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Simulating Scaling Effects in Fully Vertical GaN FinFETs
TU Wien, Austria; Lund Univ, Sweden; Lund Univ, Sweden.
Hexagem AB, Sweden.
Lund Univ, Sweden; Volvo Cars AB, Sweden.
Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, Faculty of Science & Engineering. Lund Univ, Sweden; Lund Univ, Sweden. (C3NiT-Janzén)ORCID iD: 0000-0002-8112-7411
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2025 (English)In: Physica Status Solidi (A): Applications and Materials Science, ISSN 1862-6300, E-ISSN 1862-6319, Vol. 222, no 23, article id 2500050Article in journal (Refereed) Published
Abstract [en]

Herein, it is shown that a fully vertical GaN FinFET can reach close to ideal Baliga's figure of merit (BFOM) for thicker drift layers. Devices with drift layers between 1 and 8 mu m are simulated using TCAD, and the device geometry is varied to find optimal device performance. For 8 mu m drift layers, device operation at the BFOM limit is found with VB = 1550 V and Ron,sp = 0.53 m Omega cm2. An optimal switching FOM at 2.36 nOC is found.

Place, publisher, year, edition, pages
WILEY-V C H VERLAG GMBH , 2025. Vol. 222, no 23, article id 2500050
Keywords [en]
finFETs; GaN; power devices; TCAD
National Category
Marine Engineering
Identifiers
URN: urn:nbn:se:liu:diva-215372DOI: 10.1002/pssa.202500050ISI: 001508797700001Scopus ID: 2-s2.0-105007928041OAI: oai:DiVA.org:liu-215372DiVA, id: diva2:1975374
Note

Funding Agencies|Swedish Governmental Agency for Innovation Systems (VINNOVA) [2022-03139]; Lund University; Linkoeping University; Chalmers University of Technology; Hitachi Energy; Ericsson; Epiluvac; FMV; Gotmic; Region Skane; Saab; SweGaN; Volvo Cars; UMS; Austrian Federal Ministry for Digital and Economic Affairs; National Foundation for Research, Technology and Development; Christian Doppler Research Association

Available from: 2025-06-24 Created: 2025-06-24 Last updated: 2026-02-17Bibliographically approved

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Darakchieva, Vanya

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