Oxidation induced ON1, ON2a/b defects in 4H-SiC characterized by DLTS Show others and affiliations
2014 (English) In: SILICON CARBIDE AND RELATED MATERIALS 2013, PTS 1 AND 2, Trans Tech Publications , 2014, Vol. 778-780, p. 281-284Conference paper, Published paper (Refereed)
Abstract [en]
The deep levels ON1 and ON2a/b introduced by oxidation into 4H-SiC are characterized via standard DLTS and via filling pulse dependent DLTS measurements. Separation of the closely spaced ON2a/b defect is achieved by using a higher resolution correlation function (Gaver-Stehfest 4) and apparent energy level, apparent electron capture cross section and filling pulse measurement derived capture cross sections are given.
Place, publisher, year, edition, pages Trans Tech Publications , 2014. Vol. 778-780, p. 281-284
Series
Materials Science Forum, ISSN 1662-9752 ; 778-780
Keywords [en]
4H-SiC; DLTS; oxidation; carrier lifetime; defect; deep level; trap; capture cross section
National Category
Engineering and Technology
Identifiers URN: urn:nbn:se:liu:diva-108196 DOI: 10.4028/www.scientific.net/MSF.778-780.281 ISI: 000336634100066 OAI: oai:DiVA.org:liu-108196 DiVA, id: diva2:729500
Conference SILICON CARBIDE AND RELATED MATERIALS 2013
2014-06-262014-06-262015-04-01