide2024In: Physical Review Letters, ISSN 0031-9007, E-ISSN 1079-7114, Vol. 132, no 18, article id 180804Article in journal (Refereed)
    Abstract [en]

    Quantum state readout is a key requirement for a successful qubit platform. In this work, we demonstrate a high-fidelity quantum state readout of a V2 center nuclear spin based on a repetitive readout technique. We demonstrate up to 99.5% readout fidelity and 99% for state preparation. Using this efficient readout, we initialize the nuclear spin by measurement and demonstrate its Rabi and Ramsey nutation. Finally, we use the nuclear spin as a long-lived memory for quantum sensing application of a weakly coupled diatomic nuclear-spin bath.

  • 6.
    Ghezellou, Misagh
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Influence of Different Hydrocarbons on Chemical Vapor Deposition Growth and Surface Morphological Defects in 4H‐SiC Epitaxial Layers2024In: Physica status solidi. B, Basic research, ISSN 0370-1972, E-ISSN 1521-3951Article in journal (Refereed)
    Abstract [en]

    Controlled epitaxial growth of 4H-SiC is essential for advancing both power electronics and quantum technologies. This study explores how different carbon sources—methane and propane—affect the surface morphology of these epitaxial layers. By varying C/Si ratios and using the two mentioned hydrocarbons as the carbon source in chloride-based epitaxial growth of 4H-SiC layers, it is unveiled that methane results in an exceptionally smooth surface. However, it pronounces surface irregularities such as short step bunching and dislocation-related etch pits. Moreover, methane amplifies the overgrowth of triangular defects with the 4H polytype. In contrast, the introduction of propane causes a step-bunched surface together with inclined line-like surface morphological defects. Notably, a majority of the triangular defects exhibit a pure 3C character without an overgrown 4H polytype. It is shown that these outcomes could be attributed to different sticking coefficients and diffusivity of the molecular species resulting from different carbon sources on the 4H-SiC surface during the epitaxial growth. This research also uncovers the underlying origins and mechanisms responsible for various surface morphological defects.

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  • 7.
    Krumrein, Marcel
    et al.
    Univ Stuttgart, Germany.
    Nold, Raphael
    Univ Stuttgart, Germany.
    Davidson-Marquis, Flavie
    Luxembourg Inst Sci & Technol, Luxembourg; Univ Luxembourg, Luxembourg.
    Bouamra, Arthur
    Univ Stuttgart, Germany.
    Niechziol, Lukas
    Univ Stuttgart, Germany.
    Steidl, Timo
    Univ Stuttgart, Germany.
    Peng, Ruoming
    Univ Stuttgart, Germany.
    Koerber, Jonathan
    Univ Stuttgart, Germany.
    Stoehr, Rainer
    Univ Stuttgart, Germany.
    Gross, Nils
    Max Planck Inst Solid State Res, Germany.
    Smet, Jurgen H.
    Max Planck Inst Solid State Res, Germany.
    ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Udvarhelyi, Peter
    Wigner Res Ctr Phys, Hungary; Budapest Univ Technol & Econ, Hungary; MTA WFK Lendulet Momentum Semicond Nanostruct Res, Hungary.
    Gali, Adam
    Wigner Res Ctr Phys, Hungary; Budapest Univ Technol & Econ, Hungary; MTA WFK Lendulet Momentum Semicond Nanostruct Res, Hungary.
    Kaiser, Florian
    Univ Stuttgart, Germany; Luxembourg Inst Sci & Technol, Luxembourg; Univ Luxembourg, Luxembourg.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; Max Planck Inst Solid State Res, Germany.
    Precise Characterization of a Waveguide Fiber Interface in Silicon Carbide2024In: ACS Photonics, E-ISSN 2330-4022, Vol. 11, no 6, p. 2160-2170Article in journal (Refereed)
    Abstract [en]

    Spin-active optical emitters in silicon carbide are excellent candidates toward the development of scalable quantum technologies. However, efficient photon collection is challenged by undirected emission patterns from optical dipoles, as well as low total internal reflection angles due to the high refractive index of silicon carbide. Based on recent advances with emitters in silicon carbide waveguides, we now demonstrate a comprehensive study of nanophotonic waveguide-to-fiber interfaces in silicon carbide. We find that across a large range of fabrication parameters, our experimental collection efficiencies remain above 90%. Further, by integrating silicon vacancy color centers into these waveguides, we demonstrate an overall photon count rate of 181 kilo-counts per second, which is an order of magnitude higher compared to standard setups. We also quantify the shift of the ground state spin states due to strain fields, which can be introduced by waveguide fabrication techniques. Finally, we show coherent electron spin manipulation with waveguide-integrated emitters with state-of-the-art coherence times of T-2 similar to 42 mu s. The robustness of our methods is very promising for quantum networks based on multiple orchestrated emitters.

  • 8.
    Hesselmeier, Erik
    et al.
    3rd Institute of Physics, IQST, and Research Centre SCoPE, University of Stuttgart, Stuttgart, Germany.
    Kuna, Pierre
    3rd Institute of Physics, IQST, and Research Centre SCoPE, University of Stuttgart, Stuttgart, Germany.
    Takács, István
    Eötvös Loránd University, Egyetem tér 1-3, Budapest, H-1053, Hungary; Eötvös Loránd University, Egyetem tér 1-3, Budapest, H-1053, Hungary.
    Ivády, Viktor
    Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics. Linköping University, Faculty of Science & Engineering. Eötvös Loránd University, Egyetem tér 1-3, Budapest, H-1053, Hungary; Eötvös Loránd University, Egyetem tér 1-3, Budapest, H-1053, Hungary.
    Knolle, Wolfgang
    Department of Sensoric Surfaces and Functional Interfaces, Leibniz-Institute of Surface Engineering (IOM), Permoserstraße 15, Leipzig, 04318, Germany.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Dasari, Durga
    3rd Institute of Physics, IQST, and Research Centre SCoPE, University of Stuttgart, Stuttgart, Germany.
    Kaiser, Florian
    Materials Research and Technology (MRT) Department, Luxembourg Institute of Science and Technology (LIST), Belvaux, 4422, Luxembourg; University of Luxembourg, 41 rue du Brill, Belvaux, L-4422, Luxembourg.
    Vorobyov, Vadim
    3rd Institute of Physics, IQST, and Research Centre SCoPE, University of Stuttgart, Stuttgart, Germany.
    Wrachtrup, Jörg
    3rd Institute of Physics, IQST, and Research Centre SCoPE, University of Stuttgart, Stuttgart, Germany; Max Planck Institute for solid state physics, Heisenbergstraße 1, Stuttgart, 70569, Germany.
    Qudit-Based Spectroscopy for Measurement and Control of Nuclear-Spin Qubits in Silicon Carbide2024In: Physical Review Letters, ISSN 0031-9007, E-ISSN 1079-7114, Vol. 132, no 9, article id 090601Article in journal (Refereed)
    Abstract [en]

    Nuclear spins with hyperfine coupling to single electron spins are highly valuable quantum bits. Here we probe and characterize the particularly rich nuclear-spin environment around single silicon vacancy color centers (V2) in 4H-SiC. By using the electron spin-3/2 qudit as a four level sensor, we identify several sets of Si29 and C13 nuclear spins through their hyperfine interaction. We extract the major components of their hyperfine coupling via optical detected nuclear magnetic resonance, and assign them to shells in the crystal via the density function theory simulations. We utilize the ground-state level anticrossing of the electron spin for dynamic nuclear polarization and achieve a nuclear-spin polarization of up to 98±6%. We show that this scheme can be used to detect the nuclear magnetic resonance signal of individual spins and demonstrate their coherent control. Our work provides a detailed set of parameters and first steps for future use of SiC as a multiqubit memory and quantum computing platform.

  • 9.
    Heiler, Jonah
    et al.
    Univ Stuttgart, Germany; Luxembourg Inst Sci & Technol LIST, Luxembourg; Univ Luxembourg, Luxembourg.
    Koerber, Jonathan
    Univ Stuttgart, Germany.
    Hesselmeier, Erik
    Univ Stuttgart, Germany.
    Kuna, Pierre
    Univ Stuttgart, Germany.
    Stoehr, Rainer
    Univ Stuttgart, Germany.
    Fuchs, Philipp
    Univ Saarland, Germany.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Knolle, Wolfgang
    Leibniz Inst Surface Engn IOM, Germany.
    Becher, Christoph
    Univ Saarland, Germany.
    Kaiser, Florian
    Univ Stuttgart, Germany; Luxembourg Inst Sci & Technol LIST, Luxembourg; Univ Luxembourg, Luxembourg.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; Max Planck Inst Solid State Res, Germany.
    Spectral stability of V2 centres in sub-micron 4H-SiC membranes2024In: NPJ QUANTUM MATERIALS, ISSN 2397-4648, Vol. 9, no 1, article id 34Article in journal (Refereed)
    Abstract [en]

    Colour centres in silicon carbide emerge as a promising semiconductor quantum technology platform with excellent spin-optical coherences. However, recent efforts towards maximising the photonic efficiency via integration into nanophotonic structures proved to be challenging due to reduced spectral stabilities. Here, we provide a large-scale systematic investigation on silicon vacancy centres in thin silicon carbide membranes with thicknesses down to 0.25 mu m. Our membrane fabrication process involves a combination of chemical mechanical polishing, reactive ion etching, and subsequent annealing. This leads to highly reproducible membranes with roughness values of 3-4 A, as well as negligible surface fluorescence. We find that silicon vacancy centres show close-to lifetime limited optical linewidths with almost no signs of spectral wandering down to membrane thicknesses of similar to 0.7 mu m. For silicon vacancy centres in thinner membranes down to 0.25 mu m, we observe spectral wandering, however, optical linewidths remain below 200 MHz, which is compatible with spin-selective excitation schemes. Our work clearly shows that silicon vacancy centres can be integrated into sub-micron silicon carbide membranes, which opens the avenue towards obtaining the necessary improvements in photon extraction efficiency based on nanophotonic structuring.

  • 10.
    Liu, Di
    et al.
    Univ Stuttgart, Germany.
    Kaiser, Florian
    Luxembourg Inst Sci & Technol LIST, Luxembourg.
    Bushmakin, Vladislav
    Univ Stuttgart, Germany.
    Hesselmeier, Erik
    Univ Stuttgart, Germany.
    Steidl, Timo
    Univ Stuttgart, Germany.
    Ohshima, Takeshi
    Natl Inst Quantum Sci & Technol QST, Japan; Tohoku Univ, Japan.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Soykal, Oney O.
    Booz Allen Hamilton Inc, VA 22102 USA; Photonic Inc, Canada.
    Wrachtrup, Jorg
    Univ Stuttgart, Germany.
    The silicon vacancy centers in SiC: determination of intrinsic spin dynamics for integrated quantum photonics2024In: NPJ QUANTUM INFORMATION, ISSN 2056-6387, Vol. 10, no 1, article id 72Article in journal (Refereed)
    Abstract [en]

    The negatively charged silicon vacancy center (VSi-\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$${{\rm{V}}}_{{\rm{Si}}}<^>{-}$$\end{document}) in silicon carbide (SiC) is an emerging color center for quantum technology covering quantum sensing, communication, and computing. Yet, limited information currently available on the internal spin-optical dynamics of these color centers prevents us from achieving the optimal operation conditions and reaching the maximum performance especially when integrated within quantum photonics. Here, we establish all the relevant intrinsic spin dynamics of the VSi-\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$${{\rm{V}}}_{{\rm{Si}}}<^>{-}$$\end{document} center at cubic lattice site (V2) in 4H-SiC by an in-depth electronic fine structure modeling including the intersystem-crossing and deshelving mechanisms. With carefully designed spin-dependent measurements, we obtain all the previously unknown spin-selective radiative and non-radiative decay rates. To showcase the relevance of our work for integrated quantum photonics, we use the obtained rates to propose a realistic implementation of time-bin entangled multi-photon GHZ and cluster state generation. We find that up to three-photon GHZ or cluster states are readily within reach using the existing nanophotonic cavity technology.

  • 11.
    Astner, Thomas
    et al.
    Inst Quantum Opt & Quantum Informat IQOQI Vienna, Austria; Univ Wien, Austria.
    Koller, Philipp
    Inst Quantum Opt & Quantum Informat IQOQI Vienna, Austria; Univ Wien, Austria; Univ Vienna, Austria; Univ Vienna, Austria.
    Gilardoni, Carmem M.
    Univ Groningen, Netherlands.
    Hendriks, Joop
    Univ Groningen, Netherlands.
    Son, Nguyen Tien
    Univ Groningen, Netherlands.
    Ivanov, Ivan Gueorguiev
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    van der Wal, Caspar H.
    Univ Groningen, Netherlands.
    Trupke, Michael
    Inst Quantum Opt & Quantum Informat IQOQI Vienna, Austria; Univ Wien, Austria.
    Vanadium in silicon carbide: telecom-ready spin centres with long relaxation lifetimes and hyperfine-resolved optical transitions2024In: QUANTUM SCIENCE AND TECHNOLOGY, ISSN 2058-9565, Vol. 9, no 3, article id 035038Article in journal (Refereed)
    Abstract [en]

    Vanadium in silicon carbide (SiC) is emerging as an important candidate system for quantum technology due to its optical transitions in the telecom wavelength range. However, several key characteristics of this defect family including their spin relaxation lifetime (T1), charge state dynamics, and level structure are not fully understood. In this work, we determine the T1 of an ensemble of vanadium defects, demonstrating that it can be greatly enhanced at low temperature. We observe a large spin contrast exceeding 90% and long spin-relaxation times of up to 25 s at 100 mK, and of order 1 s at 1.3 K. These measurements are complemented by a characterization of the ensemble charge state dynamics. The stable electron spin furthermore enables high-resolution characterization of the systems' hyperfine level structure via two-photon magneto-spectroscopy. The acquired insights point towards high-performance spin-photon interfaces based on vanadium in SiC.

  • 12.
    Singh, Harpreet
    et al.
    Tech Univ Dortmund, Germany; Univ Calif Berkeley, CA 94720 USA.
    Hollberg, Mario Alex
    Tech Univ Dortmund, Germany.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Kaiser, Florian
    Univ Stuttgart, Germany; Univ Stuttgart, Germany; Luxembourg Inst Sci & Technol LIST, Luxembourg.
    Suter, Dieter
    Tech Univ Dortmund, Germany.
    Characterization of single shallow silicon-vacancy centers in 4H-SiC2023In: Physical Review B, ISSN 2469-9950, E-ISSN 2469-9969, Vol. 107, no 13, article id 134117Article in journal (Refereed)
    Abstract [en]

    Shallow negatively charged silicon-vacancy centers have applications in magnetic quantum sensing and other quantum applications. Vacancy centers near the surface (within 100 nm) have different spin relaxation rates and optical spin polarization, affecting the optically detected magnetic resonance (ODMR) signal. This makes it essential to characterize these centers. Here we present the relevant spin properties of such centers. ODMR with a contrast of up to 6%, which is better than the state of the art, allowed us to determine the zero-field splitting, which is relevant for most sensing applications. We also present intensity-correlation data to verify that the signal originates from a single center and to extract transition rates between different electronic states.

  • 13.
    Vidarsson, Arnar M.
    et al.
    Univ Iceland, Iceland.
    Persson, Axel R.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Chen, Jr-Tai
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. SweGaN, Olaus Magnusvag 48A, SE-58330 Linkoping, Sweden.
    Haasmann, Daniel
    Griffith Univ, Australia.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Dimitrijev, Sima
    Griffith Univ, Australia; Griffith Univ, Australia.
    Rorsman, Niklas
    Chalmers Univ Technol, Sweden.
    Darakchieva, Vanya
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Lund Univ, Sweden.
    Sveinbjörnsson, Einar
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Univ Iceland, Iceland.
    Observations of very fast electron traps at SiC/high-κ dielectric interfaces2023In: APL Materials, E-ISSN 2166-532X, Vol. 11, no 11, article id 111121Article in journal (Refereed)
    Abstract [en]

    Very fast interface traps have recently been suggested to be the main cause behind poor channel-carrier mobility in SiC metal-oxide-semiconductor field effect transistors. It has been hypothesized that the NI traps are defects located inside the SiO2 dielectric with energy levels close to the SiC conduction band edge and the observed conductance spectroscopy signal is a result of electron tunneling to and from these defects. Using aluminum nitride and aluminum oxide as gate dielectrics instead of SiO2, we detect NI traps at these SiC/dielectric interfaces as well. A detailed investigation of the NI trap density and behavior as a function of temperature is presented and discussed. Advanced scanning transmission electron microscopy in combination with electron energy loss spectroscopy reveals no SiO2 at the interfaces. This strongly suggests that the NI traps are related to the surface region of the SiC rather than being a property of the gate dielectric.

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  • 14.
    Ghezellou, Misagh
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Kumar, Piyush
    Advanced Power Semiconductor Laboratory, ETH Zürich, 8092 Zürich, Switzerland.
    Bathen, Marianne E.
    Advanced Power Semiconductor Laboratory, ETH Zürich, 8092 Zürich, Switzerland.
    Karsthof, Robert
    Department of Physics, University of Oslo, 0316 Oslo, Norway.
    Sveinbjörnsson, Einar
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Science Institute, University of Iceland, IS-107 Reykjavík, Iceland.
    Grossner, Ulrike
    Advanced Power Semiconductor Laboratory, ETH Zürich, 8092 Zürich, Switzerland.
    Bergman, Peder
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Vines, Lasse
    Department of Physics, University of Oslo, 0316 Oslo, Norway.
    ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    The role of boron related defects in limiting charge carrier lifetime in 4H–SiC epitaxial layers2023In: APL Materials, E-ISSN 2166-532X, Vol. 11, no 3, article id 031107Article in journal (Refereed)
    Abstract [en]

    One of the main challenges in realizing 4H–SiC (silicon carbide)-based bipolar devices is the improvement of minority carrier lifetime in as-grown epitaxial layers. Although Z1/2 has been identified as the dominant carrier lifetime limiting defect, we report on B-related centers being another dominant source of recombination and acting as lifetime limiting defects in 4H–SiC epitaxial layers. Combining time-resolved photoluminescence (TRPL) measurement in near band edge emission and 530 nm, deep level transient spectroscopy, and minority carrier transient spectroscopy (MCTS), it was found that B related deep levels in the lower half of the bandgap are responsible for killing the minority carriers in n-type, 4H–SiC epitaxial layers when the concentration of Z1/2 is already low. The impact of these centers on the charge carrier dynamics is investigated by correlating the MCTS results with temperature-dependent TRPL decay measurements. It is shown that the influence of shallow B acceptors on the minority carrier lifetime becomes neutralized at temperatures above ∼422 K. Instead, the deep B related acceptor level, known as the D-center, remains active until temperatures above ∼570 K. Moreover, a correlation between the deep level concentrations, minority carrier lifetimes, and growth parameters indicates that intentional nitrogen doping hinders the formation of deep B acceptor levels. Furthermore, tuning growth parameters, including growth temperature and C/Si ratio, is shown to be crucial for improving the minority carrier lifetime in as-grown 4H–SiC epitaxial layers.

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  • 15.
    Lukin, Daniil M.
    et al.
    E. L. Ginzton Laboratory, Stanford University, Stanford, California, USA.
    Guidry, Melissa A.
    E. L. Ginzton Laboratory, Stanford University, Stanford, California, USA.
    Yang, Joshua
    E. L. Ginzton Laboratory, Stanford University, Stanford, California, USA.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Deb Mishra, Sattwik
    E. L. Ginzton Laboratory, Stanford University, Stanford, California, USA.
    Abe, Hiroshi
    National Institutes for Quantum Science and Technology, Takasaki, Gunma, Japan.
    Ohshima, Takeshi
    National Institutes for Quantum Science and Technology, Takasaki, Gunma, Japan.
    ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Vučković, Jelena
    E. L. Ginzton Laboratory, Stanford University, Stanford, California, USA.
    Two-Emitter Multimode Cavity Quantum Electrodynamics in Thin-Film Silicon Carbide Photonics2023In: Physical Review X, E-ISSN 2160-3308, Vol. 13, no 1, article id 011005Article in journal (Refereed)
    Abstract [en]

    Color centers are point defects in crystals that can provide an optical interface to a long-lived spin state for distributed quantum information processing applications. An outstanding challenge for color center quantum technologies is the integration of optically coherent emitters into scalable thin-film photonics, a prerequisite for large-scale photonics integration of color centers within a commercial foundry process. Here, we report on the integration of near-transform-limited silicon vacancy (VSi) defects into microdisk resonators fabricated in a CMOS-compatible 4H-silicon carbide-on-insulator platform. We demonstrate a single-emitter cooperativity of up to 0.8 as well as optical superradiance from a pair of color centers coupled to the same cavity mode. We investigate the effect of multimode interference on the photon scattering dynamics from this multiemitter cavity quantum electrodynamics system. These results are crucial for the development of quantum networks in silicon carbide and bridge the classical-quantum photonics gap by uniting optically coherent spin defects with wafer-scalable, state-of-the-art photonics.

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  • 16.
    Cilibrizzi, Pasquale
    et al.
    Heriot Watt Univ, Scotland.
    Arshad, Muhammad Junaid
    Heriot Watt Univ, Scotland.
    Tissot, Benedikt
    Univ Konstanz, Germany.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ivanov, Ivan Gueorguiev
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Astner, Thomas
    Austrian Acad Sci, Austria.
    Koller, Philipp
    Austrian Acad Sci, Austria.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    White, Daniel
    Heriot Watt Univ, Scotland.
    Bekker, Christiaan
    Heriot Watt Univ, Scotland.
    Burkard, Guido
    Univ Konstanz, Germany.
    Trupke, Michael
    Austrian Acad Sci, Austria.
    Bonato, Cristian
    Heriot Watt Univ, Scotland.
    Ultra-narrow inhomogeneous spectral distribution of telecom-wavelength vanadium centres in isotopically-enriched silicon carbide2023In: Nature Communications, E-ISSN 2041-1723, Vol. 14, no 1, article id 8448Article in journal (Refereed)
    Abstract [en]

    Spin-active quantum emitters have emerged as a leading platform for quantum technologies. However, one of their major limitations is the large spread in optical emission frequencies, which typically extends over tens of GHz. Here, we investigate single V4+ vanadium centres in 4H-SiC, which feature telecom-wavelength emission and a coherent S = 1/2 spin state. We perform spectroscopy on single emitters and report the observation of spin-dependent optical transitions, a key requirement for spin-photon interfaces. By engineering the isotopic composition of the SiC matrix, we reduce the inhomogeneous spectral distribution of different emitters down to 100 MHz, significantly smaller than any other single quantum emitter. Additionally, we tailor the dopant concentration to stabilise the telecom-wavelength V4+ charge state, thereby extending its lifetime by at least two orders of magnitude. These results bolster the prospects for single V emitters in SiC as material nodes in scalable telecom quantum networks. Several solid-state defect platforms have been proposed for application as a spin-photon interface in quantum communication networks. Here the authors report spin-selective optical transitions and narrow inhomogeneous spectral distribution of V centers in isotopically-enriched SiC emitting in the telecom O-band.

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  • 17.
    Bosma, Tom
    et al.
    Univ Groningen, Netherlands.
    Hendriks, Joop
    Univ Groningen, Netherlands.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    van der Wal, Caspar H.
    Univ Groningen, Netherlands.
    Broadband single-mode planar waveguides in monolithic 4H-SiC2022In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 131, no 2, article id 025703Article in journal (Refereed)
    Abstract [en]

    Color-center defects in silicon carbide promise opto-electronic quantum applications in several fields, such as computing, sensing, and communication. In order to scale down and combine these functionalities with the existing silicon device platforms, it is crucial to consider SiC integrated optics. In recent years, many examples of SiC photonic platforms have been shown, like photonic crystal cavities, film-on-insulator waveguides, and micro-ring resonators. However, all these examples rely on separating thin films of SiC from substrate wafers. This introduces significant surface roughness, strain, and defects in the material, which greatly affects the homogeneity of the optical properties of color centers. Here, we present and test a method for fabricating monolithic single-crystal integrated-photonic devices in SiC: tuning optical properties via charge carrier concentration. We fabricated monolithic SiC n-i-n and p-i-n junctions where the intrinsic layer acts as waveguide core, and demonstrate the waveguide functionality for these samples. The propagation losses are below 14 dB/cm. These waveguide types allow for addressing color centers over a broad wavelength range with low strain-induced inhomogeneity of the optical-transition frequencies. Furthermore, we expect that our findings open the road to fabricating waveguides and devices based on p-i-n junctions, which will allow for integrated electrostatic and radio frequency control together with high-intensity optical control of defects in silicon carbide.

  • 18.
    Gogova, Daniela
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Tran, Dat Q.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Richter, Steffen
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Solid State Physics and NanoLund, Lund University, P. O. Box 118, 221 00 Lund, Sweden.
    Papamichail, Alexis
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Persson, Axel R.
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Persson, Per
    Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
    Kordina, Olof
    Linköping University, Department of Physics, Chemistry and Biology. Linköping University, Faculty of Science & Engineering.
    Monemar, Bo
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Hilfiker, Matthew
    Department of Electrical and Computer Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, USA.
    Schubert, Mathias
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Department of Electrical and Computer Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, USA.
    Paskov, Plamen P.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Darakchieva, Vanya
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Solid State Physics and NanoLund, Lund University, P. O. Box 118, 221 00 Lund, Sweden.
    Epitaxial growth of β-Ga2O3 by hot-wall MOCVD2022In: AIP Advances, E-ISSN 2158-3226, Vol. 12, no 5, article id 055022Article in journal (Refereed)
    Abstract [en]

    The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and high performance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth of beta-Ga2O3. Epitaxial beta-Ga2O3 layers at high growth rates (above 1 mu m/h), at low reagent flows, and at reduced growth temperatures (740 degrees C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. The hot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial beta-Ga2O3 layers are demonstrated with a 201 rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown (201) beta-Ga2O3 substrates, indicative of similar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be further explored for the fabrication of beta-Ga2O3.

  • 19.
    Babin, Charles
    et al.
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Stoehr, Rainer
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Morioka, Naoya
    Univ Stuttgart, Germany; Univ Stuttgart, Germany; Kyoto Univ, Japan.
    Linkewitz, Tobias
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Steidl, Timo
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Woernle, Raphael
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Liu, Di
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Hesselmeier, Erik
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Vorobyov, Vadim
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Denisenko, Andrej
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Hentschel, Mario
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Gobert, Christian
    Fraunhofer Inst Integrated Syst & Device Technol, Germany.
    Berwian, Patrick
    Fraunhofer Inst Integrated Syst & Device Technol, Germany.
    Astakhov, Georgy V
    Helmholtz Zentrum Dresden Rossendorf, Germany.
    Knolle, Wolfgang
    Leibniz Inst Surface Engn IOM, Germany.
    Majety, Sridhar
    Univ Calif Davis, CA 95616 USA.
    Saha, Pranta
    Univ Calif Davis, CA 95616 USA.
    Radulaski, Marina
    Univ Calif Davis, CA 95616 USA.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Kaiser, Florian
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Fabrication and nanophotonic waveguide integration of silicon carbide colour centres with preserved spin-optical coherence2022In: Nature Materials, ISSN 1476-1122, E-ISSN 1476-4660, Vol. 21, p. 67-73Article in journal (Refereed)
    Abstract [en]

    Colour centres are a promising quantum information platform, but coherence degradation after integration in nanostructures has hindered scalability. Here, the authors show that waveguide-integrated V-Si centres in SiC maintain spin-optical coherences, enabling nuclear high-fidelity spin qubit operations. Optically addressable spin defects in silicon carbide (SiC) are an emerging platform for quantum information processing compatible with nanofabrication processes and device control used by the semiconductor industry. System scalability towards large-scale quantum networks demands integration into nanophotonic structures with efficient spin-photon interfaces. However, degradation of the spin-optical coherence after integration in nanophotonic structures has hindered the potential of most colour centre platforms. Here, we demonstrate the implantation of silicon vacancy centres (V-Si) in SiC without deterioration of their intrinsic spin-optical properties. In particular, we show nearly lifetime-limited photon emission and high spin-coherence times for single defects implanted in bulk as well as in nanophotonic waveguides created by reactive ion etching. Furthermore, we take advantage of the high spin-optical coherences of V-Si centres in waveguides to demonstrate controlled operations on nearby nuclear spin qubits, which is a crucial step towards fault-tolerant quantum information distribution based on cavity quantum electrodynamics.

  • 20.
    Anderson, Christopher P.
    et al.
    Univ Chicago, IL 60637 USA; Univ Chicago, IL 60637 USA.
    Glen, Elena O.
    Univ Chicago, IL 60637 USA.
    Zeledon, Cyrus
    Univ Chicago, IL 60637 USA.
    Bourassa, Alexandre
    Univ Chicago, IL 60637 USA.
    Jin, Yu
    Univ Chicago, IL 60637 USA.
    Zhu, Yizhi
    Univ Chicago, IL 60637 USA.
    Vorwerk, Christian
    Univ Chicago, IL 60637 USA.
    Crook, Alexander L.
    Univ Chicago, IL 60637 USA; Univ Chicago, IL 60637 USA.
    Abe, Hiroshi
    Natl Inst Quantum Sci & Technol, Japan.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ohshima, Takeshi
    Natl Inst Quantum Sci & Technol, Japan.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Galli, Giulia
    Univ Chicago, IL 60637 USA; Univ Chicago, IL 60637 USA; Argonne Natl Lab, IL 60439 USA.
    Awschalom, David D.
    Univ Chicago, IL 60637 USA; Univ Chicago, IL 60637 USA; Argonne Natl Lab, IL 60439 USA.
    Five-second coherence of a single spin with single-shot readout in silicon carbide2022In: Science Advances, E-ISSN 2375-2548, Vol. 8, no 5, article id eabm5912Article in journal (Refereed)
    Abstract [en]

    An outstanding hurdle for defect spin qubits in silicon carbide (SiC) is single-shot readout, a deterministic measurement of the quantum state. Here, we demonstrate single-shot readout of single defects in SiC via spin-to-charge conversion, whereby the defects spin state is mapped onto a long-lived charge state. With this technique, we achieve over 80% readout fidelity without pre- or postselection, resulting in a high signal-to-noise ratio that enables us to measure long spin coherence times. Combined with pulsed dynamical decoupling sequences in an isotopically purified host material, we report single-spin T-2 > 5 seconds, over two orders of magnitude greater than previously reported in this system. The mapping of these coherent spin states onto single charges unlocks both single-shot readout for scalable quantum nodes and opportunities for electrical readout via integration with semiconductor devices.

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  • 21.
    Morioka, Naoya
    et al.
    Kyoto Univ, Japan.
    Liu, Di
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Soykal, Oney O.
    Booz Allen Hamilton, VA 22102 USA.
    Gediz, Izel
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Babin, Charles
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Stoehr, Rainer
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Ohshima, Takeshi
    Natl Inst Quantum Sci & Technol, Japan.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Kaiser, Florian
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Spin-Optical Dynamics and Quantum Efficiency of a Single V1 Center in Silicon Carbide2022In: Physical Review Applied, E-ISSN 2331-7019, Vol. 17, no 5, article id 054005Article in journal (Refereed)
    Abstract [en]

    Color centers in silicon carbide are emerging candidates for distributed spin-based quantum applications due to the scalability of host materials and the demonstration of integration into nanophotonic resonators. Recently, silicon vacancy centers in silicon carbide have been identified as a promising system with excellent spin and optical properties. Here, we fully study the spin-optical dynamics of the single silicon vacancy center at hexagonal lattice sites, namely V1, in 4H-polytype silicon carbide. By utilizing resonant and above-resonant sublifetime pulsed excitation, we determine spin-dependent excited-state lifetimes and intersystem-crossing rates. Our approach to inferring the intersystem-crossing rates is based on all-optical pulsed initialization and readout scheme, and is applicable to spin-active color centers with similar dynamics models. In addition, the optical transition dipole strength and the quantum efficiency of V1 defect are evaluated based on coherent optical Rabi measurement and local-field calibration employing electric field simulation. The measured rates well explain the results of spin-state polarization dynamics, and we further discuss the altered photoemission dynamics in resonant enhancement structures such as radiative lifetime shortening and Purcell enhancement. By providing a thorough description of the V1 center???s spin-optical dynamics, our work provides deep understanding of the system, which guides implementations of scalable quantum applications based on silicon vacancy centers in silicon carbide.

  • 22.
    Karhu, Robin
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    The Origin and Formation Mechanism of an Inclined Line-like Defect in 4H-SiC Epilayers2022In: Physica status solidi. B, Basic research, ISSN 0370-1972, E-ISSN 1521-3951, Vol. 259, no 4, article id 2100512Article in journal (Refereed)
    Abstract [en]

    The origin and the formation mechanism of a surface morphological defect in 4H-SiC epilayers are reported. The defect appears on the surface of an epilayer as an inclined line-like feature at an angle of +/- 80 degrees to the step-flow direction [ 11 2 over bar 0 ] . The defect is confirmed to originate from a threading screw dislocation intersecting the surface and its orientation is controlled by the sign of the Burgers vector of the dislocation. The defect forms through the interaction of local spiral growth associated with threading screw dislocations and step-flow growth related to the substrate offcut. The defect mainly appears in the epilayers grown through chloride-based chemistry, where in situ surface preparation of the substrate is performed in H-2 + HCl at a relatively high temperature.

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  • 23.
    Nagy, Roland
    et al.
    Friedrich Alexander Univ Erlangen Nurnberg FAU, Germany; Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Dasari, Durga Bhaktavatsala Rao
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Babin, Charles
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Liu, Di
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Vorobyov, Vadim
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Niethammer, Matthias
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Widmann, Matthias
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Linkewitz, Tobias
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Gediz, Izel
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Stoehr, Rainer
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Weber, Heiko B.
    Friedrich Alexander Univ Erlangen Nurnberg FAU, Germany.
    Ohshima, Takeshi
    Natl Inst Quantum & Radiol Sci & Technol, Japan.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Kaiser, Florian
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Wrachtrup, Jorg
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Narrow inhomogeneous distribution of spin-active emitters in silicon carbide2021In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 118, no 14, article id 144003Article in journal (Refereed)
    Abstract [en]

    Optically active solid-state spin registers have demonstrated their unique potential in quantum computing, communication, and sensing. Realizing scalability and increasing application complexity require entangling multiple individual systems, e.g., via photon interference in an optical network. However, most solid-state emitters show relatively broad spectral distributions, which hinders optical interference experiments. Here, we demonstrate that silicon vacancy centers in semiconductor silicon carbide (SiC) provide a remarkably small natural distribution of their optical absorption/emission lines despite an elevated defect concentration of approximate to 0.43 mu m - 3. In particular, without any external tuning mechanism, we show that only 13 defects have to be investigated until at least two optical lines overlap within the lifetime-limited linewidth. Moreover, we identify emitters with overlapping emission profiles within diffraction-limited excitation spots, for which we introduce simplified schemes for the generation of computationally relevant Greenberger-Horne-Zeilinger and cluster states. Our results underline the potential of the CMOS-compatible SiC platform toward realizing networked quantum technology applications.

  • 24.
    Nguyen, Son Tien
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Anderson, Christopher P.
    Univ Chicago, IL 60637 USA.
    Bourassa, Alexandre
    Univ Chicago, IL 60637 USA.
    Miao, Kevin C.
    Univ Chicago, IL 60637 USA.
    Babin, Charles
    Univ Stuttgart, Germany; IQST, Germany.
    Widmann, Matthias
    Univ Stuttgart, Germany; IQST, Germany.
    Niethammer, Matthias
    Univ Stuttgart, Germany; IQST, Germany.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Morioka, Naoya
    Univ Stuttgart, Germany; IQST, Germany.
    Ivanov, Ivan Gueorguiev
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Kaiser, Florian
    Univ Stuttgart, Germany; IQST, Germany.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; IQST, Germany; Max Planck Inst Solid State Res, Germany.
    Awschalom, David D.
    Univ Chicago, IL 60637 USA; Argonne Natl Lab, IL 60439 USA; Argonne Natl Lab, IL 60439 USA.
    Developing silicon carbide for quantum spintronics2020In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 116, no 19, article id 190501Article in journal (Refereed)
    Abstract [en]

    In current long-distance communications, classical information carried by large numbers of particles is intrinsically robust to some transmission losses but can, therefore, be eavesdropped without notice. On the other hand, quantum communications can provide provable privacy and could make use of entanglement swapping via quantum repeaters to mitigate transmission losses. To this end, considerable effort has been spent over the last few decades toward developing quantum repeaters that combine long-lived quantum memories with a source of indistinguishable single photons. Multiple candidate optical spin qubits in the solid state, including quantum dots, rare-earth ions, and color centers in diamond and silicon carbide (SiC), have been developed. In this perspective, we give a brief overview on recent advances in developing optically active spin qubits in SiC and discuss challenges in applications for quantum repeaters and possible solutions. In view of the development of different material platforms, the perspective of SiC spin qubits in scalable quantum networks is discussed.

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  • 25.
    Bourassa, Alexandre
    et al.
    Univ Chicago, IL 60637 USA.
    Anderson, Christopher P.
    Univ Chicago, IL 60637 USA.
    Miao, Kevin C.
    Univ Chicago, IL 60637 USA.
    Onizhuk, Mykyta
    Univ Chicago, IL 60637 USA.
    Ma, He
    Univ Chicago, IL 60637 USA.
    Crook, Alexander L.
    Univ Chicago, IL 60637 USA.
    Abe, Hiroshi
    Natl Inst Quantum & Radiol Sci & Technol, Japan.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ohshima, Takeshi
    Natl Inst Quantum & Radiol Sci & Technol, Japan.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Galli, Giulia
    Univ Chicago, IL 60637 USA; Argonne Natl Lab, IL 60439 USA; Argonne Natl Lab, IL 60439 USA.
    Awschalom, David D.
    Univ Chicago, IL 60637 USA; Argonne Natl Lab, IL 60439 USA; Argonne Natl Lab, IL 60439 USA.
    Entanglement and control of single nuclear spins in isotopically engineered silicon carbide2020In: Nature Materials, ISSN 1476-1122, E-ISSN 1476-4660, Vol. 19, no 12, p. 1319-1325Article in journal (Refereed)
    Abstract [en]

    Isotope engineering of silicon carbide leads to control of nuclear spins associated with single divacancy centres and extended electron spin coherence. Nuclear spins in the solid state are both a cause of decoherence and a valuable resource for spin qubits. In this work, we demonstrate control of isolated(29)Si nuclear spins in silicon carbide (SiC) to create an entangled state between an optically active divacancy spin and a strongly coupled nuclear register. We then show how isotopic engineering of SiC unlocks control of single weakly coupled nuclear spins and present an ab initio method to predict the optimal isotopic fraction that maximizes the number of usable nuclear memories. We bolster these results by reporting high-fidelity electron spin control (F = 99.984(1)%), alongside extended coherence times (Hahn-echoT(2) = 2.3 ms, dynamical decouplingT(2)(DD) > 14.5 ms), and a >40-fold increase in Ramsey spin dephasing time (T-2*) from isotopic purification. Overall, this work underlines the importance of controlling the nuclear environment in solid-state systems and links single photon emitters with nuclear registers in an industrially scalable material.

  • 26.
    Etzelmueller Bathen, Marianne
    et al.
    Univ Oslo, Norway.
    Linnarsson, Margareta
    KTH Royal Inst Technol, Sweden.
    Ghezellou, Misagh
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Vines, Lasse
    Univ Oslo, Norway.
    Influence of Carbon Cap on Self-Diffusion in Silicon Carbide2020In: Crystals, ISSN 2073-4352, Vol. 10, no 9, article id 752Article in journal (Refereed)
    Abstract [en]

    Self-diffusion of carbon (C-12 and C-13) and silicon (Si-28 and Si-30) in 4H silicon carbide has been investigated by utilizing a structure containing an isotope purified 4H-(SiC)-Si-28-C-12 epitaxial layer grown on an n-type (0001) 4H-SiC substrate, and finally covered by a carbon capping layer (C-cap). The C-13 and Si-30 isotope profiles were monitored using secondary ion mass spectrometry (SIMS) following successive heat treatments performed at 2300-2450 degrees C in Ar atmosphere using an inductively heated furnace. The 30Si profiles show little redistribution within the studied temperature range, with the extracted diffusion lengths for Si being within the error bar for surface roughening during annealing, as determined by profilometer measurements. On the other hand, a significant diffusion of C-13 was observed into the isotope purified layer from both the substrate and the C-cap. A diffusivity of D=8.3x106e(-10.4/kBT) cm(2)/s for C-13 was extracted, in contrast to previous findings that yielded lower both pre-factors and activation energies for C self-diffusion in SiC. The discrepancy between the present measurements and previous theoretical and experimental works is ascribed to the presence of the C-cap, which is responsible for continuous injection of C interstitials during annealing, and thereby suppressing the vacancy mediated diffusion.

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  • 27.
    Tia, Kai
    et al.
    Xi An Jiao Tong Univ, Peoples R China.
    Xia, Jinghua
    Global Energy Interconnect Res Inst Co Ltd, Peoples R China.
    Elgammal, Karim
    KTH Sch EECS, Sweden.
    Schoner, Adolf
    Ascatron AB, Sweden.
    Kaplan, Wlodek
    Ascatron AB, Sweden.
    Karhu, Robin
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Hallen, Anders
    KTH Sch EECS, Sweden.
    Modelling the static on-state current voltage characteristics for a 10 kV 4H-SiC PiN diode2020In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 115, article id 105097Article in journal (Refereed)
    Abstract [en]

    A 10 kV 4H-SiC epitaxial PiN diode is fabricated and the measured static on-state current voltage characteristics are used to tune the physical models and parameters included in TCAD device simulations. From the measurements it is found that the on-state voltage drop decreases more than 0.5 V at a current density of 100 A/cm(2), as the temperature is raised from room temperature to 300 degrees C. The steep slope of the IV-curve is, furthermore, maintained at elevated temperatures in contrast to most silicon PiN structures, where the decrease in mobility at higher temperatures typically decreases the IV slope, resulting in an increased voltage drop. Physical device simulations, involving common models for bandgap, incomplete ionization, charge carrier lifetime and mobility, are systematically compared and optimized to obtain the best fit with measured data. The negative temperature dependence can be simulated with good precision although the fitting is very sensitive to the choice of mobility models and, in particular, the acceptor ionization energy.

  • 28.
    Lukin, Daniil M.
    et al.
    Stanford Univ, CA 94305 USA.
    White, Alexander D.
    Stanford Univ, CA 94305 USA.
    Trivedi, Rahul
    Stanford Univ, CA 94305 USA.
    Guidry, Melissa A.
    Stanford Univ, CA 94305 USA.
    Morioka, Naoya
    Univ Stuttgart, Germany; Inst Quantum Sci & Technol IQST, Germany.
    Babin, Charles
    Univ Stuttgart, Germany; Inst Quantum Sci & Technol IQST, Germany.
    Soykal, Oney O.
    Booz Allen Hamilton, VA 22102 USA.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ohshima, Takeshi
    Natl Inst Quantum & Radiol Sci & Technol, Japan.
    Vasireddy, Praful K.
    Stanford Univ, CA 94025 USA.
    Nasr, Mamdouh H.
    Stanford Univ, CA 94025 USA.
    Sun, Shuo
    Stanford Univ, CA 94305 USA.
    MacLean, Jean-Philippe W.
    Stanford Univ, CA 94305 USA.
    Dory, Constantin
    Stanford Univ, CA 94305 USA.
    Nanni, Emilio A.
    Stanford Univ, CA 94025 USA.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; Inst Quantum Sci & Technol IQST, Germany.
    Kaiser, Florian
    Univ Stuttgart, Germany; Inst Quantum Sci & Technol IQST, Germany.
    Vuckovic, Jelena
    Stanford Univ, CA 94305 USA.
    Spectrally reconfigurable quantum emitters enabled by optimized fast modulation2020In: NPJ QUANTUM INFORMATION, ISSN 2056-6387, Vol. 6, no 1, article id 80Article in journal (Refereed)
    Abstract [en]

    The ability to shape photon emission facilitates strong photon-mediated interactions between disparate physical systems, thereby enabling applications in quantum information processing, simulation and communication. Spectral control in solid state platforms such as color centers, rare earth ions, and quantum dots is particularly attractive for realizing such applications on-chip. Here we propose the use of frequency-modulated optical transitions for spectral engineering of single photon emission. Using a scattering-matrix formalism, we find that a two-level system, when modulated faster than its optical lifetime, can be treated as a single-photon source with a widely reconfigurable photon spectrum that is amenable to standard numerical optimization techniques. To enable the experimental demonstration of this spectral control scheme, we investigate the Stark tuning properties of the silicon vacancy in silicon carbide, a color center with promise for optical quantum information processing technologies. We find that the silicon vacancy possesses excellent spectral stability and tuning characteristics, allowing us to probe its fast modulation regime, observe the theoretically-predicted two-photon correlations, and demonstrate spectral engineering. Our results suggest that frequency modulation is a powerful technique for the generation of new light states with unprecedented control over the spectral and temporal properties of single photons.

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  • 29.
    Morioka, Naoya
    et al.
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany; DENSO CORP, Japan.
    Babin, Charles
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Nagy, Roland
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Gediz, Izel
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Hesselmeier, Erik
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Liu, Di
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Joliffe, Matthew
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Niethammer, Matthias
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Dasari, Durga
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Vorobyov, Vadim
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Kolesov, Roman
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Stoehr, Rainer
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ohshima, Takeshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Udvarhelyi, Peter
    Eotvos Lorand Univ, Hungary; Wigner Res Ctr Phys, Hungary; Budapest Univ Technol and Econ, Hungary.
    Thiering, Gergo
    Wigner Res Ctr Phys, Hungary.
    Gali, Adam
    Wigner Res Ctr Phys, Hungary; Budapest Univ Technol and Econ, Hungary.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Kaiser, Florian
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Spin-controlled generation of indistinguishable and distinguishable photons from silicon vacancy centres in silicon carbide2020In: Nature Communications, E-ISSN 2041-1723, Vol. 11, no 1Article in journal (Refereed)
    Abstract [en]

    Quantum systems combining indistinguishable photon generation and spin-based quantum information processing are essential for remote quantum applications and networking. However, identification of suitable systems in scalable platforms remains a challenge. Here, we investigate the silicon vacancy centre in silicon carbide and demonstrate controlled emission of indistinguishable and distinguishable photons via coherent spin manipulation. Using strong off-resonant excitation and collecting zero-phonon line photons, we show a two-photon interference contrast close to 90% in Hong-Ou-Mandel type experiments. Further, we exploit the systems intimate spin-photon relation to spin-control the colour and indistinguishability of consecutively emitted photons. Our results provide a deep insight into the systems spin-phonon-photon physics and underline the potential of the industrially compatible silicon carbide platform for measurement-based entanglement distribution and photonic cluster state generation. Additional coupling to quantum registers based on individual nuclear spins would further allow for high-level network-relevant quantum information processing, such as error correction and entanglement purification. Defects in silicon carbide can act as single photon sources that also have the benefit of a host material that is already used in electronic devices. Here the authors demonstrate that they can control the distinguishability of the emitted photons by changing the defect spin state.

  • 30.
    White, Alexander D.
    et al.
    Stanford Univ, CA 94305 USA.
    Lukin, Daniil M.
    Stanford Univ, CA 94305 USA.
    Guidry, Melissa A.
    Stanford Univ, CA 94305 USA.
    Trivedi, Rahul
    Stanford Univ, CA 94305 USA.
    Morioka, Naoya
    Univ Stuttgart, Germany; Inst Quantum Sci & Technol IQST, Germany.
    Babin, Charles
    Univ Stuttgart, Germany; Inst Quantum Sci & Technol IQST, Germany.
    Kaiser, Florian
    Univ Stuttgart, Germany; Inst Quantum Sci & Technol IQST, Germany.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ohshima, Takeshi
    Natl Inst Quantum & Radiol Sci & Technol, Japan.
    Vasireddy, Praful
    SLAC Natl Accelerator Lab, CA 94025 USA.
    Nasr, Mamdouh
    SLAC Natl Accelerator Lab, CA 94025 USA.
    Nanni, Emilio
    SLAC Natl Accelerator Lab, CA 94025 USA.
    Wrachtrup, Jorg
    Univ Stuttgart, Germany; Inst Quantum Sci & Technol IQST, Germany.
    Vuckovic, Jelena
    Stanford Univ, CA 94305 USA.
    Static and Dynamic Stark Tuning of the Silicon Vacancy in Silicon Carbide2020In: 2020 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO), IEEE , 2020Conference paper (Refereed)
    Abstract [en]

    We present the DC Stark tuning of single Silicon Vacancies in SiC. We demonstrate static tuning across 200 GHz, exceeding the inhomogenous broadening, and dynamic tuning on timescales shorter than the optical decay rate. (C) 2020 The Author(s)

  • 31.
    Udvarhelyi, Peter
    et al.
    Eotvos Lorand Univ, Hungary; Wigner Res Ctr Phys, Hungary; Budapest Univ Technol and Econ, Hungary.
    Thiering, Gergo
    Wigner Res Ctr Phys, Hungary.
    Morioka, Naoya
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Babin, Charles
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Kaiser, Florian
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Lukin, Daniil
    Stanford Univ, CA 94305 USA.
    Ohshima, Takeshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Vuckovic, Jelena
    Stanford Univ, CA 94305 USA.
    Wrachtrup, Jorg
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol IQST, Germany.
    Gali, Adam
    Wigner Res Ctr Phys, Hungary; Budapest Univ Technol and Econ, Hungary.
    Vibronic States and Their Effect on the Temperature and Strain Dependence of Silicon-Vacancy Qubits in 4H-SiC2020In: Physical Review Applied, E-ISSN 2331-7019, Vol. 13, no 5, article id 054017Article in journal (Refereed)
    Abstract [en]

    Silicon-vacancy qubits in silicon carbide (SiC) are emerging tools in quantum-technology applications due to their excellent optical and spin properties. In this paper, we explore the effect of temperature and strain on these properties by focusing on the two silicon-vacancy qubits, V1 and V2, in 4H-SiC. We apply density-functional theory beyond the Born-Oppenheimer approximation to describe the temperature-dependent mixing of electronic excited states assisted by phonons. We obtain a polaronic gap of around 5 and 22 meV for the V1 and V2 centers, respectively, which results in a significant difference in the temperature-dependent dephasing and zero-field splitting of the excited states, which explains recent experimental findings. We also compute how crystal deformations affect the zero-phonon line of these emitters. Our predictions are important ingredients in any quantum applications of these qubits sensitive to these effects.

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  • 32.
    Bathen, M. E.
    et al.
    Univ Oslo, Norway.
    Coutinho, J.
    Univ Aveiro, Portugal.
    Ayedh, H. M.
    Univ Oslo, Norway.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Farkas, Ildiko
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Oberg, S.
    Lulea Univ Technol, Sweden.
    Frodason, Y. K.
    Univ Oslo, Norway.
    Svensson, B. G.
    Univ Oslo, Norway.
    Vines, L.
    Univ Oslo, Norway.
    Anisotropic and plane-selective migration of the carbon vacancy in SiC: Theory and experiment2019In: Physical Review B, ISSN 2469-9950, E-ISSN 2469-9969, Vol. 100, no 1, article id 014103Article in journal (Refereed)
    Abstract [en]

    We investigate the migration mechanism of the carbon vacancy (V-C) in silicon carbide (SiC) using a combination of theoretical and experimental methodologies. The V-C, commonly present even in state-of-the-art epitaxial SiC material, is known to be a carrier lifetime killer and therefore strongly detrimental to device performance. The desire for V-C removal has prompted extensive investigations involving its stability and reactivity. Despite suggestions from theory that V(C )migrates exclusively on the C sublattice via vacancy-atom exchange, experimental support for such a picture is still unavailable. Moreover, the existence of two inequivalent locations for the vacancy in 4H-SiC [hexagonal, V-C(h), and pseudocubic, V-C(k)] and their consequences for V-C migration have not been considered so far. The first part of the paper presents a theoretical study of V(C )migration in 3C- and 4H-SiC. We employ a combination of nudged elastic band (NEB) and dimer methods to identify the migration mechanisms, transition state geometries, and respective energy barriers for V(C )migration. In 3C-SiC, V-C is found to migrate with an activation energy of E-A = 4.0 eV. In 4H-SiC, on the other hand, we anticipate that V-C migration is both anisotropic and basal-plane selective. The consequence of these effects is a slower diffusivity along the axial direction, with a predicted activation energy of E-A = 4.2 eV, and a striking preference for basal migration within the h plane with a barrier of E-A = 3.7 eV, to the detriment of the k-basal plane. Both effects are rationalized in terms of coordination and bond angle changes near the transition state. In the second part, we provide experimental data that corroborates the above theoretical picture. Anisotropic migration of V-C in 4H-SiC is demonstrated by deep level transient spectroscopy (DLTS) depth profiling of the Z(1/2) electron trap in annealed samples that were subject to ion implantation. Activation energies of E-A = (4.4 +/- 0.3) eV and E-A = (3.6 +/- 0.3) eV were found for V-C migration along the c and a directions, respectively, in excellent agreement with the analogous theoretical values. The corresponding prefactors of D-0 = 0.54 cm(2)/s and 0.017 cm(2)/s are in line with a simple jump process, as expected for a primary vacancy point defect.

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  • 33.
    Niethammer, Matthias
    et al.
    Univ Stuttgart, Germany.
    Widmann, Matthias
    Univ Stuttgart, Germany.
    Rendler, Torsten
    Univ Stuttgart, Germany.
    Morioka, Naoya
    Univ Stuttgart, Germany.
    Chen, Yu-Chen
    Univ Stuttgart, Germany.
    Stoehr, Rainer
    Univ Stuttgart, Germany.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Onoda, Shinobu
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Ohshima, Takeshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Lee, Sang-Yun
    Korea Inst Sci and Technol, South Korea.
    Mukherjee, Amlan
    Univ Stuttgart, Germany; Univ Stuttgart, Germany.
    Isoya, Junichi
    Univ Tsukuba, Japan.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; Univ Stuttgart, Germany; Max Planck Inst Solid State Res, Germany.
    Coherent electrical readout of defect spins in silicon carbide by photo-ionization at ambient conditions2019In: Nature Communications, E-ISSN 2041-1723, Vol. 10, article id 5569Article in journal (Refereed)
    Abstract [en]

    Quantum technology relies on proper hardware, enabling coherent quantum state control as well as efficient quantum state readout. In this regard, wide-bandgap semiconductors are an emerging material platform with scalable wafer fabrication methods, hosting several promising spin-active point defects. Conventional readout protocols for defect spins rely on fluorescence detection and are limited by a low photon collection efficiency. Here, we demonstrate a photo-electrical detection technique for electron spins of silicon vacancy ensembles in the 4H polytype of silicon carbide (SiC). Further, we show coherent spin state control, proving that this electrical readout technique enables detection of coherent spin motion. Our readout works at ambient conditions, while other electrical readout approaches are often limited to low temperatures or high magnetic fields. Considering the excellent maturity of SiC electronics with the outstanding coherence properties of SiC defects, the approach presented here holds promises for scalability of future SiC quantum devices.

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  • 34.
    Karhu, Robin
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Sveinbjörnsson, Einar
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Univ Iceland, Iceland.
    Magnusson, Bjorn
    Norstel AB, Sweden.
    Ivanov, Ivan Gueorguiev
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Danielsson, Örjan
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    CVD growth and properties of on-axis vanadium doped semi-insulating 4H-SiC epilayers2019In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 125, no 4, article id 045702Article in journal (Refereed)
    Abstract [en]

    Highly resistive homoepitaxial layers of 4H-SiC have been grown on the Si-face of nominally on-axis, n-type substrates using chemical vapor deposition. Vanadium tetrachloride has been used as the V-dopant which is responsible for the high resistivity of the epilayers. 100% 4H-polytype was reproduced in the epilayers using the optimized on-axis growth process. The upper limit of vanadium tetrachloride flow rate was also established to achieve high resistivity epilayers free of 3C polytype inclusion. A resistivity of more than 1 x 10(5) Omega cm has been achieved in epilayers with a very low concentration of V (1 x 10(15) cm(-3)). Owing to the low concentration of V, superior epilayer structural quality was achieved compared to V-doped and standard high purity semi-insulating bulk grown material of similar resistivity. Epitaxial layers with varying vanadium tetrachloride flow have also been grown to study the influence of V concentration on the polytype stability, structural quality, and optical and electrical properties of epilayers. A clear correspondence has been observed in the flow-rates of vanadium tetrachloride, the atomic concentration of V, and electrical, optical, and structural properties of epilayers. Published under license by AIP Publishing.

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  • 35.
    Anderson, Christopher P.
    et al.
    Univ Chicago, IL 60637 USA.
    Bourassa, Alexandre
    Univ Chicago, IL 60637 USA.
    Miao, Kevin C.
    Univ Chicago, IL 60637 USA.
    Wolfowicz, Gary
    Univ Chicago, IL 60637 USA.
    Mintun, Peter J.
    Univ Chicago, IL 60637 USA.
    Crook, Alexander L.
    Univ Chicago, IL 60637 USA; Univ Chicago, IL 60637 USA.
    Abe, Hiroshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ohshima, Takeshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Awschalom, David D.
    Univ Chicago, IL 60637 USA; Univ Chicago, IL 60637 USA; Argonne Natl Lab, IL 60439 USA; Argonne Natl Lab, IL 60439 USA.
    Electrical and optical control of single spins integrated in scalable semiconductor devices2019In: Science, ISSN 0036-8075, E-ISSN 1095-9203, Vol. 366, no 6470, p. 1225-+Article in journal (Refereed)
    Abstract [en]

    Spin defects in silicon carbide have the advantage of exceptional electron spin coherence combined with a near-infrared spin-photon interface, all in a material amenable to modern semiconductor fabrication. Leveraging these advantages, we integrated highly coherent single neutral divacancy spins in commercially available p-i-n structures and fabricated diodes to modulate the local electrical environment of the defects. These devices enable deterministic charge-state control and broad Stark-shift tuning exceeding 850 gigahertz. We show that charge depletion results in a narrowing of the optical linewidths by more than 50-fold, approaching the lifetime limit. These results demonstrate a method for mitigating the ubiquitous problem of spectral diffusion in solid-state emitters by engineering the electrical environment while using classical semiconductor devices to control scalable, spin-based quantum systems.

  • 36.
    Khosa, R. Y.
    et al.
    Univ Iceland, Iceland; Univ Educ Lahore, Pakistan.
    Chen, Jr-Tai
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Winters, M.
    Chalmers Univ Technol, Sweden.
    Palsson, K.
    Univ Iceland, Iceland.
    Karhu, Robin
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Rorsman, N.
    Chalmers Univ Technol, Sweden.
    Sveinbjörnsson, Einar
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Univ Iceland, Iceland.
    Electrical characterization of high k-dielectrics for 4H-SiC MIS devices2019In: Materials Science in Semiconductor Processing, ISSN 1369-8001, E-ISSN 1873-4081, Vol. 98, p. 55-58Article in journal (Refereed)
    Abstract [en]

    We report promising results regarding the possible use of AlN or Al2O3 as a gate dielectric in 4H-SiC MISFETs. The crystalline AlN films are grown by hot wall metal organic chemical vapor deposition (MOCVD) at 1100 degrees C. The amorphous Al2O3 films are grown by repeated deposition and subsequent low temperature (200 degrees C) oxidation of thin Al layers using a hot plate. Our investigation shows a very low density of interface traps at the AlN/4H-SiC and the Al2O3/4H-SiC interface estimated from capacitance-voltage (CV) analysis of MIS capacitors. Current-voltage (IV) analysis shows that the breakdown electric field across the AlN or Al2O3 is similar to 3 MV/cm or similar to 5 MV/cm respectively. By depositing an additional SiO2 layer by plasma enhanced chemical vapor deposition at 300 degrees C on top of the AlN or Al2O3 layers, it is possible to increase the breakdown voltage of the MIS capacitors significantly without having pronounced impact on the quality of the AlN/SiC or Al2O3/SiC interfaces.

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  • 37.
    Khosa, Rabia Y.
    et al.
    Science Institute, University of Iceland, Iceland.
    Chen, J. T.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials.
    Pálsson, K.
    Science Institute, University of Iceland, Iceland.
    Karhu, Robin
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials.
    Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials.
    Rorsman, Niklas
    Department of Microtechnology and Nanoscience, Chalmers University of Technology, Sweden.
    Sveinbjörnsson, Einar Ö.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Science Institute, University of Iceland, Iceland.
    Electrical Characterization of MOCVD Grown Single Crystalline AlN Thin Films on 4H-SiC2019In: Silicon Carbide and Related Materials 2018, Trans Tech Publications Ltd , 2019, Vol. 963, p. 460-464Conference paper (Refereed)
    Abstract [en]

    We report on a very low density of interface traps at the AlN/4H-SiC interface estimated from capacitance-voltage (CV) analysis of metal-insulator-semiconductor (MIS) capacitors. Single crystalline aluminum nitride (AlN) films are grown by metal organic chemical vapor deposition (MOCVD). Current-voltage (IV) analysis shows that the breakdown electric field across the AlN dielectric is 3 MV/cm. By depositing an additional SiO2 layer on top of the AlN layer it is possible to increase the breakdown voltage of the MIS capacitors significantly without having pronounced impact on the quality of the AlN/SiC interface.

  • 38.
    Widmann, Matthias
    et al.
    Univ Stuttgart, Germany.
    Niethammer, Matthias
    Univ Stuttgart, Germany.
    Fedyanin, Dmitry Yu.
    Moscow Inst Phys and Technol, Russia.
    Khramtsov, Igor A.
    Moscow Inst Phys and Technol, Russia.
    Rendler, Torsten
    Univ Stuttgart, Germany.
    Booker, Ian Don
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Morioka, Naoya
    Univ Stuttgart, Germany.
    Chen, Yu-Chen
    Univ Stuttgart, Germany.
    Ivanov, Ivan Gueorguiev
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ohshima, Takeshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Bockstedte, Michel
    Univ Salzburg, Austria; Univ Erlangen Nurnberg, Germany.
    Gali, Adam
    Hungarian Acad Sci, Hungary; Budapest Univ Technol and Econ, Hungary.
    Bonato, Cristian
    Heriot Watt Univ, Scotland.
    Lee, Sang-Yun
    Univ Stuttgart, Germany; Korea Inst Sci and Technol, South Korea.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany.
    Electrical Charge State Manipulation of Single Silicon Vacancies in a Silicon Carbide Quantum Optoelectronic Device2019In: Nano letters (Print), ISSN 1530-6984, E-ISSN 1530-6992, Vol. 19, no 10, p. 7173-7180Article in journal (Refereed)
    Abstract [en]

    Color centers with long-lived spins are established platforms for quantum sensing and quantum information applications. Color centers exist in different charge states, each of them with distinct optical and spin properties. Application to quantum technology requires the capability to access and stabilize charge states for each specific task. Here, we investigate charge state manipulation of individual silicon vacancies in silicon carbide, a system which has recently shown a unique combination of long spin coherence time and ultrastable spin-selective optical transitions. In particular, we demonstrate charge state switching through the bias applied to the color center in an integrated silicon carbide optoelectronic device. We show that the electronic environment defined by the doping profile and the distribution of other defects in the device plays a key role for charge state control. Our experimental results and numerical modeling evidence that control of these complex interactions can, under certain conditions, enhance the photon emission rate. These findings open the way for deterministic control over the charge state of spin-active color centers for quantum technology and provide novel techniques for monitoring doping profiles and voltage sensing in microscopic devices.

  • 39.
    Khosa, R. Y.
    et al.
    Univ Iceland, Iceland; Univ Educ Lahore, Pakistan.
    Chen, Jr-Tai
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Pålsson, K.
    Univ Iceland, Iceland.
    Karhu, Robin
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Rorsman, N.
    Chalmers Univ Technol, Sweden.
    Sveinbjörnsson, Einar
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Univ Iceland, Iceland.
    Electrical properties of 4H-SiC MIS capacitors with AlN gate dielectric grown by MOCVD2019In: Solid-State Electronics, ISSN 0038-1101, E-ISSN 1879-2405, Vol. 153, p. 52-58Article in journal (Refereed)
    Abstract [en]

    We report on the electrical properties of the AlN/4H-SiC interface using capacitance- and conductance-voltage (CV and GV) analysis of AlN/SiC MIS capacitors. The crystalline AlN layers are made by hot wall MOCVD. CV analysis at room temperature reveals an order of magnitude lower density of interface traps at the AlN/SiC interface than at nitrided SiO2/SiC interfaces. Electron trapping in bulk traps within the AlN is significant when the MIS capacitors are biased into accumulation resulting in a large flatband voltage shift towards higher gate voltage. This process is reversible and the electrons are fully released from the AlN layer if depletion bias is applied at elevated temperatures. Current-voltage (IV) analysis reveals that the breakdown electric field intensity across the AlN dielectric is 3-4 MV/cm and is limited by trap assisted leakage. By depositing an additional SiO2 layer on top of the AlN layer, it is possible to increase the breakdown voltage of the MIS capacitors significantly without having much impact on the quality of the AlN/SiC interface.

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  • 40.
    Nguyen, Son Tien
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Stenberg, Pontus
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Ascatron AB, Sweden.
    Jokubavicius, Valdas
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Abe, Hiroshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Ohshima, Takeshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ivanov, Ivan Gueorguiev
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Energy levels and charge state control of the carbon antisite-vacancy defect in 4H-SiC2019In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 114, no 21, article id 212105Article in journal (Refereed)
    Abstract [en]

    The carbon antisite-vacancy pair (CSiVC) in silicon carbide (SiC) has recently emerged as a promising defect for applications in quantum communication. In the positive charge state, CSiVC+ can be engineered to produce ultrabright single photon sources in the red spectral region, while in the neutral charge state, it has been predicted to emit light at telecom wavelengths and to have spin properties suitable for a quantum bit. In this electron paramagnetic resonance study using ultrapure compensated isotope-enriched 4H-(SiC)-Si-28, we determine the (+|0) level of CSiVC and show that the positive and neutral charge states of the defect can be optically controlled.

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  • 41.
    Nagy, Roland
    et al.
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol, Germany.
    Niethammer, Matthias
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol, Germany.
    Widmann, Matthias
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol, Germany.
    Chen, Yu-Chen
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol, Germany.
    Udvarhelyi, Peter
    Hungarian Acad Sci, Hungary; Eotvos Lorand Univ, Hungary.
    Bonato, Cristian
    Heriot Watt Univ, Scotland.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Karhu, Robin
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ivanov, Ivan Gueorguiev
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Maze, Jeronimo R.
    Pontificia Univ Catolica Chile, Chile; Pontificia Univ Catolica Chile, Chile.
    Ohshima, Takeshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Soykal, Oney O.
    Naval Res Lab, DC 20375 USA.
    Gali, Adam
    Hungarian Acad Sci, Hungary; Budapest Univ Technol and Econ, Hungary.
    Lee, Sang-Yun
    Korea Inst Sci and Technol, South Korea.
    Kaiser, Florian
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol, Germany.
    Wrachtrup, Joerg
    Univ Stuttgart, Germany; Inst Quantum Sci and Technol, Germany.
    High-fidelity spin and optical control of single silicon-vacancy centres in silicon carbide2019In: Nature Communications, E-ISSN 2041-1723, Vol. 10, article id 1954Article in journal (Refereed)
    Abstract [en]

    Scalable quantum networking requires quantum systems with quantum processing capabilities. Solid state spin systems with reliable spin-optical interfaces are a leading hardware in this regard. However, available systems suffer from large electron-phonon interaction or fast spin dephasing. Here, we demonstrate that the negatively charged silicon-vacancy centre in silicon carbide is immune to both drawbacks. Thanks to its (4)A(2) symmetry in ground and excited states, optical resonances are stable with near-Fourier-transform-limited linewidths, allowing exploitation of the spin selectivity of the optical transitions. In combination with millisecond-long spin coherence times originating from the high-purity crystal, we demonstrate high-fidelity optical initialization and coherent spin control, which we exploit to show coherent coupling to single nuclear spins with similar to 1 kHz resolution. The summary of our findings makes this defect a prime candidate for realising memory-assisted quantum network applications using semiconductor-based spin-to-photon interfaces and coherently coupled nuclear spins.

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  • 42.
    Nguyen, Son Tien
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Stenberg, Pontus
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Ascatron AB, Sweden.
    Jokubavicius, Valdas
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ohshima, Takeshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ivanov, Ivan Gueorguiev
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ligand hyperfine interactions at silicon vacancies in 4H-SiC2019In: Journal of Physics: Condensed Matter, ISSN 0953-8984, E-ISSN 1361-648X, Vol. 31, no 19, article id 195501Article in journal (Refereed)
    Abstract [en]

    The negative silicon vacancy (V-Si(-)) in SiC has recently emerged as a promising defect for quantum communication and room-temperature quantum sensing. However, its electronic structure is still not well characterized. While the isolated Si vacancy is expected to give rise to only two paramagnetic centers corresponding to two inequivalent lattice sites in 4H-SiC, there have been five electron paramagnetic resonance (EPR) centers assigned to V-Si(-) in the past: the so-called isolated no-zero-field splitting (ZFS) V-Si(-) center and another four axial configurations with small ZFS: T-V1a, T-V2a, T-V1b, and T-V2b. Due to overlapping with Si-29 hyperfine (hf) structures in EPR spectra of natural 4H-SiC, hf parameters of T-V1a have not been determined. Using isotopically enriched 4H-(SiC)-Si-28, we overcome the problems of signal overlapping and observe hf parameters of nearest C neighbors for all three components of the S = 3/2 T-V1a and T-V2a centers. The obtained EPR data support the conclusion that only T-V1a and T-V2a are related to V-Si(-) and the two configurations of the so-called isolated no-ZFS V-Si(-) center, V-Si(-) (I) and V-Si(-) (II), are actually the central lines corresponding to the transition I-1/2 amp;lt;-amp;gt; I + 1/2 of the T-V2a and T-V1a centers, respectively.

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  • 43.
    Spindlberger, L.
    et al.
    Johannes Kepler Univ Linz, Austria.
    Csore, A.
    Hungarian Acad Sci, Hungary.
    Thiering, G.
    Hungarian Acad Sci, Hungary.
    Putz, S.
    Univ Wien, Austria.
    Karhu, Robin
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Fromherz, T.
    Johannes Kepler Univ Linz, Austria.
    Gali, A.
    Hungarian Acad Sci, Hungary; Univ Technol and Econ, Hungary.
    Trupke, M.
    Univ Wien, Austria.
    Optical Properties of Vanadium in 4H Silicon Carbide for Quantum Technology2019In: Physical Review Applied, E-ISSN 2331-7019, Vol. 12, no 1, article id 014015Article in journal (Refereed)
    Abstract [en]

    We study the optical properties of tetravalent-vanadium impurities in 4H silicon carbide. Light emission from two crystalline sites is observed at wavelengths of 1.28 and 1.33 mu m, with optical lifetimes of 163 and 43 ns, respectively, which remains stable up to 50 and 20 K, respectively. Moreover, spectrally broad photoluminescence is observed up to room temperature. Group-theory and ab initio density-functional supercell calculations enable unequivocal site assignment and shed light on the spectral features of the defects. Specifically, our numerical simulations indicate that the site assignment is reversed with respect to previous assumptions. Our calculations show that vanadium in silicon carbide has highly favorable properties for the generation of single photons in the telecommunication wavelength regime. Combined with the available electronic and nuclear degrees of freedom, vanadium presents all the ingredients required for a highly efficient spin-photon interface.

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  • 44.
    Ul-Hassan, Jawad
    et al.
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Karhu, Robin
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Lilja, Louise
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Janzén, Erik
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Wafer Scale On-Axis Homoepitaxial Growth of 4H-SiC(0001) for High-Power Devices: Influence of Different Gas Phase Chemistries and Growth Rate Limitations2019In: Crystal Growth & Design, ISSN 1528-7483, E-ISSN 1528-7505, Vol. 19, no 6, p. 3288-3297Article in journal (Refereed)
    Abstract [en]

    On-axis homoepitaxy of 4H-SiC has the advantage of producing epilayers that are free of basal plane dislocations. Such layers can be highly beneficial for SiC-based high-power bipolar electronic devices which otherwise suffer from bipolar degradation phenomena related to basal plane dislocations in epilayers. In this study, we have developed on-axis homoepitaxy on the Si-face of 100 mm diameter 4H-SiC wafers with only 4H polytype in the epilayer excluding the edges of the wafer. We have also compared standard and chloride-based growth, the influence of different ambient conditions on surface preparation of the substrate, the influence of the histories of different growth cells, and the geometry of the susceptors regarding 4H-polytype stability in the epilayer. Substrate surface preparation, growth temperature, C/Si ratio, and Si/H ratio are found to be the most influential parameters to achieve homoepitaxy. On-axis homoepitaxial growth rate is limited to a very low value of amp;lt;10 mu m/h. We have performed a systematic study to understand the influence of different growth parameters and gas phase chemistries to determine whether on-axis growth rate can be enhanced and, if not, what the limiting factors are. Our experimental evidence suggests that the on-axis growth rate is not limited by the gas phase chemistry or diffusion, but it is limited by the surface kinetics. A significantly low step density on on-axis substrates lowers the surface reaction rates and limits the growth rate to lower values. It may not be possible to further improve the growth rate even with chloride-based growth using epitaxial growth conditions.

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  • 45.
    Widmann, Matthias
    et al.
    Univ Stuttgart, Germany.
    Niethammer, Matthias
    Univ Stuttgart, Germany.
    Makino, Takahiro
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Rendler, Torsten
    Univ Stuttgart, Germany.
    Lasse, Stefan
    Univ Stuttgart, Germany.
    Ohshima, Takeshi
    Natl Inst Quantum and Radiol Sci and Technol, Japan.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nguyen, Son Tien
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Lee, Sang-Yun
    Korea Inst Sci and Technol, South Korea.
    Wrachtrup, Joreg
    Univ Stuttgart, Germany.
    Bright single photon sources in lateral silicon carbide light emitting diodes2018In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 112, no 23, article id 231103Article in journal (Refereed)
    Abstract [en]

    Single-photon emitting devices have been identified as an important building block for applications in quantum information and quantum communication. They allow us to transduce and collect quantum information over a long distance via photons as so-called flying qubits. In addition, substrates like silicon carbide provide an excellent material platform for electronic devices. In this work, we combine these two features and show that one can drive single photon emitters within a silicon carbide p-i-n-diode. To achieve this, we specifically designed a lateral oriented diode. We find a variety of new color centers emitting non-classical lights in the visible and near-infrared range. One type of emitter can be electrically excited, demonstrating that silicon carbide can act as an ideal platform for electrically controllable single photon sources. Published by AIP Publishing.

  • 46.
    Bernardin, Evans K.
    et al.
    Univ S Florida, FL 33620 USA.
    Frewin, Christopher L.
    Univ Texas Dallas, TX 75080 USA.
    Everly, Richard
    USF, FL 33617 USA.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Saddow, Stephen E.
    Univ S Florida, FL 33620 USA.
    Correction: Demonstration of a Robust All-Silicon-Carbide Intracortical Neural Interface (vol 9, 412, 2018)2018In: Micromachines, E-ISSN 2072-666X, Vol. 9, no 9, article id 451Article in journal (Other academic)
    Abstract [en]

    n/a

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  • 47.
    Bernardin, Evans K.
    et al.
    Univ S Florida, FL 33620 USA.
    Frewin, Christopher L.
    Univ Texas Dallas, TX 75080 USA.
    Everly, Richard
    Nanotechnol Res and Educ Ctr USF, FL 33617 USA.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Saddow, Stephen E.
    Univ S Florida, FL 33620 USA.
    Demonstration of a Robust All-Silicon-Carbide Intracortical Neural Interface2018In: Micromachines, E-ISSN 2072-666X, Vol. 9, no 8, article id 412Article in journal (Refereed)
    Abstract [en]

    Intracortical neural interfaces (INI) have made impressive progress in recent years but still display questionable long-term reliability. Here, we report on the development and characterization of highly resilient monolithic silicon carbide (SiC) neural devices. SiC is a physically robust, biocompatible, and chemically inert semiconductor. The device support was micromachined from p-type SiC with conductors created from n-type SiC, simultaneously providing electrical isolation through the resulting p-n junction. Electrodes possessed geometric surface area (GSA) varying from 496 to 500 K m(2). Electrical characterization showed high-performance p-n diode behavior, with typical turn-on voltages of 2.3 V and reverse bias leakage below 1 nArms. Current leakage between adjacent electrodes was 7.5 nArms over a voltage range of -50 V to 50 V. The devices interacted electrochemically with a purely capacitive relationship at frequencies less than 10 kHz. Electrode impedance ranged from 675 +/- 130 k (GSA = 496 mu m(2)) to 46.5 +/- 4.80 k (GSA = 500 K mu m(2)). Since the all-SiC devices rely on the integration of only robust and highly compatible SiC material, they offer a promising solution to probe delamination and biological rejection associated with the use of multiple materials used in many current INI devices.

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  • 48.
    Khosa, R. Y.
    et al.
    Univ Iceland, Iceland.
    Thorsteinsson, E. B.
    Univ Iceland, Iceland.
    Winters, M.
    Chalmers Univ Technol, Sweden.
    Rorsman, N.
    Chalmers Univ Technol, Sweden.
    Karhu, Robin
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Sveinbjörnsson, Einar
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Univ Iceland, Iceland.
    Electrical characterization of amorphous Al2O3 dielectric films on n-type 4H-SiC2018In: AIP Advances, E-ISSN 2158-3226, Vol. 8, no 2, article id 025304Article in journal (Refereed)
    Abstract [en]

    We report on the electrical properties of Al2O3 films grown on 4H-SiC by successive thermal oxidation of thin Al layers at low temperatures (200 degrees C - 300 degrees C). MOS capacitors made using these films contain lower density of interface traps, are more immune to electron injection and exhibit higher breakdown field (5MV/cm) than Al2O3 films grown by atomic layer deposition (ALD) or rapid thermal processing (RTP). Furthermore, the interface state density is significantly lower than in MOS capacitors with nitrided thermal silicon dioxide, grown in N2O, serving as the gate dielectric. Deposition of an additional SiO2 film on the top of the Al2O3 layer increases the breakdown voltage of the MOS capacitors while maintaining low density of interface traps. We examine the origin of negative charges frequently encountered in Al2O3 films grown on SiC and find that these charges consist of trapped electrons which can be released from the Al2O3 layer by depletion bias stress and ultraviolet light exposure. This electron trapping needs to be reduced if Al2O3 is to be used as a gate dielectric in SiC MOS technology. (c) 2018 Author(s).

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  • 49.
    Ayedh, Hussein M.
    et al.
    University of Oslo, Department of Physics, Center for Materials Science and Nanotechnology, N-0316 Oslo, NORWAY .
    Baathen, Marianne E.
    University of Oslo, Department of Physics, Center for Materials Science and Nanotechnology, N-0316 Oslo, NORWAY .
    Galeckas, Augustinas
    University of Oslo, Department of Physics, Center for Materials Science and Nanotechnology, N-0316 Oslo, NORWAY .
    ul-Hassan, Jawad
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Bergman, Peder
    Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering.
    Nipoti, Roberta
    CNR-IMM of Bologna, I-40129 Bologna, ITALY.
    Hallen, Anders
    Royal Institute of Technology, KTH, School of Information and Communication Technology, SE-164 40 Kista-Stockholm, SWEDEN.
    Svensson, Bengt G
    University of Oslo, Department of Physics, Center for Materials Science and Nanotechnology, N-0316 Oslo, NORWAY.
    (Invited) Controlling the Carbon Vacancy in 4H-SiC by Thermal Processing2018In: / [ed] Dudley, M; Bakowski, M; Shenai, K; Ohtani, N; Raghothamachar, B, Electrochemical Society, 2018, Vol. 86, no 12, p. 91-97Conference paper (Refereed)
    Abstract [en]

    The carbon vacancy (VC) is perhaps the most prominent point defect in silicon carbide (SiC) and it is an efficient charge carrier lifetime killer in high-purity epi