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When patches match - a statistical view on matching under illumination variation
Linköpings universitet, Institutionen för systemteknik, Datorseende. Linköpings universitet, Tekniska fakulteten. Goethe University of Frankfurt, Germany.
Goethe University of Frankfurt, Germany.
2014 (engelsk)Inngår i: 2014 22ND INTERNATIONAL CONFERENCE ON PATTERN RECOGNITION (ICPR), IEEE COMPUTER SOC , 2014, s. 4364-4369Konferansepaper, Publicerat paper (Fagfellevurdert)
Abstract [en]

We discuss matching measures (scores and residuals) for comparing image patches under unknown affine photometric (=intensity) transformations. In contrast to existing methods, we derive a fully symmetric matching measure which reflects the fact that both copies of the signal are affected by measurement errors (noise), not only one. As it turns out, this evolves into an eigensystem problem; however a simple direct solution for all entities of interest can be given. We strongly advocate for constraining the estimated gain ratio and the estimated mean value offset to realistic ranges, thus preventing the matching scheme from locking into unrealistic correspondences.

sted, utgiver, år, opplag, sider
IEEE COMPUTER SOC , 2014. s. 4364-4369
Serie
International Conference on Pattern Recognition, ISSN 1051-4651
HSV kategori
Identifikatorer
URN: urn:nbn:se:liu:diva-121335DOI: 10.1109/ICPR.2014.747ISI: 000359818004084ISBN: 978-1-4799-5208-3 (tryckt)OAI: oai:DiVA.org:liu-121335DiVA, id: diva2:853439
Konferanse
22nd International Conference on Pattern Recognition (ICPR)
Tilgjengelig fra: 2015-09-14 Laget: 2015-09-14 Sist oppdatert: 2015-09-14

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