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Electronic Structure of intrinsic and doped Silicon Carbide and Silicon
Linköping University, Department of Physics, Measurement Technology, Biology and Chemistry. Linköping University, The Institute of Technology.
1999 (English)Doctoral thesis, comprehensive summary (Other academic)
Abstract [en]

Silicon (Si) is the most exploited material within the semiconductor device technology, mainly due to its relatively good electron and hole mobilities and the simplicity to fabricate and process the material. Silicon carbide (SiC) has, however, a wider band gap, a higher breakdown electric field strength, and a higher thermal conductivity, which makes SiC one of the most promising materials for high-power devices. The high saturation drift velocity in SiC is a quality suitable also for highfrequency applications and, furthermore, the chemical and radiant inertness makes SiC-based devices capable to operate in harsh environments. Although the increasing interest in SiC has resulted in comprehensive investigations of the material, there is still deficient knowledge about the basic electronic properties of SiC.

The present thesis comprises a theoretical study on the electronic structure of the cubic polytype 3C and the hexagonal polytypes 2H, 4H, and 6H of SiC. Detailed investigations of the energy bands near the fundamental energy band gap, important for the understanding of the electronic transport properties in these materials, have been performed and special attention has been paid on the non-parabolicities of the energy bands. Throughout the work, comparisons have been made with cubic Si and in some case with the corresponding hexagonal Si polytypes.

The electronic band structure of the intrinsic materials have been calculated employing a relativistic and full-potential linearized augmented plane wave (LAPW) method based upon the local density approximation (LDA) to the density functional theory (DFT). Geometric optimizations of the crystals result in lattice constants confirming the experimental values and it is demonstrated that even small variations in the atomic positions have a strong impact on the crystal-field splitting of the uppermost valence bands in the hexagonal polytypes. For the time being there is a lack of experimental information about the electronic band structure in SiC and the values of the effective hole masses have not been experimentally established. The effective hole masses in Si and effective electron masses in both SiC and Si calculated here agree well with available measured values. It is shown that inclusion of the spin-orbit interaction is crucial for accurately calculating the effective hole masses. The uppermost valence bands in all materials considered here have been found to be nonparabolic in the vicinity of the Γ point and, furthermore, the lowest conduction band in 6H-SiC has a very flat and non-parabolic double-well structure. Electron and hole scatterings, caused by the existence of interaction potentials or through optical or thermal excitations, are dependent on the selection rules for the transitions and on the density-of-states of the energy bands. This thesis provides a symmetry classification of the electron states, both for the single and the double space groups. Moreover, the density-of-states have also been determined. Using the calculated density-of-states, the temperature dependent carrier concentration has been worked out for 4H-SiC:Al and 6H-SiC:N.

In order to properly design semiconductor devices, the effects on the electronic band structure due to doping or plasma-injection have to be known. In this thesis calculations of the self-energy for the lowest conduction-band states and for the uppermost valence-band states in n-type, p-type, and plasma-induced SiC and Si have been performed, utilizing the zero-temperature Green's function formalism. The correlation interaction was described within the random phase approximation (RPA) with a local-field correction of Hubbard, and the electron-impurity ion interaction was obtained from second-order perturbation theory. The resulting energy shifts of the fundamental band gap and of the optical band gap have been worked out. It is found that the non-parabolicities of the energy bands strongly influence the calculated bandgap narrowing for high dopant concentration. Furthermore, the distortions of the conduction band in n-type SiC and Si have been investigated and the modified effective electron masses are presented. By comparing the calculated total energies of the localized donor electrons in the non-metallic phase and of the electron gas in the metallic phase the critical concentrations for the metal non-metal transition (the Mott transition) have been estimated for n-type SiC and Si.

Place, publisher, year, edition, pages
Linköping: Linköping University , 1999. , p. 76
Series
Linköping Studies in Science and Technology. Dissertations, ISSN 0345-7524 ; 568
National Category
Condensed Matter Physics
Identifiers
URN: urn:nbn:se:liu:diva-184912Libris ID: 7624278ISBN: 9172194421 (print)OAI: oai:DiVA.org:liu-184912DiVA, id: diva2:1657576
Public defence
1999-05-06, J206 (Planck), Linköpings universitet, Linköping, 10:15
Opponent
Note

All or some of the partial works included in the dissertation are not registered in DIVA and therefore not linked in this post.

Available from: 2022-05-11 Created: 2022-05-11 Last updated: 2022-05-11Bibliographically approved
List of papers
1. Doping-induced effects on the band structure in n-type 3C-, 2H-, 4H-, 6H-SiC, and Si
Open this publication in new window or tab >>Doping-induced effects on the band structure in n-type 3C-, 2H-, 4H-, 6H-SiC, and Si
1999 (English)In: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 60, no 24, p. 16479-16493Article in journal (Refereed) Published
Abstract [en]

Doping-induced energy shifts of the lowest conduction band and the uppermost valence band have been calculated for n-type 3 C-, 2H-, 4H-, 6H-SiC, and Si. We present the resulting narrowing of the fundamental band gap and of the optical band gap as functions of donor concentration. The effects on the curvature of the lowest conduction band have been investigated in detail for 3C- and 6H-SiC and, moreover, the effective electron masses in the vicinity of the conduction-band minimum have been calculated for,all five materials. The calculations go beyond the common parabolic treatments of the ground-state energy dispersion by using energy dispersion and overlap integrals from band structure calculations. The nonparabolic valence-band curvatures especially strongly influence the self-energies, but also the double-well minimum of 6H-SiC has effects on the self-energies and the resulting band curvatures. By comparing the total energy of the electron gas with the total energy of electrons in a nonmetal phase, we estimate the critical Mott concentration for the metal-nonmetal transition. The utilized method is based on a zero-temperature formalism within the random phase approximation with local field correction according to Hubbard. [S0163-1829(99)12647-X].

National Category
Engineering and Technology
Identifiers
urn:nbn:se:liu:diva-49894 (URN)
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2022-05-11
2. Plasma-induced band edge shifts in 3C-, 2H-, 4H-, 6H-SiC and Si
Open this publication in new window or tab >>Plasma-induced band edge shifts in 3C-, 2H-, 4H-, 6H-SiC and Si
2000 (English)In: Solid-State Electronics, ISSN 0038-1101, E-ISSN 1879-2405, Vol. 44, no 3, p. 471-476Article in journal (Refereed) Published
Abstract [en]

Plasma-induced energy shifts of the conduction band minimum and of the valence band maximum have been calculated for 3C-, 2H-, 4H-, 6H-, 6H-SiC and Si. The resulting narrowing of the fundamental band gap and of the optical band gap are presented. The method utilized is based on a zero-temperature formalism within the random phase approximation. Electron-electron, hole-hole, electron-hole, electron-optical phonon and hole-optical phonon interactions have been taken into account. The calculations are based on band structure data from a relativistic, full-potential band structure calculation.

National Category
Engineering and Technology
Identifiers
urn:nbn:se:liu:diva-47685 (URN)10.1016/S0038-1101(99)00180-X (DOI)
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2022-05-11

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