The first section of this chapter provides an overview of magnetron sputtering (MS). The high-power impulse magnetron sputtering (HiPIMS) process was then introduced along with its concepts and mythology. This chapter primarily compares transition metal nitride (TMN) thin films grown with direct current MS (dcMS) and HiPIMS. Some distinct types of TMN thin films have been examined. In the case of superconducting NbN films, it was found that HiPIMS-grown NbN films exhibited reduced defects, resulting in a greater superconducting transition temperature. HiPIMS was shown to be effective in producing exceptionally dense and smooth TiN films. Finally, in the case of Co4N and Fe4N, HiPIMS growth provided higher-quality films with increased magnetic characteristics.