Step-flow growth of nanolaminate Ti3SiC2 epitaxial layers on 4H-SiC(0 0 0 1)Show others and affiliations
2011 (English)In: SCRIPTA MATERIALIA, ISSN 1359-6462, Vol. 64, no 12, p. 1141-1144Article in journal (Refereed) Published
Abstract [en]
Epitaxial Ti3SiC2(0 0 0 1) films were deposited on 4 degrees off-cut 4H-SiC(0 0 0 1) wafers using magnetron sputtering. A lateral step-flow growth mechanism of the Ti3SiC2 was discovered by X-ray diffraction, elastic recoil detection analysis, atomic force microscopy and electron microscopy. Helium ion microscopy revealed contrast variations on the Ti3SiC2 terraces, suggesting a mixed Si and Ti(C) termination. Si-rich growth conditions results in Ti3SiC2 layers with pronounced {1 1 (2) over bar 0) faceting and off-oriented TiSi2 crystallites, while stoichiometric growth yields truncated {1 (1) over bar 0 0) terrace edges.
Place, publisher, year, edition, pages
Elsevier Science B.V., Amsterdam. , 2011. Vol. 64, no 12, p. 1141-1144
Keywords [en]
Sputtering, Atomic force microscopy (AFM), Helium ion microscopy (HIM), Transmission electron microscopy (TEM), Crystal structure
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-68684DOI: 10.1016/j.scriptamat.2011.03.013ISI: 000290422300019OAI: oai:DiVA.org:liu-68684DiVA, id: diva2:419717
Note
Original Publication:
Kristina Buchholt, Per Eklund, Jens Jensen, Jun Lu, Anita Lloyd Spetz and Lars Hultman, Step-flow growth of nanolaminate Ti3SiC2 epitaxial layers on 4H-SiC(0 0 0 1), 2011, SCRIPTA MATERIALIA, (64), 12, 1141-1144.
http://dx.doi.org/10.1016/j.scriptamat.2011.03.013
Copyright: Elsevier Science B.V., Amsterdam.
http://www.elsevier.com/
2011-05-272011-05-272016-08-31
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