Öppna denna publikation i ny flik eller fönster >>Visa övriga...
2012 (Engelska)Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 30, nr 3, s. 031504-Artikel i tidskrift (Refereegranskat) Published
Abstract [en]
The influence of substrate bias and chemical composition on the microstructure and hardness of arc evaporated Zr1−xAlxN films with 0.12 < x < 0.74 is investigated. A cubic ZrAlN phase is formed at low aluminum contents (x < 0.38) whereas for a high Al-content, above x=0.70, a single-phase hexagonal structure is obtained. For intermediate Al-contents, a two-phase structure is formed. The cubic structured films exhibit higher hardness than the hexagonal structured ones. A low bias results in N-rich films with a partly defect-rich microstructure while a higher substrate bias decreases the grain size and increases the residual stress in the cubic ZrAlN films. Recrystallization and out-diffusion of nitrogen from the lattice in the cubic ZrAlN films takes place during annealing at 800 ◦C, which results in an increased hardness. The cubic ZrAlN phase is stable to annealing temperatures of 1000 ◦C while annealing at higher temperature results in nucleation and growth of hexagonal AlN. In the high Al-content ZrAlN films, formation of ZrN- and AlN-rich domains within the hexagonal lattice during annealing at 1000 ◦C improves the mechanical properties.
Ort, förlag, år, upplaga, sidor
American Vacuum Society, 2012
Nationell ämneskategori
Naturvetenskap
Identifikatorer
urn:nbn:se:liu:diva-75172 (URN)10.1116/1.3698592 (DOI)000303602800015 ()
Anmärkning
funding agencies|VINN Excellence Center on Functional Nanoscale Materials (FunMat)||
2012-02-202012-02-202022-12-19Bibliografiskt granskad